Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ESR1 | P03372 | 9/20 | 0.52 |
| ▸ | ESR2 | Q92731 | 6/20 | 0.52 |
| ▸ | HSD17B1 | P14061 | 1/20 | 0.48 |
| ▸ | MAPT | P10636 | 5/20 | 0.48 |
| ▸ | LMNA | P02545 | 5/20 | 0.48 |
| ▸ | HSD17B10 | Q99714 | 4/20 | 0.48 |
| ▸ | MEN1 | O00255 | 4/20 | 0.48 |
| ▸ | KMT2A | Q03164 | 4/20 | 0.48 |
| ▸ | CYP3A4 | P08684 | 3/20 | 0.48 |
| ▸ | ALOX15 | P16050 | 3/20 | 0.48 |
| ▸ | HIF1A | Q16665 | 3/20 | 0.48 |
| ▸ | NR3C1 | P04150 | 2/20 | 0.48 |
| ▸ | TP53 | P04637 | 2/20 | 0.48 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.48 |
| ▸ | ADORA3 | P0DMS8 | 2/20 | 0.48 |
| ▸ | CYP2D6 | P10635 | 2/20 | 0.48 |
| ▸ | CYP2C9 | P11712 | 2/20 | 0.48 |
| ▸ | CYP2C19 | P33261 | 2/20 | 0.48 |
| ▸ | OPRD1 | P41143 | 2/20 | 0.48 |
| ▸ | GAA | P10253 | 1/20 | 0.48 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL11742294 | 0.77 | ALDH1A1 (0.50) | MAPTLMNAMEN1KMT2AGAA | |
| Dimethylstilbestrol SCHEMBL13339102 | 0.75 | ESR1 (0.74) | ESR1ESR2HSD17B1MAPTLMNA | |
| Dimethylstilbestrol SCHEMBL125634 | 0.75 | ESR1 (0.74) | ESR1ESR2HSD17B1MAPTLMNA | |
| SCHEMBL3656765 | 0.75 | ESR1 (0.57) | ESR1ESR2HSD17B1MAPTLMNA | |
| SCHEMBL1071921 | 0.75 | ESR1 (0.57) | ESR1ESR2HSD17B1MAPTLMNA | |
| Dimethylstilbestrol SCHEMBL125635 | 0.75 | ESR1 (0.74) | ESR1ESR2HSD17B1MAPTLMNA | |
| SCHEMBL11608886 | 0.74 | CES2 (0.48) | MAPTLMNAMEN1KMT2ACYP3A4 | |
| SCHEMBL4338484 | 0.74 | CES2 (0.48) | MAPTLMNAMEN1KMT2AALOX15 | |
| SCHEMBL11745079 | 0.74 | CES2 (0.48) | MAPTLMNACA1CA2NPC1 | |
| Hydroquinone SCHEMBL17202556 | 0.73 | CYP3A4 (0.73) | ESR1ESR2HSD17B1MAPTLMNA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 29 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0480311-B1 | Radiation-sensitive mixture containing an acid-cleavable group and process for obtaining relief patterns and images | BASF AG (DE) | 1998-07-08 | — | — | EP | claimed |
| EP-0342495-B1 | Light-sensitive composition and process for the formation of relief patterns | BASF AG (DE) | 1994-01-12 | — | — | EP | claimed |
| EP-0342494-B1 | Light-sensitive composition and process for the formation of relief patterns | BASF AG (DE) | 1993-12-29 | — | — | EP | claimed |
| EP-0342496-B1 | Light-sensitive composition, and process for the formation of relief patterns | BASF AG (DE) | 1993-12-29 | — | — | EP | claimed |
| EP-0342498-B1 | Light-sensitive negative or positive composition, and process for the formation of relief patterns | BASF AG (DE) | 1993-12-22 | — | — | EP | claimed |
| EP-0472029-A1 | Light-sensitive composition and process for the formation of relief pattern | BASF Aktiengesellschaft (DE) | 1992-02-26 | — | — | EP | claimed |
| EP-0342494-A2 | Light-sensitive composition and process for the formation of relief patterns | BASF Aktiengesellschaft (DE) | 1989-11-23 | — | — | EP | claimed |
| EP-0342496-A2 | Light-sensitive composition, and process for the formation of relief patterns | BASF Aktiengesellschaft (DE) | 1989-11-23 | — | — | EP | claimed |
| EP-0342498-A2 | Light-sensitive negative or positive composition, and process for the formation of relief patterns | BASF Aktiengesellschaft (DE) | 1989-11-23 | — | — | EP | claimed |
| EP-0342495-A2 | Light-sensitive composition and process for the formation of relief patterns | BASF Aktiengesellschaft (DE) | 1989-11-23 | — | — | EP | claimed |
| EP-0520265-B1 | Positive working radiation-sensitive composition with disulfone acid generators | BASF AG (DE) | 1999-11-17 | — | — | EP | disclosed |
| EP-0553737-B1 | Radiation-sensitive composition | BASF AG (DE) | 1999-09-22 | — | — | EP | disclosed |
| EP-0540965-B1 | Positive light sensitive composition and process for the formation of relief pattern | BASF AG (DE) | 1999-06-09 | — | — | EP | disclosed |
| EP-0480311-B1 | Radiation-sensitive mixture containing an acid-cleavable group and process for obtaining relief patterns and images | BASF AG (DE) | 1998-07-08 | — | — | EP | disclosed |
| EP-0508174-B1 | Radiation sensitive mixture, containing groups which are labile in acid environment and method for fabrication of relief patterns and relief images | BASF AG (DE) | 1997-09-03 | — | — | EP | disclosed |
| EP-0424766-A2 | Radiation-sensitive composition and process for the formation of relief patterns | BASF Aktiengesellschaft (DE) | 1991-05-02 | — | — | EP | disclosed |
| EP-0342498-A2 | Light-sensitive negative or positive composition, and process for the formation of relief patterns | BASF Aktiengesellschaft (DE) | 1989-11-23 | — | — | EP | disclosed |
| EP-0342495-A2 | Light-sensitive composition and process for the formation of relief patterns | BASF Aktiengesellschaft (DE) | 1989-11-23 | — | — | EP | disclosed |
| EP-0342496-A2 | Light-sensitive composition, and process for the formation of relief patterns | BASF Aktiengesellschaft (DE) | 1989-11-23 | — | — | EP | disclosed |
| EP-0342494-A2 | Light-sensitive composition and process for the formation of relief patterns | BASF Aktiengesellschaft (DE) | 1989-11-23 | — | — | EP | disclosed |