SCHEMBL8370955

SCHEMBL8370955

C=C(C)C(=O)Oc1ccccc1OC(=O)OC(C)(C)C

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ELANE P08246 4/20 0.44
TDP1 Q9NUW8 2/20 0.42
ATM Q13315 2/20 0.42
HSD17B10 Q99714 4/20 0.37
KDM4E B2RXH2 3/20 0.37
HPGD P15428 2/20 0.37
ALDH1A1 P00352 3/20 0.35
ESR1 P03372 1/20 0.35
ITGB3 P05106 1/20 0.35
ITGA2B P08514 1/20 0.35
HMGB1 P09429 1/20 0.35
TSHR P16473 1/20 0.35
GGT1 P19440 1/20 0.35
PTGS1 P23219 1/20 0.35
PTGS2 P35354 1/20 0.35
BLM P54132 1/20 0.35
NAPRT Q6XQN6 1/20 0.35
KMT2A Q03164 2/20 0.35
MTNR1A P48039 1/20 0.35
MTNR1B P49286 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8962026 0.86 ELANE (0.51) ELANETDP1ATMHSD17B10KDM4E
SCHEMBL1232932 0.84 ELANE (0.56) ELANETDP1ATMHSD17B10KDM4E
SCHEMBL30803748 0.84 ELANE (0.56) ELANETDP1ATMHSD17B10KDM4E
SCHEMBL30803750 0.84 ELANE (0.56) ELANETDP1ATMHSD17B10KDM4E
SCHEMBL7861711 0.82 KDM4E (0.46) ELANETDP1ATMHSD17B10KDM4E
SCHEMBL9707101 0.81 ELANE (0.62) ELANETDP1ATMKMT2AKDM1A
SCHEMBL29391949 0.81 CA12 (0.48) ELANEATMHSD17B10KDM4EHPGD
SCHEMBL30711978 0.81 CA12 (0.48) ELANEATMHSD17B10KDM4EHPGD
SCHEMBL14894503 0.81 ELANE (0.47) ELANETDP1ATMHSD17B10KDM4E
SCHEMBL1866946 0.79 HSD17B10 (0.45) ELANETDP1ATMHSD17B10KDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0510440-B1 Positive-working radiation-sensitive composition and radiation-sensitive recording material produced therewith CLARIANT GMBH (DE) 1999-01-13 EP disclosed
US-5229254-A Photoresists, printing plates, sulfonic acid generators HOECHST AKTIENGESELLSCHAFT (DE) 1993-07-20 US disclosed
EP-0510440-A1 Positive-working radiation-sensitive composition and radiation-sensitive recording material produced therewith HOECHST AKTIENGESELLSCHAFT (DE) 1992-10-28 EP disclosed
WO-1992015549-A1 UNSATURATED POLYMERS AND RADIATION-SENSITIVE MIXTURE MADE THEREFROM HOECHST AKTIENGESELLSCHAFT (DE) 1992-09-17 WO disclosed