Known targets — ChEMBL curated mechanism
ABL1BMXBRAFBTKCHRNA4CHRNB2CSNK1EEGFRERBB2F10FLT1FLT3FLT4IGF1RINSRITKJAK3KDRKITOPRM1PARP1PARP2PDGFRBPIK3CDRAF1RETSLC18A2TECTXKdacAdacBdacCftsImrcAmrcBmrdArplArplBrplCrplDrplErplFrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmFrpmGrpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUykgMykgO
The experimentally established mechanism targets of None. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SNCA | P37840 | 1/20 | 0.39 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.38 |
| ▸ | LMNA | P02545 | 3/20 | 0.38 |
| ▸ | HTT | P42858 | 2/20 | 0.38 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.38 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.38 |
| ▸ | MAPT | P10636 | 1/20 | 0.38 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.38 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.38 |
| ▸ | CYP2D6 | P10635 | 2/20 | 0.38 |
| ▸ | BCHE | P06276 | 1/20 | 0.37 |
| ▸ | ACHE | P22303 | 1/20 | 0.37 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.37 |
| ▸ | MEN1 | O00255 | 2/20 | 0.37 |
| ▸ | PRSS1 | P07477 | 3/20 | 0.36 |
| ▸ | ACR | P10323 | 3/20 | 0.36 |
| ▸ | TP53 | P04637 | 1/20 | 0.36 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.35 |
| ▸ | CYP2C9 | P11712 | 2/20 | 0.35 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3959387 | 1.00 | SNCA (0.39) | SNCAALDH1A1LMNAHTTSMN1; SMN2 | |
| SCHEMBL3959379 | 0.95 | SMN1; SMN2 (0.42) | SNCAALDH1A1LMNAHTTSMN1; SMN2 | |
| SCHEMBL5619616 | 0.95 | SMN1; SMN2 (0.42) | SNCAALDH1A1LMNAHTTSMN1; SMN2 | |
| SCHEMBL8494334 | 0.95 | ALDH1A1 (0.43) | ALDH1A1LMNAMAPTTDP1BCHE | |
| SCHEMBL8496412 | 0.90 | HTT (0.41) | SNCAALDH1A1LMNAHTTSMN1; SMN2 | |
| SCHEMBL64967 | 0.88 | HTT (0.40) | ALDH1A1LMNAHTTSMN1; SMN2TDP1 | |
| SCHEMBL8493768 | 0.87 | SMN1; SMN2 (0.36) | SNCAALDH1A1LMNAHTTSMN1; SMN2 | |
| SCHEMBL8585387 | 0.87 | POLB (0.38) | ALDH1A1LMNAHTTSMN1; SMN2KDM4E | |
| Trifluoromethanesulfonic Acid SCHEMBL8494193 | 0.85 | BCHE (0.37) | ALDH1A1LMNAHTTSMN1; SMN2BCHE | |
| SCHEMBL8498317 | 0.84 | MAPT (0.36) | ALDH1A1LMNAHTTSMN1; SMN2KDM4E |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-5624787-A | NITROGENOUS COMPOUND AND SULFONIUM COMPOUND FOR POSITIVE PHOTORESISTS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1997-04-29 | — | — | US | claimed |
| EP-0665220-B1 | Novel sulfonium salt and chemically amplified positive resist composition | SHINETSU CHEMICAL CO (JP) | 1999-04-07 | — | — | EP | disclosed |
| US-5691112-A | P-TOLUENESULFONIC ACID TRIS(P-TERT-BUTOXYPHENYL) SULFONIUM AS PHOTOSENSITIVE ACID GENERATOR; FORMING SOLUBLE SURFACE LAYER | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1997-11-25 | — | — | US | disclosed |
| US-5633409-A | POSITIVE RESISTS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1997-05-27 | — | — | US | disclosed |
| US-5624787-A | NITROGENOUS COMPOUND AND SULFONIUM COMPOUND FOR POSITIVE PHOTORESISTS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1997-04-29 | — | — | US | disclosed |
| EP-0665220-A1 | Novel sulfonium salt and chemically amplified positive resist composition | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1995-08-02 | — | — | EP | disclosed |