SCHEMBL8527153

SCHEMBL8527153

C=Cc1cccc(OC(C)OC2CCCC2)c1

nearest known ligand 0.38

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TP53 P04637 1/20 0.38
TDP1 Q9NUW8 1/20 0.38
PTGS2 P35354 1/20 0.35
NPC1 O15118 2/20 0.34
RAB9A P51151 2/20 0.34
CASP3 P42574 1/20 0.34
SENP8 Q96LD8 1/20 0.34
SENP7 Q9BQF6 1/20 0.34
SENP6 Q9GZR1 1/20 0.34
CHRNB4 P30926 2/20 0.34
CHRNA3 P32297 2/20 0.34
SIRT1 Q96EB6 1/20 0.34
CYP3A4 P08684 1/20 0.33
CYP2D6 P10635 1/20 0.33
MAPT P10636 1/20 0.33
CYP2C9 P11712 1/20 0.33
CYP2C19 P33261 1/20 0.33
BCHE P06276 1/20 0.33
POLB P06746 1/20 0.33
MEN1 O00255 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1357223 0.99 TP53 (0.37) TP53TDP1PTGS2NPC1RAB9A
SCHEMBL5900974 0.84 ALDH1A1 (0.35) PTGS2NPC1RAB9ACHRNB4CHRNA3
SCHEMBL27490614 0.83 BCHE (0.34) TP53TDP1NPC1RAB9ACASP3
SCHEMBL685735 0.82 ALDH1A1 (0.35) NPC1RAB9ACHRNB4CHRNA3MAPT
SCHEMBL27490615 0.80 ALDH1A1 (0.35) TP53TDP1NPC1RAB9AMAPT
SCHEMBL16406619 0.79 MEN1 (0.42) TDP1NPC1RAB9ACYP2D6MAPT
SCHEMBL873669 0.79 SLC6A2 (0.42) CHRNB4CHRNA3ALDH1A1
SCHEMBL15496944 0.79 HDAC4 (0.41) TP53TDP1NPC1RAB9ACASP3
SCHEMBL16428364 0.78 SLC6A2 (0.41) CHRNB4CHRNA3POLBMEN1KMT2A
SCHEMBL1357376 0.78 TP53 (0.47) TP53TDP1PTGS2SIRT1CYP3A4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0520642-B1 Resist material and pattern formation process WAKO PURE CHEM IND LTD (JP) 1998-10-28 EP disclosed
US-5670299-A COATING A PHOTORESISTS POLYMER ON A SUBSTRATE, DEVELOPMENT AND HEAT TREATMENT WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) 1997-09-23 US disclosed
US-5468589-A Heat resistant, photosensitive patterns WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) 1995-11-21 US disclosed
EP-0520642-A1 Resist material and pattern formation process WAKO PURE CHEMICAL INDUSTRIES LTD (JP) 1992-12-30 EP disclosed