SCHEMBL8370299

SCHEMBL8370299

N#CCC(=O)NOCc1ccccc1

nearest known ligand 0.58

Predicted protein targets (top 11)

geneUniProtsupporting neighboursconfidence
MCL1 Q07820 1/20 0.58
NPC1 O15118 7/20 0.56
RAB9A P51151 7/20 0.56
HDAC3 O15379 1/20 0.48
NCOR2 Q9Y618 1/20 0.48
KDM4E B2RXH2 2/20 0.47
ALDH1A1 P00352 2/20 0.47
HSD17B10 Q99714 1/20 0.47
IMPDH2 P12268 1/20 0.44
EGFR P00533 1/20 0.43
EPHX2 P34913 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6760841 0.79 HDAC3 (0.61) NPC1RAB9AHDAC3NCOR2
SCHEMBL7970712 0.79 NPC1 (0.62) NPC1RAB9AHDAC3NCOR2EGFR
SCHEMBL906398 0.79 RAB9A (0.62) NPC1RAB9AHDAC3NCOR2ALDH1A1
SCHEMBL7424713 0.79 NPC1 (0.62) NPC1RAB9AHDAC3NCOR2KDM4E
SCHEMBL9800175 0.79 NPC1 (0.62) NPC1RAB9AHDAC3NCOR2ALDH1A1
SCHEMBL13607002 0.79 NPC1 (0.62) NPC1RAB9AHDAC3NCOR2ALDH1A1
SCHEMBL7981993 0.79 HDAC3 (0.64) NPC1RAB9AHDAC3NCOR2EGFR
SCHEMBL9191952 0.77 HDAC3 (0.71) NPC1RAB9AHDAC3NCOR2
SCHEMBL6771205 0.77 NPC1 (0.61) NPC1RAB9AHDAC3NCOR2ALDH1A1
Hydrochloric Acid SCHEMBL7442086 0.77 NPC1 (0.61) NPC1RAB9AHDAC3NCOR2EGFR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0510440-B1 Positive-working radiation-sensitive composition and radiation-sensitive recording material produced therewith CLARIANT GMBH (DE) 1999-01-13 EP disclosed
EP-0510443-B1 Negative-working radiation-sensitive composition and radiation-sensitive recording material produced therewith HOECHST AG (DE) 1995-03-22 EP disclosed
US-5230985-A NEGATIVE-WORKING RADIATION-SENSITIVE MIXTURES, AND RADIATION-SENSITIVE RECORDING MATERIAL PRODUCED WITH THESE MIXTURES HOECHST AKTIENGESELLSCHAFT (DE) 1993-07-27 US disclosed
US-5229254-A Photoresists, printing plates, sulfonic acid generators HOECHST AKTIENGESELLSCHAFT (DE) 1993-07-20 US disclosed
EP-0510443-A1 Negative-working radiation-sensitive composition and radiation-sensitive recording material produced therewith HOECHST AKTIENGESELLSCHAFT (DE) 1992-10-28 EP disclosed
EP-0510440-A1 Positive-working radiation-sensitive composition and radiation-sensitive recording material produced therewith HOECHST AKTIENGESELLSCHAFT (DE) 1992-10-28 EP disclosed