SCHEMBL8383545

SCHEMBL8383545

C=C(c1ccc(C(=O)O)cc1)C(C)(C)C

nearest known ligand 0.55

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TSHR P16473 3/20 0.55
TP53 P04637 1/20 0.55
SRD5A2 P31213 4/20 0.50
ALDH1A1 P00352 2/20 0.50
SMN1; SMN2 Q16637 1/20 0.50
CA1 P00915 4/20 0.46
CA2 P00918 4/20 0.46
CA12 O43570 1/20 0.46
CA3 P07451 1/20 0.46
TYR P14679 1/20 0.46
DRD1 P21728 1/20 0.46
CA4 P22748 1/20 0.46
CA6 P23280 1/20 0.46
CA5A P35218 1/20 0.46
CA7 P43166 1/20 0.46
CA9 Q16790 1/20 0.46
CA14 Q9ULX7 1/20 0.46
CA5B Q9Y2D0 1/20 0.46
RXRA P19793 1/20 0.46
RXRB P28702 1/20 0.46

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Terephthalic Acid SCHEMBL10332533 0.80 TSHR (0.75) TSHRTP53SRD5A2ALDH1A1SMN1; SMN2
SCHEMBL965081 0.78 ATM (0.40) TSHRALDH1A1SMN1; SMN2DAONAPRT
SCHEMBL11878418 0.78 NR1H4 (0.50) TSHRSRD5A2ALDH1A1CA2RXRA
Terephthalic Acid SCHEMBL4438514 0.78 TSHR (0.71) TSHRTP53SRD5A2ALDH1A1SMN1; SMN2
Terephthalic Acid SCHEMBL1929898 0.78 TSHR (0.71) TSHRTP53SRD5A2ALDH1A1SMN1; SMN2
SCHEMBL9414658 0.77 TSHR (0.55) TSHRTP53SRD5A2ALDH1A1SMN1; SMN2
Terephthalic Acid SCHEMBL1366420 0.77 TSHR (0.80) TSHRTP53SRD5A2ALDH1A1SMN1; SMN2
Terephthalic Acid SCHEMBL1243625 0.77 TSHR (0.80) TSHRTP53SRD5A2ALDH1A1SMN1; SMN2
SCHEMBL8387046 0.77 MAPK1 (0.40) TSHRALDH1A1SMN1; SMN2CA1CA2
SCHEMBL26486906 0.77 PGR (0.44) SMN1; SMN2CA1CA2CA12CA9

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 26 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2676976-B2 Emulsion Polymers With Improved Wet Scrub Resistance Having One Or More Silicon Containing Compounds CELANESE SALES GERMANY GMBH (DE) 2018-07-11 EP claimed
EP-2676976-B1 Emulsion Polymers With Improved Wet Scrub Resistance Having One Or More Silicon Containing Compounds CELANESE EMULSIONS GMBH (DE) 2014-12-31 EP claimed
EP-0284868-B1 Photoresist compositions MICROSI INC (US) 1995-05-03 EP claimed
EP-0910351-A1 PARTICLES COMPRISING AMPHIPHILIC COPOLYMERS, HAVING A CROSS-LINKED SHELL DOMAIN AND AN INTERIOR CORE DOMAIN, USEFUL FOR PHARMACEUTICAL AND OTHER APPLICATIONS G.D. Searle & Co. (US) 1999-04-28 EP disclosed
EP-0907666-A1 PARTICLES COMPRISING AMPHIPHILIC COPOLYMERS, HAVING A CROSS-LINKED SHELL DOMAIN AND AN INTERIOR CORE DOMAIN, USEFUL FOR PHARMACEUTICAL AND OTHER APPLICATIONS G.D. Searle & Co. (US) 1999-04-14 EP disclosed
EP-0701579-B1 COATING AGENTS FOR THE PRODUCTION OF TRANSPARENT FINISHING COATS AND THE USE OF SUCH COATING AGENTS IN THE PRODUCTION OF MULTI-COAT COATINGS HERBERTS & CO GMBH (DE) 1998-09-09 EP disclosed
WO-1997049736-A2 PARTICLES COMPRISING AMPHIPHILIC COPOLYMERS, HAVING A CROSS-LINKED SHELL DOMAIN AND AN INTERIOR CORE DOMAIN, USEFUL FOR PHARMACEUTICAL AND OTHER APPLICATIONS G.D. SEARLE AND CO. (US) 1997-12-31 WO disclosed
WO-1997049387-A1 PARTICLES COMPRISING AMPHIPHILIC COPOLYMERS, HAVING A CROSS-LINKED SHELL DOMAIN AND AN INTERIOR CORE DOMAIN, USEFUL FOR PHARMACEUTICAL AND OTHER APPLICATIONS G.D. SEARLE AND CO. (US) 1997-12-31 WO disclosed
US-5663019-A FORMING A TRANSPARENT ELECTROCONDUCTIVE LAYER AND A PHOTOSENSITIVE POSITIVE LAYER ON A SUBSTRATE, MASKING AND DEVELOPING ELECTROCONDUCTIVE LAYER AND FORMING MULTIPLE COLORED LAYERS ON EXPOSED ELECTROCONDUCTIVE LAYER NIPPON PAINT CO., LTD. (JP) 1997-09-02 US disclosed
US-5663233-A BINDING AGENTS COMPRISING HYDROXYFUNCTIONAL POLYESTERS AND ACRYLIC/METHACRYLIC COPOLYMERS AND CURATIVES; ACID/SCRATCH RESISTANCE; AUTOMOTIVE LACQUERS HERBERTS GESELLSCHAFT MIT BESCHRANKTER HAFTUNG (DE) 1997-09-02 US disclosed
EP-0469584-B1 Resist composition NIPPON PAINT CO LTD (JP) 1997-03-05 EP disclosed
EP-0572672-A1 PROCESS FOR MANUFACTURING MULTICOLOR DISPLAY NIPPON PAINT CO., LTD. (JP) 1993-12-08 EP disclosed
US-5213946-A POSITIVE TYPE, PHOTOSENSITIVE RESINOUS COMPOSITION NIPPON PAINT CO., LTD. (JP) 1993-05-25 US disclosed
EP-0523245-A1 METHOD FOR MANUFACTURING MULTIPLE COLOR DISPLAY DEVICE NIPPON PAINT CO., LTD. (JP) 1993-01-20 EP disclosed
EP-0519128-A1 A positive type, photosensitive resinous composition Nippon Paint Co., Ltd. (JP) 1992-12-23 EP disclosed
EP-0501243-A1 Positive type photosensitive electrocoating resin composition Nippon Paint Co., Ltd. (JP) 1992-09-02 EP disclosed
EP-0484021-A1 Resist composition NIPPON PAINT CO., LTD. (JP) 1992-05-06 EP disclosed
EP-0484021-A1 Resist composition NIPPON PAINT CO., LTD. (JP) 1992-05-06 EP disclosed
EP-0469584-A1 Resist composition NIPPON PAINT CO., LTD. (JP) 1992-02-05 EP disclosed
EP-0284868-A2 Photoresist compositions MicroSi, Inc. (a Delaware corporation) (US) 1988-10-05 EP disclosed