SCHEMBL850569

SCHEMBL850569

CCCOCCCCCC(=O)O

nearest known ligand 0.60

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
GPR84 Q9NQS5 7/20 0.60
PPARG P37231 7/20 0.60
PPARD Q03181 7/20 0.60
PPARA Q07869 7/20 0.60
HDAC11 Q96DB2 5/20 0.60
TSHR P16473 5/20 0.60
PTPN1 P18031 3/20 0.60
ALDH1A1 P00352 3/20 0.60
TLR2 O60603 2/20 0.60
TDP1 Q9NUW8 2/20 0.60
FABP4 P15090 2/20 0.60
KMT2A Q03164 2/20 0.60
ALOX15 P16050 2/20 0.60
HSD17B10 Q99714 2/20 0.60
SLC22A6 Q4U2R8 1/20 0.60
SLC22A8 Q8TCC7 1/20 0.60
MEN1 O00255 1/20 0.60
ESR1 P03372 1/20 0.60
PDE4A P27815 1/20 0.60
PDE3A Q14432 1/20 0.60

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2722583 1.00 GPR84 (0.60) GPR84PPARGPPARDPPARAHDAC11
SCHEMBL8751200 1.00 GPR84 (0.60) GPR84PPARGPPARDPPARAHDAC11
SCHEMBL7198133 1.00 GPR84 (0.60) GPR84PPARGPPARDPPARAHDAC11
SCHEMBL2721732 1.00 GPR84 (0.60) GPR84PPARGPPARDPPARAHDAC11
SCHEMBL16401918 1.00 GPR84 (0.60) GPR84PPARGPPARDPPARAHDAC11
SCHEMBL448062 0.98 AKR1B1 (0.58) GPR84PPARGPPARDPPARAHDAC11
SCHEMBL20725734 0.96 AKR1B1 (0.56) GPR84PPARGPPARDPPARAHDAC11
Sebacic Acid SCHEMBL6342744 0.96 GPR84 (0.65) GPR84PPARGPPARDPPARAHDAC11
Adipic Acid SCHEMBL12980712 0.93 AKR1B1 (0.64) GPR84PPARGPPARDPPARAHDAC11
SCHEMBL23831109 0.91 GPR84 (0.74) GPR84PPARGPPARDPPARAHDAC11

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 33 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3683243-B1 PROCESS OF MANUFACTURE OF CATALYST AND PROPYLENE POLYMER THAT USE THIS OR COPOLYMER FOR PROPYLENE POLYMERIZATION HANWHA TOTALENERGIES PETROCHEMICAL CO LTD (KR) 2024-01-24 EP claimed
EP-0177807-B1 HEXANOATES, PROCESS FOR THEIR PREPARATION AND PERFUMES AND/OR FLAVOURING AGENTS HAVING A CONTENT OF SUCH COMPOUNDS L. GIVAUDAN & CIE Société Anonyme (CH) 1989-03-15 EP claimed
US-9951166-B2 Fluorine-containing, silicon-containing polymer and surface treatment agent DAIKIN INDUSTRIES, LTD. (JP) 2018-04-24 US disclosed
US-9909027-B2 Surface treatment composition DAIKIN INDUSTRIES, LTD. (JP) 2018-03-06 US disclosed
US-9487517-B2 Spiroimidazolone derivative CHUGAI SEIYAKU KABUSHIKI KAISHA (JP) 2016-11-08 US disclosed
US-9487517-B2 Spiroimidazolone derivative CHUGAI SEIYAKU KABUSHIKI KAISHA (JP) 2016-11-08 US disclosed
US-9487517-B2 Spiroimidazolone derivative CHUGAI SEIYAKU KABUSHIKI KAISHA (JP) 2016-11-08 US disclosed
US-20160289488-A1 SURFACE TREATMENT COMPOSITION DAIKIN INDUSTRIES, LTD. (JP) 2016-10-06 US disclosed
US-20160289488-A1 SURFACE TREATMENT COMPOSITION DAIKIN INDUSTRIES, LTD. (JP) 2016-10-06 US disclosed
US-9448482-B2 Pattern forming method, resist pattern formed by the method, method for manufacturing electronic device using the same, and electronic device FUJIFILM CORPORATION (JP) 2016-09-20 US disclosed
US-9423690-B2 Pattern forming method, electron beam-sensitive or extreme ultraviolet ray-sensitive resin composition, resist film, and method for manufacturing electronic device, and electronic device using the same FUJIFILM CORPORATION (JP) 2016-08-23 US disclosed
WO-2014030723-A1 PATTERN FORMING METHOD, ELECTRON BEAM-SENSITIVE OR EXTREME ULTRAVIOLET RAY-SENSITIVE RESIN COMPOSITION, RESIST FILM, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE USING THE SAME FUJIFILM CORPORATION (JP) 2014-02-27 WO disclosed
US-20120270838-A1 SPIROIMIDAZOLONE DERIVATIVE CHUGAI SEIYAKU KABUSHIKI KAISHA (JP) 2012-10-25 US disclosed
US-20120270838-A1 SPIROIMIDAZOLONE DERIVATIVE CHUGAI SEIYAKU KABUSHIKI KAISHA (JP) 2012-10-25 US disclosed
US-20120270838-A1 SPIROIMIDAZOLONE DERIVATIVE CHUGAI SEIYAKU KABUSHIKI KAISHA (JP) 2012-10-25 US disclosed
EP-2433940-A1 SPIROIMIDAZOLONE DERIVATIVE Chugai Seiyaku Kabushiki Kaisha (JP) 2012-03-28 EP disclosed
EP-2433940-A1 SPIROIMIDAZOLONE DERIVATIVE Chugai Seiyaku Kabushiki Kaisha (JP) 2012-03-28 EP disclosed
WO-2010126030-A1 SPIROIMIDAZOLONE DERIVATIVE 中外製薬株式会社 (JP) 2010-11-04 WO disclosed
US-20050042536-A1 Photosensitive resin composition comprising quinonediazide sulfate ester compound DONGJIN SEMICHEM CO. LTD. (KR) 2005-02-24 US disclosed
WO-2003036388-A1 PHOTOSNESITIVE RESIN COMPOSITION COMPRISING QUINONEDIAZIDE SULFATE ESTER COMPOUND DONGJIN SEMICHEM CO., LTD. (KR) 2003-05-01 WO disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20120270838-A1 SPIROIMIDAZOLONE DERIVATIVE WNK3, REN, SGK3 GPR84 1672/4885PPARG 1803/4885PPARD 971/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.