⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3629050 | 0.83 | TSHR (0.56) | — | |
| SCHEMBL28368601 | 0.82 | — | — | |
| SCHEMBL27543893 | 0.79 | — | — | |
| SCHEMBL1988202 | 0.78 | ALDH1A1 (0.50) | — | |
| SCHEMBL6557587 | 0.78 | ALDH1A1 (0.50) | — | |
| SCHEMBL23631357 | 0.75 | TSHR (0.48) | — | |
| SCHEMBL22492168 | 0.75 | TSHR (0.48) | — | |
| SCHEMBL739150 | 0.75 | — | — | |
| SCHEMBL18623650 | 0.75 | TSHR (0.48) | — | |
| SCHEMBL2691938 | 0.75 | TSHR (0.48) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 19 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-108003802-B | Thermal self-healing ultraviolet curing adhesive based on gradual polymerization mechanism | 烟台德邦科技股份有限公司 | 2021-03-30 | — | — | CN | claimed |
| CN-108003802-B | Thermal self-healing ultraviolet curing adhesive based on gradual polymerization mechanism | 烟台德邦科技股份有限公司 | 2021-03-30 | — | — | CN | disclosed |
| CN-102445785-B | Color Liquid Crystal Display Device | CHI MEI CORP | 2014-12-03 | — | — | CN | disclosed |
| CN-102445842-B | Photosensitive resin composition and black matrix using the same | CHEIL INDUSTRIES INC. (KR) | 2014-10-29 | — | — | CN | disclosed |
| CN-102445841-B | Photosensitive resin composition and light blocking layer using the same | CHEIL IND INC | 2014-06-11 | — | — | CN | disclosed |
| CN-102540717-B | Photosensitive resin composition and light blocking layer using same | CHEIL IND INC | 2013-12-25 | — | — | CN | disclosed |
| CN-101346324-B | Low density proppant particles and uses thereof | 3M INNOVATIVE PROPERTIES CO | 2013-01-02 | — | — | CN | disclosed |
| CN-102540717-A | Photosensitive resin composition and light blocking layer using the same | CHEIL IND INC | 2012-07-04 | — | — | CN | disclosed |
| CN-102445785-A | Color liquid crystal display device | CHI MEI CORP | 2012-05-09 | — | — | CN | disclosed |
| CN-102445841-A | Photosensitive resin composition and light-blocking layer using the same | CHEIL IND INC | 2012-05-09 | — | — | CN | disclosed |
| CN-102445842-A | Photosensitive resin composition and light-blocking layer using the same | CHEIL IND INC | 2012-05-09 | — | — | CN | disclosed |
| CN-100526980-C | Lithographic printing plate precursor and lithographic printing method | FUJI PHOTO FILM CO LTD (JP) | 2009-08-12 | — | — | CN | disclosed |
| CN-101452208-A | Photosensitive resin composition for pad protective layer, and method for making image sensor using the same | CHEIL IND INC (KR) | 2009-06-10 | — | — | CN | disclosed |
| CN-101346324-A | Low density proppant particles and uses thereof | 3M INNOVATIVE PROPERTIES CO (US) | 2009-01-14 | — | — | CN | disclosed |
| CN-100439946-C | Pigment-dispersing type radiation-sensitive resin composition and method of forming colored pattern | TOKYO OHKA KOGYO CO LTD (JP) | 2008-12-03 | — | — | CN | disclosed |
| CN-1892264-A | Pigment-dispersing type radiation-sensitive resin composition and method of forming colored pattern | TOKYO OHKA KOGYO CO LTD (JP) | 2007-01-10 | — | — | CN | disclosed |
| CN-1291250-C | Phase dfiference film comprising polymer film having ultraviolet curable resin composition for alignment film and liquid crystalline compound | NIPPON KAYAKU KK (JP) | 2006-12-20 | — | — | CN | disclosed |
| CN-1577087-A | Lithographic printing plate precursor and lithographic printing method | FUJI PHOTO FILM CO LTD (JP) | 2005-02-09 | — | — | CN | disclosed |
| US-5736068-A | Triphenylene compounds and preparation of discotic liquid crystalline crosslinked polymers | BASF AKTIENGESELLSCHAFT (DE) | 1998-04-07 | — | — | US | disclosed |