SCHEMBL8378307

SCHEMBL8378307

C=CC(=O)OC(C)C(F)(F)C(F)F

nearest known ligand 0.38

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
TSHR P16473 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9679748 0.85 TSHR (0.36) TSHR
SCHEMBL798980 0.82 TSHR (0.42) TSHR
SCHEMBL14336623 0.81 TSHR (0.36) TSHR
SCHEMBL29065869 0.80 TSHR (0.38) TSHR
SCHEMBL41966 0.80 TSHR (0.32) TSHR
SCHEMBL28552992 0.79 TSHR (0.34) TSHR
SCHEMBL11792791 0.78 TSHR (0.39) TSHR
SCHEMBL1262753 0.78 TSHR (0.39) TSHR
SCHEMBL10787047 0.78 TSHR (0.42) TSHR
SCHEMBL2038198 0.77

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2236571-B1 Ink composition FUJIFILM CORP (JP) 2016-08-31 EP disclosed
US-8361603-B2 Ink composition, ink composition for inkjet recording, inkjet recording method, and printed article obtained by inkjet recording method FUJIFILM CORPORATION (JP) 2013-01-29 US disclosed
EP-0583918-B1 Reflection preventing film and process for forming resist pattern using the same JAPAN SYNTHETIC RUBBER CO LTD (JP) 1999-03-10 EP disclosed
EP-0583918-A2 Reflection preventing film and process for forming resist pattern using the same JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1994-02-23 EP disclosed
WO-1993023773-A1 PROCESS FOR PREPARATION OF OXYGEN PERMEABLE POLYMER MATERIAL CIBA-GEIGY AG (CH) 1993-11-25 WO disclosed
US-5235013-A Copolymerizing an alkene of 6-10 carbons having one double bond and a side chain methyl group and an acrylic or fluoroacrylic ester CIBA-GEIGY CORPORATION 1993-08-10 US disclosed
US-5113477-A Core, cladding, heat resistance HITACHI, LTD. (JP) 1992-05-12 US disclosed
EP-0478261-A2 Process for producing oxygen-permeable polymer CIBA-GEIGY AG (CH) 1992-04-01 EP disclosed
EP-0226020-A2 Plastic optical fibers and transparent resin used therefor HITACHI, LTD. (JP) 1987-06-24 EP disclosed