SCHEMBL845389

SCHEMBL845389

O=CNOC=O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8915268 0.72
SCHEMBL11435255 0.67
SCHEMBL9067452 0.67
SCHEMBL54204 0.62
SCHEMBL9472108 0.61
SCHEMBL502054 0.61
SCHEMBL2163069 0.61
SCHEMBL16127774 0.61
SCHEMBL54608 0.61
SCHEMBL28906986 0.61

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 43 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-117348341-A Metal-containing photoresist developer composition and pattern forming method 三星SDI株式会社 2024-01-05 CN claimed
CN-112110475-B Production process for preparing zinc oxide by using paste precursor 安徽省含山县锦华氧化锌厂 2022-06-21 CN claimed
CN-112110475-A Production process for preparing zinc oxide by using paste precursor 安徽省含山县锦华氧化锌厂 2020-12-22 CN claimed
CN-107074911-A Peptide nucleic acid monomer and oligomer 优基艾森斯股份公司 2017-08-18 CN claimed
CN-117597628-A Method for forming pattern 三星SDI株式会社 2024-02-23 CN disclosed
CN-117348341-A Metal-containing photoresist developer composition and pattern forming method 三星SDI株式会社 2024-01-05 CN disclosed
CN-115535982-B Preparation method of optical-grade aluminum dihydrogen phosphate 上海太洋科技有限公司 2023-04-14 CN disclosed
CN-112041714-B Optical film, polarizing plate, liquid crystal panel, touch panel, and image display device 富士胶片株式会社 2023-01-17 CN disclosed
CN-115535982-A Preparation method of optical-grade aluminum dihydrogen phosphate 上海太洋科技有限公司 2022-12-30 CN disclosed
CN-112110475-B Production process for preparing zinc oxide by using paste precursor 安徽省含山县锦华氧化锌厂 2022-06-21 CN disclosed
CN-112110475-B Production process for preparing zinc oxide by using paste precursor 安徽省含山县锦华氧化锌厂 2022-06-21 CN disclosed
CN-114181107-A Synthesis method of benzyloxy amine hydrochloride 宁波睿田科技有限公司 2022-03-15 CN disclosed
WO-2010134926-A1 ACIDIC GAS CAPTURE BY DIAMINES BOARD OF REGENTS, THE UNIVERSITY OF TEXAS SYSTEM (US) 2010-11-25 WO disclosed
US-20100093924-A1 Modified Poly(meth)acrylate with Reactive Ethylenic Groups and Use Thereof LERSCHMACHER ANDREAS 2010-04-15 US disclosed
CN-101283008-A N-vinylcaprolactam-based copolymers and the use thereof as solubilizers BASF SE (DE) 2008-10-08 CN disclosed
CN-101039701-A Prodrugs and codrug comprising a biocleavable disulfide linker NICHOLAS PIRAMAL INDIA LTD (IN) 2007-09-19 CN disclosed
CN-1742066-A Method of polishing a silicon-containing dielectric CABOT MICROELECTRONICS CORP (US) 2006-03-01 CN disclosed
WO-2000026209-A1 ANTI-INFLAMMATORY 4-PHENYL-5-PYRIMIDINYL-IMIDAZOLES NOVARTIS AG (CH) 2000-05-11 WO disclosed
CN-1111453-A Aryl sulfonamide derivatives and pharmaceutical compositions containing the same NIPPON KOKAN KK (JP) 1995-11-08 CN disclosed
EP-0029529-A1 Reaction products of sulfone or carboxamido carboxylic acids with alkanol amines, and their use as corrosion inhibitors with low foam formation BASF Aktiengesellschaft (DE) 1981-06-03 EP disclosed