Predicted protein targets (top 8)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SERPINE1 | P05121 | 5/20 | 0.79 |
| ▸ | ESR1 | P03372 | 4/20 | 0.71 |
| ▸ | AKR1C4 | P17516 | 1/20 | 0.71 |
| ▸ | AKR1C3 | P42330 | 1/20 | 0.71 |
| ▸ | AKR1C2 | P52895 | 1/20 | 0.71 |
| ▸ | AKR1C1 | Q04828 | 1/20 | 0.71 |
| ▸ | TYR | P14679 | 2/20 | 0.55 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.55 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7550992 | 0.98 | SERPINE1 (0.77) | SERPINE1ESR1AKR1C4AKR1C3AKR1C2 | |
| SCHEMBL28384704 | 0.95 | SERPINE1 (0.82) | SERPINE1ESR1AKR1C4AKR1C3AKR1C2 | |
| SCHEMBL13287172 | 0.93 | SERPINE1 (0.92) | SERPINE1ESR1AKR1C4AKR1C3AKR1C2 | |
| SCHEMBL27797541 | 0.91 | SERPINE1 (0.89) | SERPINE1ESR1AKR1C4AKR1C3AKR1C2 | |
| SCHEMBL28100061 | 0.91 | SERPINE1 (0.89) | SERPINE1ESR1AKR1C4AKR1C3AKR1C2 | |
| SCHEMBL24871867 | 0.91 | SERPINE1 (0.89) | SERPINE1ESR1AKR1C4AKR1C3AKR1C2 | |
| SCHEMBL13286951 | 0.91 | SERPINE1 (0.89) | SERPINE1ESR1AKR1C4AKR1C3AKR1C2 | |
| SCHEMBL7775753 | 0.89 | SERPINE1 (1.00) | SERPINE1ESR1AKR1C4AKR1C3AKR1C2 | |
| SCHEMBL1885404 | 0.87 | SERPINE1 (0.81) | SERPINE1ESR1AKR1C4AKR1C3AKR1C2 | |
| Ethylene Glycol SCHEMBL3515847 | 0.87 | SERPINE1 (0.88) | SERPINE1ESR1AKR1C4AKR1C3AKR1C2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-118834553-A | Preparation method of flash rust inhibitor | 大连连昇新材料有限公司 | 2024-10-25 | — | — | CN | claimed |
| CN-118420463-A | Preparation method and rust conversion application of 3,4, 5-trihydroxybenzoic acid-4-hydroxybutyl ester | 浙大宁波理工学院 | 2024-08-02 | — | — | CN | claimed |
| CN-101633789-B | Heat oxygen aging resistance high polymer material and preparation method and application thereof | GUANGZHOU INST OF CHEMISTRY | 2012-01-11 | — | — | CN | claimed |
| CN-101633789-A | Heat oxygen aging resistance high polymer material and preparation method and application thereof | GUANGZHOU INST OF CHEMISTRY | 2010-01-27 | — | — | CN | claimed |
| CN-118420463-A | Preparation method and rust conversion application of 3,4, 5-trihydroxybenzoic acid-4-hydroxybutyl ester | 浙大宁波理工学院 | 2024-08-02 | — | — | CN | disclosed |
| CN-118420463-A | Preparation method and rust conversion application of 3,4, 5-trihydroxybenzoic acid-4-hydroxybutyl ester | 浙大宁波理工学院 | 2024-08-02 | — | — | CN | disclosed |
| CN-118420463-A | Preparation method and rust conversion application of 3,4, 5-trihydroxybenzoic acid-4-hydroxybutyl ester | 浙大宁波理工学院 | 2024-08-02 | — | — | CN | disclosed |
| CN-101633789-B | Heat oxygen aging resistance high polymer material and preparation method and application thereof | GUANGZHOU INST OF CHEMISTRY | 2012-01-11 | — | — | CN | disclosed |
| CN-101633789-A | Heat oxygen aging resistance high polymer material and preparation method and application thereof | GUANGZHOU INST OF CHEMISTRY | 2010-01-27 | — | — | CN | disclosed |
| US-5945516-A | PRIOR TO ESTERIFICATION OF THE POLYHYDROXY PHENOL WITH THE NAPHTHOQUINONE DIAZIDE SULFONYL HALIDE, THE REACTANTS ARE INITIALLY DISSOLVED IN AN APROTIC SOLVENT TOGETHER WITH STRONG BASE; NONPRECIPITATING, FOR FORMATION OF PHOTORESISTS | SHIPLEY COMPANY, L.L.C. (US) | 1999-08-31 | — | — | US | disclosed |
| US-5917024-A | Acid labile photoactive composition | SHIPLEY COMPANY, L.L.C. (US) | 1999-06-29 | — | — | US | disclosed |
| US-5858605-A | PHOTORESIST COATING COMPRISING ALKALI SOLUBLE RESIN AND PHOTOACTIVE COMPOUND, REACTION PRODUCT OF VINYL ETHER AND ORTHO-NAPHTHOQUINONEDIAZIDE SULFONYL COMPOUND, DISSOLVED IN SOLVENT | SHIPLEY COMPANY, L.L.C. (US) | 1999-01-12 | — | — | US | disclosed |
| US-5821345-A | DISSOLVING WITH A STRONG BASE AND APROTIC SOLVENT; ESTER INTERCHANGE | SHIPLEY COMPANY, L.L.C. (US) | 1998-10-13 | — | — | US | disclosed |
| US-5719003-A | Method for increasing the differential solubility of an imaged photoresist through hydroxy group blocking via reaction with vinyl ethers | SHIPLEY COMPANY, L.L.C. (US) | 1998-02-17 | — | — | US | disclosed |
| US-5641604-A | Photoresist composition with improved differential solubility through hydroxyl group blocking via reaction with vinyl ethers | SHIPLEY COMPANY, L.L.C. (US) | 1997-06-24 | — | — | US | disclosed |