SCHEMBL83875

SCHEMBL83875

Cc1cc(C)c(S(=O)(=O)O)c(C)c1C

nearest known ligand 0.39

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LMNA P02545 2/20 0.39
GAA P10253 2/20 0.39
HTT P42858 2/20 0.39
MAPK1 P28482 1/20 0.39
CA1 P00915 1/20 0.39
CA2 P00918 1/20 0.39
MMP1 P03956 1/20 0.39
MMP2 P08253 1/20 0.39
MMP9 P14780 1/20 0.39
MMP8 P22894 1/20 0.39
MMP13 P45452 1/20 0.39
FABP4 P15090 2/20 0.39
RAPGEF4 Q8WZA2 4/20 0.38
FABP3 P05413 1/20 0.38
FABP5 Q01469 1/20 0.38
KMT2A Q03164 4/20 0.37
MEN1 O00255 3/20 0.37
KDM4E B2RXH2 2/20 0.37
F2 P00734 1/20 0.35
PRSS1 P07477 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Ammonia Solution, Strong SCHEMBL27721988 0.98 LMNA (0.38) LMNAGAAHTTMAPK1CA1
SCHEMBL2869064 0.90 CA1 (0.41) LMNAGAAHTTMAPK1CA1
SCHEMBL2864849 0.85 LMNA (0.46) LMNAGAAHTTMAPK1CA1
Hydrochloric Acid SCHEMBL27680289 0.83 LMNA (0.44) LMNAGAAHTTMAPK1CA1
SCHEMBL27648417 0.83 LMNA (0.44) LMNAGAAHTTMAPK1CA1
SCHEMBL11081940 0.83 LMNA (0.44) LMNAGAAHTTMAPK1CA1
SCHEMBL11803074 0.82 MEN1 (0.38) LMNAGAAHTTMAPK1CA1
SCHEMBL15033922 0.82 GAA (0.41) LMNAGAAHTTMAPK1CA1
SCHEMBL11806586 0.82 BRD4 (0.41) LMNAGAAHTTMAPK1CA1
SCHEMBL10301266 0.80 ALOX15 (0.38) LMNAGAAHTTMAPK1CA1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 146 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-108084006-B Preparation method of trimethylbenzoquinone and trimethylhydroquinone 浙江新和成药业有限公司 2020-12-29 CN claimed
US-5596128-A SULFONATION WITHOUT A CATALYST IN THE PRESENCE OF SOLVENT KONISHI CHEMICAL IND. CO., LTD. (JP) 1997-01-21 US claimed
EP-0505582-B1 SULFONATING AGENT AND PROCESS KONISHI CHEM IND (JP) 1996-07-31 EP claimed
EP-0505582-A1 SULFONATING AGENT AND PROCESS KONISHI CHEMICAL IND. CO., LTD. (JP) 1992-09-30 EP claimed
WO-2023081923-A1 PLATELET-DERIVED GROWTH FACTOR RECEPTOR (PDGFR) ALPHA INHIBITORS AND USES THEREOF Frequency Therapeutics, Inc. (US) 2023-05-11 WO disclosed
CN-108084006-B Preparation method of trimethylbenzoquinone and trimethylhydroquinone 浙江新和成药业有限公司 2020-12-29 CN disclosed
CN-108084006-B Preparation method of trimethylbenzoquinone and trimethylhydroquinone 浙江新和成药业有限公司 2020-12-29 CN disclosed
US-10703910-B2 Coloring composition, ink jet recording ink, ink jet recording method, and ink jet printer cartridge FUJIFILM CORPORATION (JP) 2020-07-07 US disclosed
US-9670364-B2 Compound having xanthene skeleton, colorant composition, ink for inkjet recording, inkjet recording method, inkjet printer cartridge, and inkjet recording material FUJIFILM CORPORATION (JP) 2017-06-06 US disclosed
EP-1377640-B1 AZO COMPOUNDS AND PROCESS OF PRODUCING THE SAME AND NOVEL INTERMEDIATE COMPOUNDS USED IN THE PROCESS OF PRODUCING AZO COMPOUNDS FUJIFILM CORP (JP) 2017-05-17 EP disclosed
US-20170101534-A1 COLORING COMPOSITION FOR DYEING OR TEXTILE PRINTING, INK FOR INK JET TEXTILE PRINTING, METHOD OF PRINTING ON FABRIC, AND DYED OR PRINTED FABRIC FUJIFILM CORPORATION (JP) 2017-04-13 US disclosed
CN-103503121-B Material for forming passivation film for semiconductor substrate, passivation film for semiconductor substrate and method for manufacturing same, and solar cell element and method for manufacturing same 日立化成株式会社 2017-04-12 CN disclosed
US-20060166048-A1 Polyarylene ether compound containing sulfonic acid group, composition containing same, and method for manufacturing those TOYO BOSEKI KABUSHIKI KAISHA (JP) 2006-07-27 US disclosed
CN-1703443-A Polyarylene ether compound containing sulfonic acid group, composition containing the same, and method for producing the same TOYO BOSEKI (JP) 2005-11-30 CN disclosed
EP-1561768-A1 POLYARYLENE ETHER COMPOUND CONTAINING SULFONIC ACID GROUP, COMPOSITION CONTAINING SAME, AND METHOD FOR MANUFACTURING THOSE Toyo Boseki Kabushiki Kaisha (JP) 2005-08-10 EP disclosed
US-5596128-A SULFONATION WITHOUT A CATALYST IN THE PRESENCE OF SOLVENT KONISHI CHEMICAL IND. CO., LTD. (JP) 1997-01-21 US disclosed
EP-0505582-B1 SULFONATING AGENT AND PROCESS KONISHI CHEM IND (JP) 1996-07-31 EP disclosed
EP-0505582-A1 SULFONATING AGENT AND PROCESS KONISHI CHEMICAL IND. CO., LTD. (JP) 1992-09-30 EP disclosed
US-4489091-A ESTERASE AND ANTIBODY INHIBITORS TAIHO PHARMACEUTICAL COMPANY LIMITED (JP) 1984-12-18 US disclosed
US-4411911-A Method of treating hyperlipidemia and inflammation with sulfonate derivatives TAIHO PHARMACEUTICAL COMPANY, LIMITED (JP) 1983-10-25 US disclosed