SCHEMBL8420105

SCHEMBL8420105

C=CC(=O)OC[Si](C)(C)[O]

nearest known ligand 0.54

Predicted protein targets (top 10)

geneUniProtsupporting neighboursconfidence
TSHR P16473 8/20 0.54
HPGD P15428 1/20 0.47
ALDH1A1 P00352 6/20 0.46
TP53 P04637 3/20 0.46
HIF1A Q16665 3/20 0.46
CYP3A4 P08684 2/20 0.46
HSD17B10 Q99714 1/20 0.46
MAPK1 P28482 1/20 0.42
SMN1; SMN2 Q16637 1/20 0.42
THRB P10828 3/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2403942 0.84 TSHR (0.50) TSHRHPGDALDH1A1TP53HIF1A
SCHEMBL9411504 0.84 TSHR (0.50) TSHRHPGDALDH1A1TP53HIF1A
SCHEMBL600138 0.84 TSHR (0.50) TSHRHPGDALDH1A1TP53HIF1A
SCHEMBL1011852 0.82 TSHR (0.48) TSHRHPGDALDH1A1TP53HIF1A
SCHEMBL7782623 0.80 TSHR (0.47) TSHRHPGDALDH1A1TP53HIF1A
SCHEMBL332972 0.80 TSHR (0.47) TSHRHPGDALDH1A1TP53HIF1A
SCHEMBL14559751 0.80 TSHR (0.47) TSHRHPGDALDH1A1TP53HIF1A
SCHEMBL2310688 0.78 TSHR (0.45) TSHRHPGDALDH1A1TP53HIF1A
SCHEMBL107384 0.78 TSHR (0.45) TSHRHPGDALDH1A1TP53HIF1A
SCHEMBL5069823 0.78 TSHR (0.45) TSHRHPGDALDH1A1TP53HIF1A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2490663-B1 SILICONE COMPOSITIONS COMPRISING A SWOLLEN SILICONE GEL DOW CORNING (US) 2017-09-20 EP claimed
EP-2536786-B1 SURFACE-MODIFIED HYDROGELS AND HYDROGEL MICROPARTICLES DOW CORNING (US) 2015-12-30 EP claimed
EP-0315954-B1 Pattern-forming material and pattern formation method TORAY SILICONE CO (JP) 1995-11-22 EP claimed
US-4985342-A Semiconductors, Integrated Circuits TORAY SILICONE COMPANY, LTD. (JP) 1991-01-15 US claimed
EP-0315954-A2 Pattern-forming material and pattern formation method TORAY SILICONE COMPANY, LIMITED (JP) 1989-05-17 EP claimed
EP-0487291-B1 Photocurable silicon composition, and method of making same LOCTITE CORP (US) 1999-09-29 EP disclosed
EP-0315954-B1 Pattern-forming material and pattern formation method TORAY SILICONE CO (JP) 1995-11-22 EP disclosed
US-5461173-A Fluorine-containing organosilicon compound and its manufacture SHIN-ETSU CHEMICAL CO., LTD. (JP) 1995-10-24 US disclosed
US-5348986-A Polysiloxanes capped with mixture of curable groups, gels, acrylated polymers LOCTITE CORPORATION (US) 1994-09-20 US disclosed
US-5182315-A Endcapping LOCTITE CORPORATION (US) 1993-01-26 US disclosed
EP-0487291-A2 Photocurable silicon composition, and method of making same LOCTITE CORPORATION (US) 1992-05-27 EP disclosed
US-4985342-A Semiconductors, Integrated Circuits TORAY SILICONE COMPANY, LTD. (JP) 1991-01-15 US disclosed
EP-0315954-A2 Pattern-forming material and pattern formation method TORAY SILICONE COMPANY, LIMITED (JP) 1989-05-17 EP disclosed