SCHEMBL8347129

SCHEMBL8347129

CC(C)c1ccccc1-c1ccc(O)cc1O

nearest known ligand 0.52

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
GABRA1 P14867 2/20 0.52
GABRB2 P47870 2/20 0.52
TYR P14679 1/20 0.49
ALOX5 P09917 3/20 0.48
ANPEP P15144 1/20 0.47
DPP4 P27487 1/20 0.47
CA1 P00915 2/20 0.43
CA2 P00918 2/20 0.43
LMNA P02545 2/20 0.43
FAAH O00519 1/20 0.43
CYP1A2 P05177 1/20 0.43
CYP3A4 P08684 1/20 0.43
HPGD P15428 1/20 0.43
TSHR P16473 1/20 0.43
GABRB1 P18505 1/20 0.43
GABRG2 P18507 1/20 0.43
PTGS1 P23219 1/20 0.43
SLC6A2 P23975 1/20 0.43
HTR2C P28335 1/20 0.43
GABRB3 P28472 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9743142 0.87 GABRA1 (0.50) GABRA1GABRB2TYRALOX5ANPEP
SCHEMBL31544912 0.84 TYR (0.47) GABRA1GABRB2TYRALOX5ANPEP
SCHEMBL983994 0.84 GABRA1 (0.67) GABRA1GABRB2ANPEPDPP4CA1
SCHEMBL10673224 0.81 ANPEP (0.51) GABRA1GABRB2TYRALOX5ANPEP
SCHEMBL9743581 0.81 GABRA1 (0.52) GABRA1GABRB2TYRANPEPDPP4
SCHEMBL11421554 0.79 ANPEP (0.47) GABRA1GABRB2TYRANPEPDPP4
SCHEMBL29738266 0.79 ANPEP (0.47) GABRA1GABRB2TYRANPEPDPP4
Hydrogen Peroxide SCHEMBL9644435 0.79 GABRA1 (0.56) GABRA1GABRB2DPP4CA1CA2
SCHEMBL14850418 0.79 ALOX5 (0.65) ALOX5LMNACYP1A2ESR2CDK5
SCHEMBL167078 0.78 GABRA1 (0.55) GABRA1GABRB2DPP4CA1CA2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5866724-A Positive resist composition and photosensitizers SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 1999-02-02 US disclosed
US-5856058-A HALATION INHIBITOR WHICH IS AN ESTERIFICATION PRODUCT BETWEEN A SPECIFIED PHENOLIC COMPOUND AND A NAPHTHOQUINONE-1,2-DIAZIDE SULFONIC ACID. TOKYO OHKA KOGYO CO., LTD. (JP) 1999-01-05 US disclosed
US-5300618-A Resorcinol-based epoxy resins INDSPEC CHEMICAL CORPORATION (US) 1994-04-05 US disclosed
US-5087548-A POSITIVE TYPE RADIATION-SENSITIVE RESIN COMPOSITION JAPAN SYNTHETIC RUBBER CO., INC. (JP) 1992-02-11 US disclosed
EP-0227487-A2 Positive type radiation-sensitive resin composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1987-07-01 EP disclosed