SCHEMBL8335284

SCHEMBL8335284

C=C(c1cccc2ccccc12)S(=O)(=O)O

nearest known ligand 0.53

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PTK2B Q14289 1/20 0.53
L3MBTL1 Q9Y468 1/20 0.53
NR4A1 P22736 1/20 0.52
NR4A2 P43354 1/20 0.52
NR4A3 Q92570 1/20 0.52
MMP3 P08254 1/20 0.47
HDAC8 Q9BY41 1/20 0.47
PTPN1 P18031 1/20 0.46
CDC25B P30305 1/20 0.46
PLK1 P53350 1/20 0.46
POLB P06746 3/20 0.44
KMT2A Q03164 3/20 0.44
GAA P10253 1/20 0.44
CA1 P00915 1/20 0.41
CA2 P00918 1/20 0.41
CA9 Q16790 1/20 0.41
ALDH1A1 P00352 4/20 0.40
MAPT P10636 3/20 0.40
HPGD P15428 3/20 0.40
CNR2 P34972 2/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL20398162 0.83 PTK2B (0.51) PTK2BL3MBTL1NR4A1NR4A2NR4A3
SCHEMBL11827703 0.80 NR4A1 (0.52) PTK2BL3MBTL1NR4A1NR4A2NR4A3
SCHEMBL28830204 0.80 NR4A1 (0.52) PTK2BL3MBTL1NR4A1NR4A2NR4A3
SCHEMBL27724210 0.80 NR4A1 (0.47) PTK2BL3MBTL1NR4A1NR4A2NR4A3
SCHEMBL28589368 0.78 NR4A1 (0.59) PTK2BL3MBTL1NR4A1NR4A2NR4A3
SCHEMBL27360130 0.77 NR4A1 (0.57) PTK2BL3MBTL1NR4A1NR4A2NR4A3
SCHEMBL23403889 0.77 PTK2B (0.49) PTK2BL3MBTL1NR4A1NR4A2NR4A3
SCHEMBL23777301 0.75 ALDH1A1 (0.45) PTK2BL3MBTL1NR4A1NR4A2NR4A3
SCHEMBL1869296 0.74 PTK2B (0.59) PTK2BL3MBTL1NR4A1NR4A2NR4A3
SCHEMBL8338885 0.74 NR4A1 (0.48) PTK2BL3MBTL1NR4A1NR4A2NR4A3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20180211828-A1 COMPOSITION FOR FORMING FILM FOR USE IN CLEANING SEMICONDUCTOR SUBSTRATE, AND CLEANING METHOD FOR SEMICONDUCTOR SUBSTRATE JSR CORPORATION (JP) 2018-07-26 US disclosed
WO-1999005986-A1 IMPROVED DENTAL FLOSS WHITEHILL ORAL TECHNOLOGIES, INC. (US) 1999-02-11 WO disclosed