Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ESR1 | P03372 | 6/20 | 0.78 |
| ▸ | ESR2 | Q92731 | 6/20 | 0.78 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.56 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.56 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.56 |
| ▸ | CA3 | P07451 | 1/20 | 0.56 |
| ▸ | THRB | P10828 | 1/20 | 0.56 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.56 |
| ▸ | CA6 | P23280 | 1/20 | 0.56 |
| ▸ | CASP1 | P29466 | 1/20 | 0.56 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.56 |
| ▸ | CA14 | Q9ULX7 | 1/20 | 0.56 |
| ▸ | APP | P05067 | 3/20 | 0.45 |
| ▸ | KIF11 | P52732 | 2/20 | 0.45 |
| ▸ | CYP19A1 | P11511 | 2/20 | 0.39 |
| ▸ | LMNA | P02545 | 1/20 | 0.39 |
| ▸ | TYR | P14679 | 1/20 | 0.39 |
| ▸ | AR | P10275 | 1/20 | 0.39 |
| ▸ | HPGD | P15428 | 1/20 | 0.39 |
| ▸ | TSHR | P16473 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3686864 | 0.89 | ESR1 (1.00) | ESR1ESR2CYP3A4HSD17B10ALDH1A1 | |
| SCHEMBL4560440 | 0.89 | ESR1 (1.00) | ESR1ESR2CYP3A4HSD17B10ALDH1A1 | |
| SCHEMBL21027 | 0.89 | ESR1 (1.00) | ESR1ESR2CYP3A4HSD17B10ALDH1A1 | |
| SCHEMBL10493869 | 0.89 | ESR1 (0.56) | ESR1ESR2CYP3A4HSD17B10ALDH1A1 | |
| SCHEMBL203678 | 0.89 | ESR1 (0.56) | ESR1ESR2CYP3A4HSD17B10ALDH1A1 | |
| SCHEMBL107817 | 0.89 | ESR1 (0.56) | ESR1ESR2CYP3A4HSD17B10ALDH1A1 | |
| SCHEMBL30625966 | 0.86 | ESR1 (0.95) | ESR1ESR2CYP3A4HSD17B10ALDH1A1 | |
| Hydrochloric Acid SCHEMBL8642415 | 0.86 | ESR1 (0.54) | ESR1ESR2CYP3A4ALDH1A1ALOX15 | |
| Ammonia Solution, Strong SCHEMBL3258090 | 0.86 | ESR1 (0.54) | ESR1ESR2CYP3A4HSD17B10ALDH1A1 | |
| Potassium SCHEMBL30701764 | 0.86 | ESR1 (0.95) | ESR1ESR2CYP3A4HSD17B10ALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-108948353-B | Preparation method of atomic oxygen resistant polyimide material | 义乌市诠铈新材料有限公司 | 2020-12-04 | — | — | CN | claimed |
| CN-108948353-B | Preparation method of atomic oxygen resistant polyimide material | 义乌市诠铈新材料有限公司 | 2020-12-04 | — | — | CN | disclosed |
| CN-108948353-B | Preparation method of atomic oxygen resistant polyimide material | 义乌市诠铈新材料有限公司 | 2020-12-04 | — | — | CN | disclosed |
| CN-108948353-A | A kind of preparation method of anti-atomic oxygen polyimides new material | 王金桢 | 2018-12-07 | — | — | CN | disclosed |
| CN-108948353-A | A kind of preparation method of anti-atomic oxygen polyimides new material | 王金桢 | 2018-12-07 | — | — | CN | disclosed |
| EP-0659802-B1 | Polyimide | MITSUI CHEMICALS INC (JP) | 1999-03-17 | — | — | EP | disclosed |
| EP-0478321-B1 | Photosenstive resin composition for forming polyimide film pattern and method of forming polyimide film pattern | TOSHIBA KK (JP) | 1997-11-12 | — | — | EP | disclosed |
| US-5631377-A | LONG-CHAIN AROMATIC DIAMINE MONOMER; MELT PROCESSABILITY, HEAT RESISTANCE | MITSUI TOATSU CHEMICALS, INC. (JP) | 1997-05-20 | — | — | US | disclosed |
| US-5518864-A | PHOTOSENSITIVE, QUINONE DIAZIDE | KABUSHIKI KAISHA TOSHIBA (JP) | 1996-05-21 | — | — | US | disclosed |
| US-5508377-A | IMPROVED PROCESSABILITY, HEAT RESISTANCE; ELECTRONICS, STRUCTURAL MATERIALS | MITSUI TOATSU CHEMICALS, INC. (JP) | 1996-04-16 | — | — | US | disclosed |
| EP-0431971-B1 | Photosensitive composition and resin-encapsulated semiconductor device | TOSHIBA KK (JP) | 1995-07-19 | — | — | EP | disclosed |
| EP-0659802-A1 | Polyimide | MITSUI TOATSU CHEMICALS, Inc. (JP) | 1995-06-28 | — | — | EP | disclosed |
| US-5348835-A | Without photoresist | KABUSHIKI KAISHA TOSHIBA (JP) | 1994-09-20 | — | — | US | disclosed |
| US-5340684-A | Polyimidesiloxane copolymers | KABUSHIKI KAISHA TOSHIBA (JP) | 1994-08-23 | — | — | US | disclosed |
| EP-0478321-A1 | Photosenstive resin composition for forming polyimide film pattern and method of forming polyimide film pattern | KABUSHIKI KAISHA TOSHIBA (JP) | 1992-04-01 | — | — | EP | disclosed |
| EP-0431971-A2 | Photosensitive composition and resin-encapsulated semiconductor device | KABUSHIKI KAISHA TOSHIBA (JP) | 1991-06-12 | — | — | EP | disclosed |