Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TDP1 | Q9NUW8 | 3/20 | 0.56 |
| ▸ | MAPT | P10636 | 3/20 | 0.56 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.56 |
| ▸ | HPGD | P15428 | 2/20 | 0.56 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.56 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.56 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.56 |
| ▸ | MEN1 | O00255 | 1/20 | 0.56 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.56 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.56 |
| ▸ | CES1 | P23141 | 1/20 | 0.56 |
| ▸ | GSK3B | P49841 | 2/20 | 0.52 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.52 |
| ▸ | PTPN1 | P18031 | 2/20 | 0.52 |
| ▸ | TRPA1 | O75762 | 1/20 | 0.52 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.52 |
| ▸ | NPC1 | O15118 | 5/20 | 0.50 |
| ▸ | L3MBTL1 | Q9Y468 | 4/20 | 0.50 |
| ▸ | RAB9A | P51151 | 4/20 | 0.50 |
| ▸ | LMNA | P02545 | 2/20 | 0.50 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28200543 | 0.84 | MAPT (0.58) | TDP1MAPTMAPK1HPGDKMT2A | |
| SCHEMBL864716 | 0.81 | MAPT (0.61) | TDP1MAPTMAPK1HPGDKMT2A | |
| SCHEMBL9305304 | 0.77 | HPGD (0.62) | TDP1MAPTMAPK1HPGDKMT2A | |
| SCHEMBL291698 | 0.77 | L3MBTL1 (0.59) | TDP1MAPTMAPK1HPGDKMT2A | |
| SCHEMBL291697 | 0.77 | L3MBTL1 (0.59) | TDP1MAPTMAPK1HPGDKMT2A | |
| SCHEMBL28612997 | 0.77 | MAPT (0.56) | TDP1MAPTMAPK1HPGDKMT2A | |
| SCHEMBL10809629 | 0.77 | L3MBTL1 (0.59) | TDP1MAPTMAPK1HPGDKMT2A | |
| SCHEMBL2388014 | 0.77 | TDP1 (0.56) | TDP1MAPTMAPK1HPGDKMT2A | |
| SCHEMBL5852707 | 0.77 | MAPT (0.56) | TDP1MAPTMAPK1HPGDKMT2A | |
| SCHEMBL8158863 | 0.77 | GSK3B (0.58) | TDP1MAPTMAPK1HPGDKMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 103 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20250321486-A1 | METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE | FUJIFILM CORPORATION (JP) | 2025-10-16 | — | — | US | disclosed |
| US-20250271765-A1 | METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE | FUJIFILM CORPORATION (JP) | 2025-08-28 | — | — | US | disclosed |
| US-12386265-B2 | Pattern forming method and method for manufacturing electronic device | FUJIFILM CORPORATION (JP) | 2025-08-12 | — | — | US | disclosed |
| US-12372873-B2 | Treatment liquid for manufacturing semiconductor, pattern forming method using the same, and method of manufacturing electronic device using the same | FUJIFILM CORPORATION (JP) | 2025-07-29 | — | — | US | disclosed |
| US-12313976-B2 | Storage container storing treatment liquid for manufacturing semiconductor | FUJIFILM CORPORATION (JP) | 2025-05-27 | — | — | US | disclosed |
| US-12306538-B2 | Treatment liquid and pattern forming method | FUJIFILM CORPORATION (JP) | 2025-05-20 | — | — | US | disclosed |
| US-20240295822-A1 | PATTERN FORMING METHOD AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2024-09-05 | — | — | US | disclosed |
| US-12013644-B2 | Method for manufacturing electronic device | FUJIFILM CORPORATION (JP) | 2024-06-18 | — | — | US | disclosed |
| US-20240103374-A1 | TREATMENT LIQUID FOR MANUFACTURING SEMICONDUCTOR, PATTERN FORMING METHOD USING THE SAME, AND METHOD OF MANUFACTURING ELECTRONIC DEVICE USING THE SAME | FUJIFILM CORPORATION (JP) | 2024-03-28 | — | — | US | disclosed |
| US-11892775-B2 | Storage container storing treatment liquid for manufacturing semiconductor | FUJIFILM CORPORATION (JP) | 2024-02-06 | — | — | US | disclosed |
| US-6808862-B2 | INCLUDING A COMPOUND (ESPECIALLY A SULFONIUM SALT) THAT GENERATES AN ALPHA-FLUOROALKANESULFONIC ACID UPON IRRADIATION; A (NON-FLUORO ALKANESULFONIC ACID ONIUM SALT; AND A MONOCYCLIC OR POLYCYCLIC ALICYCLIC HYDROCARBON RESIN | FUJI PHOTO FILM CO., LTD. (JP) | 2004-10-26 | — | — | US | disclosed |
| US-20040185373-A1 | Photosensitive composition | FUJI PHOTO FILM CO., LTD. | 2004-09-23 | — | — | US | disclosed |
| EP-1260864-B1 | Positive photosensitive composition | FUJI PHOTO FILM CO LTD (JP) | 2004-08-18 | — | — | EP | disclosed |
| US-20030224285-A1 | Positive photosensitive composition | FUJI PHOTO FILM CO., LTD. | 2003-12-04 | — | — | US | disclosed |
| US-20030186161-A1 | Positive photosensitive composition | FUJI PHOTO FILM CO., LTD. | 2003-10-02 | — | — | US | disclosed |
| US-20030077540-A1 | Positive photosensitive composition | FUJI PHOTO FILM CO., LTD. | 2003-04-24 | — | — | US | disclosed |
| US-20030044717-A1 | Positive photosensitive composition | FUJI PHOTO FILM CO., LTD. | 2003-03-06 | — | — | US | disclosed |
| US-20030010748-A1 | Positive photosensitive compositions | FUJI PHOTO FILM CO., LTD. | 2003-01-16 | — | — | US | disclosed |
| EP-1273970-A2 | Positive photosensitive composition | FUJI PHOTO FILM CO., LTD. (JP) | 2003-01-08 | — | — | EP | disclosed |
| EP-1260864-A1 | Positive photosensitive composition | FUJI PHOTO FILM CO., LTD. (JP) | 2002-11-27 | — | — | EP | disclosed |