SCHEMBL8528375

SCHEMBL8528375

CC(C)(C)c1c(OC(=O)O)ccc2ccccc12

nearest known ligand 0.46

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 2/20 0.46
HSD17B10 Q99714 2/20 0.46
KDM4E B2RXH2 1/20 0.46
NCEH1 Q6PIU2 13/20 0.44
LMNA P02545 2/20 0.43
PGR P06401 1/20 0.41
GAA P10253 1/20 0.41
PTGS1 P23219 1/20 0.41
MAPK1 P28482 1/20 0.41
SMN1; SMN2 Q16637 2/20 0.40
NPC1 O15118 1/20 0.40
MAPT P10636 1/20 0.40
RAB9A P51151 1/20 0.40
SLC22A12 Q96S37 1/20 0.40
CYP1A2 P05177 1/20 0.40
CYP3A4 P08684 1/20 0.40
CYP2C9 P11712 1/20 0.40
CYP2C19 P33261 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8528373 0.89 NCEH1 (0.45) ALDH1A1HSD17B10KDM4ENCEH1LMNA
SCHEMBL4233763 0.83 TYMS (0.42) ALDH1A1HSD17B10KDM4ENCEH1LMNA
SCHEMBL11891540 0.78 MAPT (0.60) ALDH1A1KDM4ESMN1; SMN2MAPTRAB9A
SCHEMBL9654427 0.78 MAPT (0.55) ALDH1A1HSD17B10KDM4ENCEH1LMNA
SCHEMBL7068984 0.76 NCEH1 (0.45) ALDH1A1HSD17B10KDM4ENCEH1LMNA
SCHEMBL7761409 0.76 LDHA (0.55) NCEH1LMNA
SCHEMBL8526601 0.75 WDR5 (0.59) ALDH1A1HSD17B10KDM4ELMNAGAA
SCHEMBL19439381 0.75 NCEH1 (0.67) ALDH1A1NCEH1LMNAMAPK1SMN1; SMN2
SCHEMBL27597401 0.75 MAPT (0.43) ALDH1A1HSD17B10KDM4ENCEH1LMNA
SCHEMBL8526776 0.74 HSD17B10 (0.43) ALDH1A1HSD17B10KDM4ENCEH1LMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0249139-B2 Resist compositions and use MICROSI INC (US) 1998-03-11 EP disclosed
US-5362607-A Photo-patternable in absence of moisture; treating substrate with positive resist composition, baking, irradiating resist in patterned way, heating, developing; resist of water-soluble phenolic resin, tertiary butyl compound, aryl onium salt MICROSI, INC. (US) 1994-11-08 US disclosed
US-5310619-A Resist compositions comprising a phenolic resin, an acid forming onium salt and a tert-butyl ester or tert-butyl carbonate which is acid-cleavable MICROSI, INC. (US) 1994-05-10 US disclosed
EP-0249139-A2 Resist compositions and use MicroSi, Inc. (a Delaware corporation) (US) 1987-12-16 EP disclosed