SCHEMBL8430737

SCHEMBL8430737

Oc1ccc(O)c(Cc2ccccc2Cc2cc(O)ccc2O)c1

nearest known ligand 0.58

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HSPA5 P11021 2/20 0.58
KEAP1 Q14145 1/20 0.52
MAPT P10636 4/20 0.51
MEN1 O00255 4/20 0.51
KMT2A Q03164 4/20 0.51
LMNA P02545 3/20 0.51
HTT P42858 3/20 0.51
GAA P10253 2/20 0.51
ALDH1A1 P00352 2/20 0.51
PKM P14618 1/20 0.51
HKDC1 Q2TB90 1/20 0.51
KDM4E B2RXH2 1/20 0.51
POLB P06746 1/20 0.51
L3MBTL1 Q9Y468 1/20 0.51
HPGD P15428 3/20 0.50
HIF1A Q16665 3/20 0.50
IDO1 P14902 3/20 0.50
CYP3A4 P08684 2/20 0.50
ALOX15 P16050 2/20 0.50
SLC22A1 O15245 1/20 0.50

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL31244463 0.91 MAPT (0.58) HSPA5KEAP1MAPTMEN1KMT2A
SCHEMBL50932 0.91 MAPT (0.58) HSPA5KEAP1MAPTMEN1KMT2A
SCHEMBL2513625 0.87 HSPA5 (0.45) HSPA5KEAP1MAPTMEN1KMT2A
SCHEMBL7759834 0.86 KEAP1 (0.48) HSPA5KEAP1MAPTMEN1KMT2A
SCHEMBL2512174 0.83 CETP (0.49) HSPA5MAPTMEN1KMT2ALMNA
SCHEMBL390179 0.83 ALOX5 (0.71) KEAP1MAPTMEN1KMT2ALMNA
SCHEMBL28802349 0.80 GAA (0.44) HSPA5KEAP1MAPTMEN1KMT2A
SCHEMBL11119190 0.79 ESR1 (0.49) HSPA5KEAP1MAPTMEN1KMT2A
Bromide SCHEMBL27886793 0.79 GAA (0.43) HSPA5KEAP1MAPTMEN1KMT2A
Hydrochloric Acid SCHEMBL28104026 0.79 GAA (0.43) HSPA5KEAP1MAPTMEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5945516-A PRIOR TO ESTERIFICATION OF THE POLYHYDROXY PHENOL WITH THE NAPHTHOQUINONE DIAZIDE SULFONYL HALIDE, THE REACTANTS ARE INITIALLY DISSOLVED IN AN APROTIC SOLVENT TOGETHER WITH STRONG BASE; NONPRECIPITATING, FOR FORMATION OF PHOTORESISTS SHIPLEY COMPANY, L.L.C. (US) 1999-08-31 US disclosed
US-5821345-A DISSOLVING WITH A STRONG BASE AND APROTIC SOLVENT; ESTER INTERCHANGE SHIPLEY COMPANY, L.L.C. (US) 1998-10-13 US disclosed