SCHEMBL8373369

SCHEMBL8373369

I[SiH](I)c1ccccc1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL23321588 0.79 ALDH1A1 (0.35)
SCHEMBL21383076 0.76 ALDH1A1 (0.33)
SCHEMBL1777339 0.73
SCHEMBL21527935 0.73
SCHEMBL24624087 0.73
SCHEMBL8372403 0.73
SCHEMBL3482296 0.69 ALDH1A1 (0.40)
SCHEMBL38902 0.69 ALDH1A1 (0.40)
SCHEMBL11256956 0.67 ALDH1A1 (0.38)
Ammonia Solution, Strong SCHEMBL3895204 0.67 ALDH1A1 (0.38)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 24 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-113548669-A Preparation device and preparation method of high-purity electronic-grade diiodosilane 福建福豆新材料有限公司 2021-10-26 CN claimed
US-12371447-B2 Method for producing (meth)acryloxy group-containing organosilicon compounds SHIN-ETSU CHEMICAL CO., LTD. (JP) 2025-07-29 US disclosed
EP-4174076-B1 METHOD FOR PRODUCING (METH)ACRYLOXY GROUP-CONTAINING ORGANOSILICON COMPOUNDS SHINETSU CHEMICAL CO (JP) 2024-07-24 EP disclosed
CN-112041324-B Method for producing halosilane compounds 美利肯公司 2024-03-15 CN disclosed
US-20230134471-A1 METHOD FOR PRODUCING (METH)ACRYLOXY GROUP-CONTAINING ORGANOSILICON COMPOUNDS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-04 US disclosed
EP-4174076-A1 METHOD FOR PRODUCING (METH)ACRYLOXY GROUP-CONTAINING ORGANOSILICON COMPOUNDS Shin-Etsu Chemical Co., Ltd. (JP) 2023-05-03 EP disclosed
CN-116041382-A Method for producing organosilicon compounds containing (meth) acryloxy groups 信越化学工业株式会社 2023-05-02 CN disclosed
CN-113548669-B Preparation device and preparation method of high-purity electronic-grade diiodosilane 福建福豆新材料有限公司 2022-11-11 CN disclosed
US-11377455-B2 Preparation of organosilicon compound having (meth)acryloyloxy group SHIN-ETSU CHEMICAL CO., LTD. (JP) 2022-07-05 US disclosed
US-20210139515-A1 Preparation of Organosilicon Compound Having (Meth)acryloyloxy Group SHIN-ETSU CHEMICAL CO., LTD. (JP) 2021-05-13 US disclosed
EP-0549226-B1 Sodium borohydride catalyzed disproportionation of cycloorganosilanes DOW CORNING (US) 1997-04-02 EP disclosed
EP-0547774-B1 Process for disproportionation of arylsilanes DOW CORNING (US) 1997-04-02 EP disclosed
EP-0514034-B1 Silane products from reaction of solid silicon monoxide with aromatic halides DOW CORNING (US) 1996-02-28 EP disclosed
EP-0549226-A1 Sodium borohydride catalyzed disproportionation of cycloorganosilanes DOW CORNING CORPORATION (US) 1993-06-30 EP disclosed
EP-0539039-A1 Thermal disproportionation of arylhalosilanes DOW CORNING CORPORATION (US) 1993-04-28 EP disclosed
EP-0514034-A1 Silane products from reaction of solid silicon monoxide with aromatic halides DOW CORNING CORPORATION (US) 1992-11-19 EP disclosed
US-5136070-A Sodium borohydride catalyzed disproportionation of cycloorganosilanes DOW CORNING CORPORATION (US) 1992-08-04 US disclosed
US-5136071-A Reduces induction time DOW CORNING CORPORATION (US) 1992-08-04 US disclosed
US-5120520-A In presence of metal or metal-contianing catalyst DOW CORNING CORPORATION (US) 1992-06-09 US disclosed
US-5110974-A Thermal disproportionation of arylhalosilanes DOW CORNING CORPORATION (US) 1992-05-05 US disclosed