Predicted protein targets (top 8)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.41 |
| ▸ | GAA | P10253 | 2/20 | 0.37 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.37 |
| ▸ | PKM | P14618 | 1/20 | 0.35 |
| ▸ | PTGES2 | Q9H7Z7 | 1/20 | 0.34 |
| ▸ | NPC1 | O15118 | 1/20 | 0.31 |
| ▸ | POLB | P06746 | 1/20 | 0.31 |
| ▸ | RAB9A | P51151 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3603965 | 0.73 | ALDH1A1 (0.50) | ALDH1A1GAAL3MBTL1PKMPTGES2 | |
| SCHEMBL4244409 | 0.66 | ALDH1A1 (0.43) | ALDH1A1GAAL3MBTL1PKMPTGES2 | |
| SCHEMBL2569391 | 0.66 | ALDH1A1 (0.59) | ALDH1A1GAAL3MBTL1PKMPTGES2 | |
| SCHEMBL21408757 | 0.65 | ALDH1A1 (0.45) | ALDH1A1GAAL3MBTL1PKMPTGES2 | |
| SCHEMBL5674583 | 0.65 | ALDH1A1 (0.58) | ALDH1A1GAAL3MBTL1PKMPTGES2 | |
| SCHEMBL4246154 | 0.64 | ALDH1A1 (0.42) | ALDH1A1GAAL3MBTL1PKMPTGES2 | |
| SCHEMBL12568259 | 0.64 | ALDH1A1 (0.56) | ALDH1A1GAAL3MBTL1PKMPTGES2 | |
| SCHEMBL5303980 | 0.64 | ALDH1A1 (0.44) | ALDH1A1GAAL3MBTL1PKMNPC1 | |
| SCHEMBL5307435 | 0.64 | TP53 (0.57) | ALDH1A1GAAL3MBTL1PKMNPC1 | |
| SCHEMBL13098615 | 0.64 | KEAP1 (0.47) | ALDH1A1GAAL3MBTL1PKMNPC1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0510440-B1 | Positive-working radiation-sensitive composition and radiation-sensitive recording material produced therewith | CLARIANT GMBH (DE) | 1999-01-13 | — | — | EP | disclosed |
| EP-0519298-B1 | Radiation-sensitive sulfonic acid esters and their use | HOECHST AG (DE) | 1995-09-13 | — | — | EP | disclosed |
| US-5442061-A | Recording, photoresists, printing plates | HOECHST AKTIENGESELLSCHAFT (DE) | 1995-08-15 | — | — | US | disclosed |
| EP-0510443-B1 | Negative-working radiation-sensitive composition and radiation-sensitive recording material produced therewith | HOECHST AG (DE) | 1995-03-22 | — | — | EP | disclosed |
| US-5364734-A | Sulfonated triazines | HOECHST AKTIENGESELLSCHAFT (DE) | 1994-11-15 | — | — | US | disclosed |
| US-5298364-A | Negative photoresists, acid crosslinking | HOECHST AKTIENGESELLSCHAFT (DE) | 1994-03-29 | — | — | US | disclosed |
| US-5286867-A | Substituted 1-sulfonyloxy-2-pyridones and process for preparing them | HOECHST AKTIENGESELLSCHAFT (DE) | 1994-02-15 | — | — | US | disclosed |
| US-5230985-A | NEGATIVE-WORKING RADIATION-SENSITIVE MIXTURES, AND RADIATION-SENSITIVE RECORDING MATERIAL PRODUCED WITH THESE MIXTURES | HOECHST AKTIENGESELLSCHAFT (DE) | 1993-07-27 | — | — | US | disclosed |
| US-5229254-A | Photoresists, printing plates, sulfonic acid generators | HOECHST AKTIENGESELLSCHAFT (DE) | 1993-07-20 | — | — | US | disclosed |
| EP-0519298-A1 | Radiation-sensitive sulfonic acid esters and their use | HOECHST AKTIENGESELLSCHAFT (DE) | 1992-12-23 | — | — | EP | disclosed |
| EP-0519299-A1 | Positive-working radiation-sensitive composition and radiation-sensitive recording material produced therewith | HOECHST AKTIENGESELLSCHAFT (DE) | 1992-12-23 | — | — | EP | disclosed |
| EP-0510442-A1 | Substituted 1-sulfonyloxy-2-pyridones, process for their preparation and their use | HOECHST AKTIENGESELLSCHAFT (DE) | 1992-10-28 | — | — | EP | disclosed |
| EP-0510443-A1 | Negative-working radiation-sensitive composition and radiation-sensitive recording material produced therewith | HOECHST AKTIENGESELLSCHAFT (DE) | 1992-10-28 | — | — | EP | disclosed |
| EP-0510440-A1 | Positive-working radiation-sensitive composition and radiation-sensitive recording material produced therewith | HOECHST AKTIENGESELLSCHAFT (DE) | 1992-10-28 | — | — | EP | disclosed |