SCHEMBL8517433

SCHEMBL8517433

CCCCOCC(O)COc1ccc(-c2nc(-c3ccccc3)nc(-c3ccc(OCC(O)COCCCC)cc3O)n2)c(O)c1

nearest known ligand 0.42

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PLA2G4B P0C869 1/20 0.42
LMNA P02545 4/20 0.40
GAA P10253 2/20 0.40
MAPK10 P53779 1/20 0.40
CNR1 P21554 1/20 0.40
CNR2 P34972 1/20 0.40
GPR55 Q9Y2T6 1/20 0.40
KDM4E B2RXH2 2/20 0.39
SMN1; SMN2 Q16637 1/20 0.39
MAPT P10636 5/20 0.39
TDP1 Q9NUW8 3/20 0.39
ALDH1A1 P00352 3/20 0.39
HTT P42858 2/20 0.39
ATM Q13315 1/20 0.39
ADRB2 P07550 3/20 0.39
ADRB1 P08588 2/20 0.39
PTPN11 Q06124 1/20 0.38
NPSR1 Q6W5P4 2/20 0.37
CHRNA7 P36544 1/20 0.37
HSP90AA1 P07900 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8383224 1.00 PLA2G4B (0.42) PLA2G4BLMNAGAAMAPK10CNR1
SCHEMBL6334661 0.98 PLA2G4B (0.41) PLA2G4BLMNAGAAMAPK10CNR1
SCHEMBL6562548 0.97 PLA2G4B (0.47) PLA2G4BLMNAGAAMAPK10CNR1
SCHEMBL14112068 0.97 PLA2G4B (0.40) PLA2G4BLMNAGAAMAPK10CNR1
SCHEMBL8216433 0.96 LMNA (0.42) PLA2G4BLMNAGAAMAPK10CNR1
SCHEMBL6341883 0.95 PLA2G4B (0.46) PLA2G4BLMNAGAAMAPK10CNR1
SCHEMBL6331891 0.95 PLA2G4B (0.46) PLA2G4BLMNAGAAMAPK10CNR1
SCHEMBL38782 0.92 PLA2G4B (0.45) PLA2G4BLMNAGAACNR2KDM4E
SCHEMBL29363492 0.92 PLA2G4B (0.45) PLA2G4BLMNAGAACNR2KDM4E
SCHEMBL5645679 0.91 PLA2G4B (0.46) PLA2G4BLMNAGAAMAPK10CNR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8728712-B2 Polymerizable composition FUJIFILM CORPORATION (JP) 2014-05-20 US disclosed
US-20130143164-A1 POLYMERIZABLE COMPOSITION FUJIFILM CORPORATION (JP) 2013-06-06 US disclosed
US-7922947-B2 Method of producing dispersion FUJIFILM CORPORATION (JP) 2011-04-12 US disclosed
US-7166339-B1 Phase contrast plate comprising one sheet of cellulose ester film containing aromatic compound FUJIFILM CORPORATION (JP) 2007-01-23 US disclosed
US-5959008-A OXYGEN, LIGHT AND/OR HEAT STABILIZERS FOR POLYMERS CIBA SPECIALTY CHEMICALS CORP. (US) 1999-09-28 US disclosed
US-5869588-A UV ABSORBERS CIBA SPECIALTY CHEMICALS CORPORATION (US) 1999-02-09 US disclosed
US-5672704-A ULTRAVIOLET RADIATION STABILIZERS CIBA-GEIGY CORPORATION 1997-09-30 US disclosed
EP-0520938-B1 UV-absorber containing photographic material CIBA GEIGY AG (CH) 1997-09-24 EP disclosed
US-5538840-A SILVER HALIDE EMULSIONS AND POLYMERS ON SUBSTRATES WITH TRIAZINE PHENOLS CIBA-GEIGY CORPORATION (US) 1996-07-23 US disclosed
EP-0706083-A1 Photographic recording material containing an UV-absorber CIBA-GEIGY AG (CH) 1996-04-10 EP disclosed
US-5488108-A PROTECTIVE COATINGS FOR RADIATION RESISTANCE CIBA-GEIGY CORPORATION (US) 1996-01-30 US disclosed
US-5364749-A Photographic material containing UV absorber CIBA-GEIGY CORPORATION (US) 1994-11-15 US disclosed
EP-0520938-A1 UV-absorber containing photographic material CIBA-GEIGY AG (CH) 1992-12-30 EP disclosed