SCHEMBL8458580

SCHEMBL8458580

[CH2]c1c(OC)cc(OC)cc1[N+](=O)[O-]

nearest known ligand 0.49

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPT P10636 3/20 0.49
KDM4E B2RXH2 3/20 0.49
MEN1 O00255 3/20 0.49
KMT2A Q03164 3/20 0.49
MAPK1 P28482 2/20 0.49
G6PD P11413 1/20 0.49
PKM P14618 1/20 0.49
NPSR1 Q6W5P4 1/20 0.49
RXFP1 Q9HBX9 1/20 0.49
APOBEC3G Q9HC16 1/20 0.49
ALDH1A1 P00352 5/20 0.46
TDP1 Q9NUW8 2/20 0.46
CYP3A4 P08684 1/20 0.45
ALOX15 P16050 1/20 0.45
PRKDC P78527 1/20 0.45
HSD17B10 Q99714 1/20 0.45
L3MBTL1 Q9Y468 2/20 0.41
CYP19A1 P11511 1/20 0.41
NPC1 O15118 1/20 0.40
RAB9A P51151 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11505260 0.82 HTT (0.50) MAPTKDM4EMEN1KMT2AMAPK1
SCHEMBL2591957 0.80 MAPK1 (0.50) MAPTKDM4EMEN1KMT2AMAPK1
SCHEMBL11273519 0.79 MAPT (0.66) MAPTKDM4EMEN1KMT2AMAPK1
SCHEMBL3842938 0.76 ERN1 (0.56) MAPTKDM4EMEN1KMT2AMAPK1
SCHEMBL34336 0.76 ALDH1A1 (0.53) MAPTKDM4EMEN1KMT2AMAPK1
SCHEMBL1577679 0.75 MEN1 (0.43) MAPTKDM4EMEN1KMT2AMAPK1
SCHEMBL28249130 0.75 ALDH1A1 (0.49) MAPTKDM4EMEN1KMT2APKM
SCHEMBL28248598 0.75 ALDH1A1 (0.49) MAPTKDM4EMEN1KMT2APKM
SCHEMBL11796350 0.75 MAPT (0.56) MAPTKDM4EMEN1KMT2AMAPK1
SCHEMBL9657631 0.75 MAPT (0.56) MAPTKDM4EMEN1KMT2AMAPK1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5866548-A ACTIVATION BY ULTRAVIOLET LIGHT THE REGENTS OF THE UNIVERSITY OF CALIFORNIA (US) 1999-02-02 US disclosed
EP-0337258-B1 LIGHT SENSITIVE COMPOSITIONS FOR LIGHT SENSITIVE COATING MATERIALS AND PROCESSES FOR OBTAINING RELIEF PATTERNS AND IMAGES BASF Aktiengesellschaft (DE) 1993-06-23 EP disclosed
EP-0277555-B1 COPOLYMERS WITH 0-NITROCARBINOL ESTER GROUPS, AND PROCESS FOR PREPARING TWO-LAYER RESISTS AND SEMICONDUCTOR DEVICES BASF Aktiengesellschaft (DE) 1992-04-08 EP disclosed
EP-0271010-B1 COPOLYMERS WITH 0-NITROCARBINOL ESTER GROUPS, AND THEIR USE BASF Aktiengesellschaft (DE) 1991-12-11 EP disclosed
US-5064746-A RADIATION-SENSITIVE MIXTURE FOR PHOTOSENSITIVE COATING MATERIALS AND THE PRODUCTION OF RELIEF PATTERNS AND RELIEF IMAGES BASF AKTIENGESELLSCHAFT (DE) 1991-11-12 US disclosed
EP-0337258-A2 Light sensitive compositions for light sensitive coating materials and processes for obtaining relief patterns and images BASF Aktiengesellschaft (DE) 1989-10-18 EP disclosed
US-4822866-A PLASMA RESISTANT PHOTORESISTS; REMOVABLE WITH WEAK ALKALINE SOLUTIONS BASF AKTIENGESELLSCHAFT (DE) 1989-04-18 US disclosed
US-4812542-A PHOTORESISTS, LIGHT-SENSITIVE COATINGS BASF AKTIENGESELLSCHAFT (DE) 1989-03-14 US disclosed
EP-0277555-A2 Copolymers with 0-nitrocarbinol ester groups, and process for preparing two-layer resists and semiconductor devices BASF Aktiengesellschaft (DE) 1988-08-10 EP disclosed
EP-0276709-A2 Copolymers with O-nitrocarbionol ester groups, their use and process for preparing semiconductor elements BASF Aktiengesellschaft (DE) 1988-08-03 EP disclosed
EP-0271010-A2 Copolymers with 0-nitrocarbinol ester groups, and their use BASF Aktiengesellschaft (DE) 1988-06-15 EP disclosed