⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2360409 | 0.76 | — | — | |
| SCHEMBL22982398 | 0.76 | — | — | |
| SCHEMBL7064283 | 0.66 | HSD11B1 (0.32) | — | |
| SCHEMBL27225513 | 0.64 | PKM (0.39) | — | |
| SCHEMBL22981789 | 0.62 | — | — | |
| SCHEMBL216451 | 0.60 | PKM (0.37) | — | |
| SCHEMBL22982388 | 0.59 | — | — | |
| SCHEMBL24173315 | 0.58 | PKM (0.44) | — | |
| SCHEMBL546365 | 0.58 | GRIN2D (0.35) | — | |
| SCHEMBL3221210 | 0.57 | GRIN2D (0.31) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 31 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1267210-B1 | Positive resist composition | FUJIFILM CORP (JP) | 2018-02-21 | — | — | EP | claimed |
| US-6852468-B2 | Positive resist composition | FUJI PHOTO FILM CO., LTD. (JP) | 2005-02-08 | — | — | US | claimed |
| US-20030077543-A1 | Positive resist composition | FUJI PHOTO FILM CO., LTD. | 2003-04-24 | — | — | US | claimed |
| EP-1267210-A2 | Positive resist composition | FUJI PHOTO FILM CO., LTD. (JP) | 2002-12-18 | — | — | EP | claimed |
| EP-1267210-B1 | Positive resist composition | FUJIFILM CORP (JP) | 2018-02-21 | — | — | EP | disclosed |
| US-9529259-B2 | Radiation-sensitive resin composition, resist pattern-forming method, acid diffusion control agent, compound, and method for producing compound | JSR CORPORATION (JP) | 2016-12-27 | — | — | US | disclosed |
| US-9354523-B2 | Composition for resist pattern-refinement, and fine pattern-forming method | JSR CORPORATION (JP) | 2016-05-31 | — | — | US | disclosed |
| US-20160011513-A1 | COMPOSITION FOR FORMING FINE RESIST PATTERN, AND FINE PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2016-01-14 | — | — | US | disclosed |
| US-20150355539-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN-FORMING METHOD, ACID DIFFUSION CONTROL AGENT, COMPOUND, AND METHOD FOR PRODUCING COMPOUND | JSR CORPORATION (JP) | 2015-12-10 | — | — | US | disclosed |
| US-20150141460-A1 | Anti-inflammatory Compositions | CAMBRIDGE ENTERPRISE LIMITED (GB) | 2015-05-21 | — | — | US | disclosed |
| US-8853200-B2 | Treatment of rheumatoid arthritis with 3-amino lactam compounds | CAMBRIDGE ENTERPRISE LIMITED (GB) | 2014-10-07 | — | — | US | disclosed |
| EP-2296039-B1 | Positive photosensitive composition | FUJIFILM CORP (JP) | 2013-09-25 | — | — | EP | disclosed |
| US-6852468-B2 | Positive resist composition | FUJI PHOTO FILM CO., LTD. (JP) | 2005-02-08 | — | — | US | disclosed |
| US-6852468-B2 | Positive resist composition | FUJI PHOTO FILM CO., LTD. (JP) | 2005-02-08 | — | — | US | disclosed |
| EP-1267210-A3 | Positive resist composition | FUJI PHOTO FILM CO., LTD. (JP) | 2003-10-08 | — | — | EP | disclosed |
| JP-2003177538-A | POSITIVE RESIST COMPOSITION | FUJI PHOTO FILM CO LTD | 2003-06-27 | — | — | JP | disclosed |
| US-20030077543-A1 | Positive resist composition | FUJI PHOTO FILM CO., LTD. | 2003-04-24 | — | — | US | disclosed |
| US-20030077543-A1 | Positive resist composition | FUJI PHOTO FILM CO., LTD. | 2003-04-24 | — | — | US | disclosed |
| EP-1267210-A2 | Positive resist composition | FUJI PHOTO FILM CO., LTD. (JP) | 2002-12-18 | — | — | EP | disclosed |
| EP-1267210-A2 | Positive resist composition | FUJI PHOTO FILM CO., LTD. (JP) | 2002-12-18 | — | — | EP | disclosed |