SCHEMBL8527423

SCHEMBL8527423

C=C(C)C(=O)OC(C)(C)C.CC(OCCCl)Oc1ccc(C=CC=Cc2ccc(O)cc2)cc1

nearest known ligand 0.35

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
STAT3 P40763 1/20 0.35
ABCG2 Q9UNQ0 3/20 0.32
MIF P14174 1/20 0.32
CA12 O43570 1/20 0.32
AKR1B10 O60218 1/20 0.32
CA1 P00915 1/20 0.32
CA2 P00918 1/20 0.32
AKR1B1 P15121 1/20 0.32
CA7 P43166 1/20 0.32
CA9 Q16790 1/20 0.32
CA14 Q9ULX7 1/20 0.32
CHRNB2 P17787 1/20 0.31
CHRNB4 P30926 1/20 0.31
CHRNA3 P32297 1/20 0.31
CHRNA7 P36544 1/20 0.31
CHRNA4 P43681 1/20 0.31
MAOB P27338 2/20 0.31
HIF1A Q16665 2/20 0.31
EPAS1 Q99814 2/20 0.31
APP P05067 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3837576 0.89 STAT3 (0.37) STAT3ABCG2MIFCA12AKR1B10
SCHEMBL9412339 0.87 ABCG2 (0.31) ABCG2CA12AKR1B10CA1CA2
SCHEMBL6551626 0.87 STAT3 (0.43) STAT3MIFCA12AKR1B10CA1
SCHEMBL6833601 0.84 APP (0.43) STAT3ABCG2CA12AKR1B10CA1
SCHEMBL7263905 0.80 STAT3 (0.37) STAT3ABCG2MIFCA12CA1
SCHEMBL3841532 0.79 STAT3 (0.34) STAT3MIFCA12AKR1B10CA1
SCHEMBL8530486 0.79 ABCG2 (0.45) STAT3ABCG2CA12CA1CA2
SCHEMBL3325658 0.79 STAT3 (0.44) STAT3ABCG2MIFCA12CA1
SCHEMBL5438976 0.78 KDM4E (0.41) STAT3MIFCA12AKR1B10CA1
SCHEMBL7271037 0.77 STAT3 (0.42) STAT3ABCG2MIFCA12AKR1B10

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0520642-B1 Resist material and pattern formation process WAKO PURE CHEM IND LTD (JP) 1998-10-28 EP disclosed
US-5670299-A COATING A PHOTORESISTS POLYMER ON A SUBSTRATE, DEVELOPMENT AND HEAT TREATMENT WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) 1997-09-23 US disclosed
US-5468589-A Heat resistant, photosensitive patterns WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) 1995-11-21 US disclosed