SCHEMBL8349451

SCHEMBL8349451

CCOC(=O)CC(C)I

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21811918 0.85 PRKCA (0.34)
SCHEMBL21811752 0.82 NAAA (0.38)
SCHEMBL11318856 0.80 MGAM (0.55)
SCHEMBL5972479 0.80 GAA (0.55)
SCHEMBL27828 0.80
SCHEMBL27845082 0.80 MGAM (0.55)
SCHEMBL21811595 0.79 TSHR (0.43)
SCHEMBL16160735 0.79 MGAM (0.48)
SCHEMBL21811610 0.79 NAAA (0.43)
SCHEMBL9506134 0.79 GAA (0.48)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 28 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11958802-B2 Migration-resistant photopolymerization sensitizer KAWASAKI KASEI CHEMICALS LTD. (JP) 2024-04-16 US disclosed
CN-113950500-B Thermoplastic resin, optical film comprising the same, diol compound, and diester compound 三菱化学株式会社 2023-11-03 CN disclosed
CN-113166036-B Photopolymerizing sensitizers with migration resistance 川崎化成工业株式会社 2023-10-10 CN disclosed
US-20220106254-A1 MIGRATION-RESISTANT PHOTOPOLYMERIZATION SENSITIZER KAWASAKI KASEI CHEMICALS LTD. (JP) 2022-04-07 US disclosed
CN-113166036-A Photopolymerisable sensitizers having migration resistance 川崎化成工业株式会社 2021-07-23 CN disclosed
WO-2020121384-A1 PHOTOPOLYMERIZATION SENSITIZER HAVING MIGRATION RESISTANCE 川崎化成工業株式会社 2020-06-18 WO disclosed
WO-2020121544-A1 MIGRATION-RESISTANT PHOTOPOLYMERIZATION SENSITIZER 川崎化成工業株式会社 2020-06-18 WO disclosed
WO-2020054874-A1 PHOTOPOLYMERIZATION SENSITIZER 川崎化成工業株式会社 2020-03-19 WO disclosed
WO-2020054116-A1 PHOTOPOLYMERIZATION SENSITIZER 川崎化成工業株式会社 2020-03-19 WO disclosed
CN-108586723-A Polycondensation resin and optical film formed therefrom 三菱化学株式会社 2018-09-28 CN disclosed
US-5942460-A MIXTURE OF ACETIC ACID, AN IRIDIUM CATALYST, METHYL IODIDE WITH METHYL ACETATE AS PROMOTER BP CHEMICALS LIMITED (GB) 1999-08-24 US disclosed
US-5672743-A CATALYTIC CARBONYLATION OF METHANOL WITH CARBON MONOOXIDE IN LIQUID COMPOSITION INCLUDING PROMOTER RUTHENIUM OR OSMIUM COMPOUND BP CHEMICALS LIMITED (GB) 1997-09-30 US disclosed
US-5470844-A Heterocyclic-NMDA antagonists MERRELL DOW PHARMACEUTICALS INC. (US) 1995-11-28 US disclosed
CN-1027695-C Heterocyclic-NMDA antagonists MERRELL DOW PHARMA (US) 1995-02-22 CN disclosed
US-5194430-A HETEROCYCLIC-NMDA ANTAGONISTS MERRELL DOW PHARMACEUTICALS INC. (US) 1993-03-16 US disclosed
CN-1056499-A HETEROCYCLIC-NMDA ANTAGONISTS MERRELL DOW PHARMA (US) 1991-11-27 CN disclosed
EP-0457324-A1 Heterocyclic-NMDA antagonists MERRELL DOW PHARMACEUTICALS INC. (US) 1991-11-21 EP disclosed
US-5023250-A Anticholesterol agents SMITHKLINE BEECHAM CORPORATION (US) 1991-06-11 US disclosed
EP-0107095-B1 1-N-ALKYLCARBOXY-BENZOFUSED LACTAMS USEFUL AS ANTIHYPERTENSIVE AGENTS MERCK & CO. INC. (US) 1987-09-09 EP disclosed
EP-0107095-A1 1-N-alkylcarboxy-benzofused lactams useful as antihypertensive agents MERCK & CO. INC. (US) 1984-05-02 EP disclosed