SCHEMBL8425150

SCHEMBL8425150

Oc1ccc(CCS)cc1

nearest known ligand 0.68

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ESR1 P03372 4/20 0.68
ESR2 Q92731 2/20 0.68
CA2 P00918 1/20 0.59
ALDH1A1 P00352 3/20 0.56
ADRA2A P08913 3/20 0.56
SLC6A2 P23975 3/20 0.56
KDM4E B2RXH2 2/20 0.56
HTR1A P08908 1/20 0.56
CYP2C19 P33261 1/20 0.56
HTR3A P46098 1/20 0.56
BACE1 P56817 1/20 0.56
TAAR1 Q96RJ0 1/20 0.56
L3MBTL1 Q9Y468 1/20 0.56
BLM P54132 1/20 0.54
KMT2A Q03164 1/20 0.54
TDP1 Q9NUW8 1/20 0.54
LTA4H P09960 1/20 0.54
TMEM97 Q5BJF2 1/20 0.50
SIGMAR1 Q99720 1/20 0.50
ADORA3 P0DMS8 2/20 0.48

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL332100 0.85 GFER (0.42) ESR1ESR2CA2ALDH1A1ADRA2A
SCHEMBL9797453 0.84 ESR1 (0.62) ESR1ESR2CA2ALDH1A1ADRA2A
SCHEMBL10751401 0.82 ESR1 (0.59) ESR1ESR2CA2ALDH1A1ADRA2A
SCHEMBL3873458 0.82 ESR1 (1.00) ESR1ESR2CA2ALDH1A1ADRA2A
SCHEMBL69344 0.82 ESR1 (1.00) ESR1ESR2CA2ALDH1A1ADRA2A
SCHEMBL9947435 0.80 ESR1 (0.63) ESR1ESR2CA2ALDH1A1ADRA2A
SCHEMBL12235091 0.78 CA2 (0.59) ESR1ESR2CA2ALDH1A1KDM4E
SCHEMBL1171041 0.77 ESR1 (0.77) ESR1ESR2CA2ALDH1A1ADRA2A
SCHEMBL245139 0.77 ESR1 (0.77) ESR1ESR2CA2ALDH1A1ADRA2A
SCHEMBL494668 0.77

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 20 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-117463304-B Polymer adsorbent and method for recovering rhodium in rhodium-containing waste liquid based on same 北京高新利华科技股份有限公司 2024-04-05 CN claimed
CN-117463304-A Polymer adsorbent and method for recovering rhodium in rhodium-containing waste liquid based on same 北京高新利华科技股份有限公司 2024-01-30 CN claimed
CN-122070173-A Microfluidic system, reaction method using microfluidic system, and method for producing polymer 株式会社大赛璐 2026-05-19 CN disclosed
WO-2025079624-A1 METHOD FOR PRODUCING POLYMER 株式会社ダイセル 2025-04-17 WO disclosed
WO-2025079618-A1 MICROFLUIDIC SYSTEM, REACTION METHOD FOR EMPLOYING MICROFLUIDIC SYSTEM, AND METHOD FOR PRODUCING POLYMER 株式会社ダイセル 2025-04-17 WO disclosed
WO-2025079622-A1 MICROFLUIDIC SYSTEM, REACTION METHOD USING MICROFLUIDIC SYSTEM, AND METHOD FOR PRODUCING POLYMER 株式会社ダイセル 2025-04-17 WO disclosed
WO-2025079620-A1 MICROFLUIDIC SYSTEM, PROCESSING METHOD USING MICROFLUIDIC SYSTEM, AND METHOD FOR PRODUCING POLYMER 株式会社ダイセル 2025-04-17 WO disclosed
WO-2025079623-A1 METHOD FOR PRODUCING POLYMER 株式会社ダイセル 2025-04-17 WO disclosed
CN-117463304-B Polymer adsorbent and method for recovering rhodium in rhodium-containing waste liquid based on same 北京高新利华科技股份有限公司 2024-04-05 CN disclosed
CN-117463304-A Polymer adsorbent and method for recovering rhodium in rhodium-containing waste liquid based on same 北京高新利华科技股份有限公司 2024-01-30 CN disclosed
EP-4183777-A1 APPLICATION OF COMPOSITION FOR PLATELET DISAGGREGATION, DISAGGREGATION REAGENT AND DISAGGREGATION METHOD Shenzhen Mindray Bio-Medical Electronics Co., Ltd (CN) 2023-05-24 EP disclosed
US-11177449-B2 P-type semiconductor layer, P-type multilevel element, and manufacturing method for the element INDUSTRY-UNIVERSITY COOPERATION FOUNDATION HANYANG UNIVERSITY (KR) 2021-11-16 US disclosed
US-20210098724-A1 THIN FILM TRANSISTOR INDUSTRY-UNIVERSITY COOPERATION FOUNDATION HANYANG UNIVERSITY (KR) 2021-04-01 US disclosed
US-20200292939-A1 PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE DRY FILM, METHOD OF MANUFACTURING PHOTOSENSITIVE DRY FILM, METHOD OF MANUFACTURING PATTERNED RESIST FILM, METHOD OF MANUFACTURING SUBSTRATE WITH TEMPLATE AND METHOD OF MANUFACTURING PLATED ARTICLE TOKYO OHKA KOGYO CO., LTD. (JP) 2020-09-17 US disclosed
US-20200194699-A1 P-TYPE SEMICONDUCTOR LAYER, P-TYPE MULTILEVEL ELEMENT, AND MANUFACTURING METHOD FOR THE ELEMENT INDUSTRY-UNIVERSITY COOPERATION FOUNDATION HANYANG UNIVERSITY (KR) 2020-06-18 US disclosed
WO-2009105776-A1 DIAMIDE INHIBITORS OF CYTOCHROME P450 SEQUOIA PHARMACEUTICALS, INC. (US) 2009-08-27 WO disclosed
EP-0757060-B1 Process for producing vinyl alcohol polymer KURARAY CO (JP) 1999-10-20 EP disclosed
US-5710211-A REACTION OF POLYMER WITH COMPOUND HAVING A THIOL OR THIOESTER AND HYDROLYSIS TO FORM VINYL ALCOHOL KURARAY CO., LTD. (JP) 1998-01-20 US disclosed
EP-0757060-A2 Process for producing vinyl alcohol polymer KURARAY CO., LTD. (JP) 1997-02-05 EP disclosed
US-4180672-A 2-Organothio-2-cyclopentenones, organothio-cyclopentanes derived therefrom TEIJIN LIMITED (JP) 1979-12-25 US disclosed