SCHEMBL9707101

SCHEMBL9707101

C=C(C)C(=O)Oc1ccc(OC(=O)OC(C)(C)C)cc1

nearest known ligand 0.62

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
ELANE P08246 9/20 0.62
KMT2A Q03164 3/20 0.49
ATM Q13315 1/20 0.49
KDM1A O60341 1/20 0.46
MEN1 O00255 1/20 0.41
CA2 P00918 1/20 0.39
LMNA P02545 1/20 0.36
MAPT P10636 1/20 0.36
MAPKAPK2 P49137 1/20 0.35
OGA O60502 1/20 0.35
POLB P06746 1/20 0.34
APEX1 P27695 1/20 0.34
HTT P42858 1/20 0.34
TDP1 Q9NUW8 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL25695939 0.86 ELANE (0.48) ELANEKMT2AATMKDM1AMEN1
SCHEMBL4061370 0.85 ELANE (0.81) ELANEKMT2AKDM1AMEN1CA2
SCHEMBL12020976 0.84 ELANE (0.48) ELANEKMT2AATMKDM1AMEN1
SCHEMBL21667243 0.83 ELANE (0.58) ELANEKMT2AATMMEN1CA2
SCHEMBL23558963 0.83 ELANE (0.44) ELANEKMT2AATMKDM1ACA2
SCHEMBL56436 0.83 ELANE (0.69) ELANEKMT2AATMMEN1LMNA
SCHEMBL653574 0.83 ELANE (0.72) ELANEKMT2AKDM1AMEN1CA2
SCHEMBL22958171 0.82 ELANE (0.50) ELANEKMT2AATMKDM1AMEN1
SCHEMBL1437007 0.82 ELANE (0.56) ELANEKMT2AATMMEN1LMNA
SCHEMBL8370955 0.81 ELANE (0.44) ELANEKMT2AATMKDM1AMEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9128378-B2 Forming conductive metal patterns with reactive polymers EASTMAN KODAK COMPANY (US) 2015-09-08 US disclosed
US-20150125667-A1 FORMING CONDUCTIVE METAL PATTERNS WITH REACTIVE POLYMERS BANK OF AMERICA, N.A., AS AGENT 2015-05-07 US disclosed
US-9017918-B2 Monomer, polymer, chemically amplified positive resist composition, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-04-28 US disclosed
US-9017918-B2 Monomer, polymer, chemically amplified positive resist composition, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-04-28 US disclosed
US-9017918-B2 Monomer, polymer, chemically amplified positive resist composition, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-04-28 US disclosed
US-20110294070-A1 MONOMER, POLYMER, CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2011-12-01 US disclosed
US-20110294070-A1 MONOMER, POLYMER, CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2011-12-01 US disclosed
US-20110294070-A1 MONOMER, POLYMER, CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2011-12-01 US disclosed
WO-1992015549-A1 UNSATURATED POLYMERS AND RADIATION-SENSITIVE MIXTURE MADE THEREFROM HOECHST AKTIENGESELLSCHAFT (DE) 1992-09-17 WO disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20110294070-A1 MONOMER, POLYMER, CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION, AND PATTERNING PROCESS PARG, PCNA, POLH ELANE 1171/4885KMT2A 873/4885ATM 4312/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.