SCHEMBL8433400

SCHEMBL8433400

CC(CC(C)(C)C)=C(C)C(=O)OO

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3080795 0.73 HMGCR (0.36)
SCHEMBL28667481 0.73 HMGCR (0.31)
SCHEMBL6915530 0.73 ALDH1A1 (0.38)
SCHEMBL6366537 0.71 TSHR (0.43)
SCHEMBL5491522 0.71 TSHR (0.43)
SCHEMBL2100269 0.70 TET2 (0.35)
SCHEMBL122716 0.67
SCHEMBL15525764 0.66
SCHEMBL10797003 0.65 ALDH1A1 (0.34)
SCHEMBL23929372 0.64

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5889074-A COATING WITH CURABLE POLYMER AND SILANE COUPLING AGENT DAINIPPON INK AND CHEMICALS, INC. (JP) 1999-03-30 US disclosed
US-5717004-A COMPRISES ATLEAST TWO ACRYLOYL GROUP CONTAINING COMPOUNDS WHEREIN THE ACRYLOYL GROUP IS FLUOROACRYLOYL, METHACRYLOYL OR ACRYLOYL; HIGH MECHANICAL STRENGTH DAINIPPON INK & CHEMICALS, INC. (JP) 1998-02-10 US disclosed
EP-0435354-B1 Active energy ray-curable composition and applicable method DAINIPPON INK & CHEMICALS (JP) 1995-09-06 EP disclosed
EP-0435354-A2 Active energy ray-curable composition and applicable method DAINIPPON INK AND CHEMICALS, INC. (JP) 1991-07-03 EP disclosed