Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | NR1H2 | P55055 | 11/20 | 0.43 |
| ▸ | NR1H3 | Q13133 | 11/20 | 0.43 |
| ▸ | AR | P10275 | 1/20 | 0.34 |
| ▸ | MEN1 | O00255 | 1/20 | 0.34 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.34 |
| ▸ | TSHR | P16473 | 1/20 | 0.34 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.34 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.34 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.34 |
| ▸ | RORA | P35398 | 1/20 | 0.34 |
| ▸ | RORC | P51449 | 1/20 | 0.34 |
| ▸ | MLYCD | O95822 | 1/20 | 0.32 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.32 |
| ▸ | PGR | P06401 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL16850002 | 0.91 | NR1H2 (0.41) | NR1H2NR1H3ARMEN1ALOX15 | |
| SCHEMBL12357847 | 0.91 | NR1H2 (0.41) | NR1H2NR1H3ARMEN1ALOX15 | |
| SCHEMBL12175976 | 0.89 | NR1H2 (0.40) | NR1H2NR1H3ARMEN1ALOX15 | |
| SCHEMBL15496930 | 0.88 | NR1H2 (0.39) | NR1H2NR1H3ARMEN1ALOX15 | |
| SCHEMBL15496923 | 0.88 | NR1H2 (0.39) | NR1H2NR1H3ARMEN1ALOX15 | |
| SCHEMBL15496935 | 0.87 | NR1H2 (0.41) | NR1H2NR1H3MEN1ALOX15TSHR | |
| SCHEMBL15496922 | 0.82 | PTGS1 (0.39) | NR1H2NR1H3MEN1MAPK1KMT2A | |
| SCHEMBL8586265 | 0.81 | NR1H2 (0.48) | NR1H2NR1H3ARMEN1ALOX15 | |
| SCHEMBL4598751 | 0.80 | TP53 (0.42) | NR1H2NR1H3ARMEN1ALOX15 | |
| SCHEMBL12635205 | 0.79 | HSD11B1 (0.35) | NR1H2NR1H3 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 352 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12036025-B2 | Bio-electrode, method for manufacturing bio-electrode, and method for measuring biological signal | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-07-16 | — | — | US | disclosed |
| US-12038692-B2 | Method for producing substrate with patterned film and fluorine-containing copolymer | CENTRAL GLASS COMPANY, LIMITED (JP) | 2024-07-16 | — | — | US | disclosed |
| US-12038691-B2 | Method for producing substrate with patterned film | CENTRAL GLASS COMPANY, LIMITED (JP) | 2024-07-16 | — | — | US | disclosed |
| US-20240215890-A1 | Bio-Electrode, Bio-Electrode Composition, And Method For Manufacturing Bio-Electrode | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-07-04 | — | — | US | disclosed |
| US-20240134278-A1 | SURFACE MODIFIER, PHOTOSENSITIVE RESIN COMPOSITION, CURED PRODUCT, AND DISPLAY | CENTRAL GLASS COMPANY, LIMITED (JP) | 2024-04-25 | — | — | US | disclosed |
| US-20240134276-A1 | PHOTOSENSITIVE RESIN COMPOSITION, CURED PRODUCT, FLUORINE-CONTAINING RESIN CURED FILM, AND DISPLAY | CENTRAL GLASS COMPANY, LIMITED (JP) | 2024-04-25 | — | — | US | disclosed |
| US-11835860-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-12-05 | — | — | US | disclosed |
| US-11822248-B2 | Coating compositions for use with an overcoated photoresist | ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD. (KR) | 2023-11-21 | — | — | US | disclosed |
| US-11815814-B2 | Iodized aromatic carboxylic acid type pendant-containing polymer, resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-11-14 | — | — | US | disclosed |
| US-11786160-B2 | Bio-electrode composition, bio-electrode, and method for manufacturing bio-electrode | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-10-17 | — | — | US | disclosed |
| US-7402626-B2 | Top coat composition | CENTRAL GLASS COMPANY, LIMITED (JP) | 2008-07-22 | — | — | US | disclosed |
| US-20080020290-A1 | Negative resist composition and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2008-01-24 | — | — | US | disclosed |
| US-20080020290-A1 | Negative resist composition and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2008-01-24 | — | — | US | disclosed |
| US-20080020290-A1 | Negative resist composition and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2008-01-24 | — | — | US | disclosed |
| US-7282549-B2 | Fluorine-containing compounds, fluorine-containing polymerizable monomers, fluorine-containing polymers, dissolution inhibitors, and resist compositions | CENTRAL GLASS COMPANY LIMITED (JP) | 2007-10-16 | — | — | US | disclosed |
| US-7282549-B2 | Fluorine-containing compounds, fluorine-containing polymerizable monomers, fluorine-containing polymers, dissolution inhibitors, and resist compositions | CENTRAL GLASS COMPANY LIMITED (JP) | 2007-10-16 | — | — | US | disclosed |
| US-7232917-B2 | Cyclic fluorine compounds, polymerizable fluoromonomers, fluoropolymers, and resist materials containing the fluoropolymers and method for pattern formation | CENTRAL GLASS COMPANY, LIMITED (JP) | 2007-06-19 | — | — | US | disclosed |
| US-7232917-B2 | Cyclic fluorine compounds, polymerizable fluoromonomers, fluoropolymers, and resist materials containing the fluoropolymers and method for pattern formation | CENTRAL GLASS COMPANY, LIMITED (JP) | 2007-06-19 | — | — | US | disclosed |
| US-7169869-B2 | Polymers, resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-01-30 | — | — | US | disclosed |
| US-7169869-B2 | Polymers, resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-01-30 | — | — | US | disclosed |