⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Succinic Acid SCHEMBL28525310 | 0.89 | LMNA (0.45) | — | |
| SCHEMBL3629050 | 0.83 | TSHR (0.56) | — | |
| SCHEMBL806370 | 0.82 | — | — | |
| SCHEMBL9575278 | 0.80 | — | — | |
| SCHEMBL11666292 | 0.78 | GPR84 (0.50) | — | |
| SCHEMBL5935197 | 0.78 | GPR84 (0.50) | — | |
| SCHEMBL1988202 | 0.78 | ALDH1A1 (0.50) | — | |
| SCHEMBL6557587 | 0.78 | ALDH1A1 (0.50) | — | |
| SCHEMBL23631357 | 0.75 | TSHR (0.48) | — | |
| SCHEMBL22492168 | 0.75 | TSHR (0.48) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 203 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-119490653-A | Photosensitive polyesteramide, preparation method, composition, polyimide film and application thereof | 深圳职业技术大学 | 2025-02-21 | — | — | CN | claimed |
| CN-117555204-B | Negative photosensitive polyimide glue solution and glue film suitable for flexible circuit board | 明士(北京)新材料开发有限公司 | 2024-04-26 | — | — | CN | claimed |
| CN-117186403-B | Negative photosensitive resin, resin composition, and preparation method and application thereof | 明士(北京)新材料开发有限公司 | 2024-04-02 | — | — | CN | claimed |
| CN-117430812-B | Photosensitive polyamic acid ester resin, resin composition and application | 明士(北京)新材料开发有限公司 | 2024-03-19 | — | — | CN | claimed |
| CN-117555204-A | Negative photosensitive polyimide glue solution and glue film suitable for flexible circuit board | 明士(北京)新材料开发有限公司 | 2024-02-13 | — | — | CN | claimed |
| CN-117430812-A | Photosensitive polyamic acid ester resin, resin composition and application | 明士(北京)新材料开发有限公司 | 2024-01-23 | — | — | CN | claimed |
| CN-117384378-A | Photosensitive polyamic acid ester resin, resin composition, preparation method and application thereof | 明士(北京)新材料开发有限公司 | 2024-01-12 | — | — | CN | claimed |
| CN-116836388-B | Positive photosensitive resin, resin composition, preparation method and application thereof | 明士(北京)新材料开发有限公司 | 2023-12-15 | — | — | CN | claimed |
| CN-117186403-A | Negative photosensitive resin, resin composition, and preparation method and application thereof | 明士(北京)新材料开发有限公司 | 2023-12-08 | — | — | CN | claimed |
| CN-116577965-B | Negative photosensitive solid adhesive film and preparation method thereof | 明士(北京)新材料开发有限公司 | 2023-10-03 | — | — | CN | claimed |
| CN-116836388-A | Positive photosensitive resin, resin composition, preparation method and application thereof | 明士(北京)新材料开发有限公司 | 2023-10-03 | — | — | CN | claimed |
| CN-116577965-A | Negative photosensitive solid adhesive film and preparation method thereof | 明士(北京)新材料开发有限公司 | 2023-08-11 | — | — | CN | claimed |
| CN-115437218-A | Photosensitive resin with symmetrical and asymmetrical structures and preparation method and application thereof | 明士(北京)新材料开发有限公司 | 2022-12-06 | — | — | CN | claimed |
| CN-114995060-B | Negative photosensitive resin composition capable of being cured at low temperature and preparation method and application thereof | 明士(北京)新材料开发有限公司 | 2022-11-01 | — | — | CN | claimed |
| CN-114995060-A | Negative photosensitive resin composition capable of being cured at low temperature and preparation method and application thereof | 明士(北京)新材料开发有限公司 | 2022-09-02 | — | — | CN | claimed |
| CN-114280887-A | Negative photosensitive solid glue film developed by alkaline water system and preparation method thereof | 明士(北京)新材料开发有限公司 | 2022-04-05 | — | — | CN | claimed |
| US-5736068-A | Triphenylene compounds and preparation of discotic liquid crystalline crosslinked polymers | BASF AKTIENGESELLSCHAFT (DE) | 1998-04-07 | — | — | US | claimed |
| JP-57072934-A | — | — | None | — | — | JP | disclosed |
| JP-S5772934-A | PREPARATION OF CYCLOPENETENONE DERVIATIVE | SUMITOMO CHEM CO LTD | 1982-05-07 | — | — | JP | disclosed |
| US-4133813-A | Cyclic nitrile carbonate-containing compounds | ATLANTIC RICHFIELD COMPANY (US) | 1979-01-09 | — | — | US | disclosed |