SCHEMBL8439010

SCHEMBL8439010

C=C(C)C(=C)OCC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13862155 0.83 ALDH1A1 (0.44)
SCHEMBL12529982 0.78 THRB (0.41)
SCHEMBL269750 0.77
SCHEMBL15803918 0.77
Methacrylic Acid SCHEMBL28219636 0.76 ALDH1A1 (0.46)
SCHEMBL23837705 0.75
SCHEMBL16491431 0.75
SCHEMBL172783 0.73
SCHEMBL28270615 0.73 ALDH1A1 (0.47)
SCHEMBL12735542 0.73 THRB (0.31)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 43 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11822248-B2 Coating compositions for use with an overcoated photoresist ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD. (KR) 2023-11-21 US disclosed
US-11762292-B2 Coating compositions for use with an overcoated photoresist ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD. (KR) 2023-09-19 US disclosed
US-10025181-B2 Polymer composition and photoresist comprising same DOW GLOBAL TECHNOLOGIES LLC (US) 2018-07-17 US disclosed
US-20180095367-A1 COATING COMPOSITIONS FOR USE WITH AN OVERCOATED PHOTORESIST ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD. (KR) 2018-04-05 US disclosed
US-20170336709-A1 COATING COMPOSITIONS FOR USE WITH AN OVERCOATED PHOTORESIST DUPONT SPECIALTY MATERIALS KOREA LTD (KR) 2017-11-23 US disclosed
US-20170261853-A1 NANOPARTICLE - POLYMER RESISTS ROHM & HAAS ELECT MAT (US) 2017-09-14 US disclosed
US-9703192-B2 Onium compounds and methods of synthesis thereof ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2017-07-11 US disclosed
US-9696624-B2 Nanoparticle-polymer resists ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2017-07-04 US disclosed
US-20170153547-A1 COATING COMPOSITIONS FOR USE WITH AN OVERCOATED PHOTORESIST DUPONT SPECIALTY MATERIALS KOREA LTD (KR) 2017-06-01 US disclosed
US-20170123319-A1 COATING COMPOSITIONS FOR USE WITH AN OVERCOATED PHOTORESIST DUPONT SPECIALTY MATERIALS KOREA LTD (KR) 2017-05-04 US disclosed
US-20140080056-A1 ONIUM COMPOUNDS AND METHODS OF SYNTHESIS THEREOF ROHM AND HAAS ELECTRONIC MATERIALS, LLC 2014-03-20 US disclosed
US-20140080059-A1 ACID GENERATOR COMPOUNDS AND PHOTORESISTS COMPRISING SAME U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT 2014-03-20 US disclosed
US-20140080058-A1 ACID GENERATORS AND PHOTORESISTS COMPRISING SAME U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT 2014-03-20 US disclosed
US-20140080060-A1 ACID GENERATOR COMPOUNDS AND PHOTORESISTS COMPRISING SAME ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2014-03-20 US disclosed
US-20140065550-A1 POLYMER COMPRISING END GROUPS CONTAINING PHOTOACID GENERATOR, PHOTORESIST COMPRISING THE POLYMER, AND METHOD OF MAKING A DEVICE DOW GLOBAL TECHNOLOGIES LLC (US) 2014-03-06 US disclosed
US-20130209934-A1 PHOTOSENSITIVE COPOLYMER, PHOTORESIST COMPRISING THE COPOLYMER, AND ARTICLES FORMED THEREFROM ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2013-08-15 US disclosed
US-20120328983-A1 POLYMER COMPOSITION AND PHOTORESIST COMPRISING SAME DOW GLOBAL TECHNOLOGIES LLC (US) 2012-12-27 US disclosed
US-8329846-B2 Bisphenol-A replacement materials EMPIRE TECHNOLOGY DEVELOPMENT LLC (US) 2012-12-11 US disclosed
US-20120283359-A1 BISPHENOL-A REPLACEMENT MATERIALS CRESTLINE DIRECT FINANCE, L.P. 2012-11-08 US disclosed
US-5932649-A ADDITION-CONDENSATION COPOLYMER BRIDGESTONE CORPORATION (JP) 1999-08-03 US disclosed