Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TYMS | P04818 | 2/20 | 0.50 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.46 |
| ▸ | TSHR | P16473 | 1/20 | 0.46 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.42 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.42 |
| ▸ | CES1 | P23141 | 2/20 | 0.38 |
| ▸ | AHR | P35869 | 3/20 | 0.34 |
| ▸ | MAPT | P10636 | 2/20 | 0.33 |
| ▸ | HTR2A | P28223 | 2/20 | 0.33 |
| ▸ | HTR2C | P28335 | 2/20 | 0.33 |
| ▸ | HTR2B | P41595 | 2/20 | 0.33 |
| ▸ | MEN1 | O00255 | 1/20 | 0.33 |
| ▸ | NPC1 | O15118 | 1/20 | 0.33 |
| ▸ | POLB | P06746 | 1/20 | 0.33 |
| ▸ | THRB | P10828 | 1/20 | 0.33 |
| ▸ | APEX1 | P27695 | 1/20 | 0.33 |
| ▸ | RECQL | P46063 | 1/20 | 0.33 |
| ▸ | RAB9A | P51151 | 1/20 | 0.33 |
| ▸ | BLM | P54132 | 1/20 | 0.33 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29462450 | 1.00 | TYMS (0.50) | TYMSALDH1A1TSHRTDP1ALOX15 | |
| Fluoride Ion SCHEMBL11260088 | 0.96 | TYMS (0.47) | TYMSALDH1A1TSHRTDP1ALOX15 | |
| SCHEMBL8849279 | 0.79 | ALDH1A1 (0.43) | TYMSALDH1A1TSHRTDP1ALOX15 | |
| SCHEMBL9771012 | 0.79 | ALDH1A1 (0.43) | TYMSALDH1A1TSHRTDP1ALOX15 | |
| SCHEMBL855172 | 0.79 | ALDH1A1 (0.43) | TYMSALDH1A1TSHRTDP1ALOX15 | |
| SCHEMBL8849276 | 0.79 | TYMS (0.47) | TYMSALDH1A1TSHRTDP1ALOX15 | |
| SCHEMBL9284604 | 0.79 | TYMS (0.47) | TYMSALDH1A1TSHRTDP1ALOX15 | |
| SCHEMBL9638008 | 0.78 | TYMS (0.46) | TYMSALDH1A1TSHRTDP1ALOX15 | |
| SCHEMBL29245225 | 0.76 | TSHR (0.40) | TYMSALDH1A1TSHRTDP1ALOX15 | |
| SCHEMBL8764869 | 0.76 | ALDH1A1 (0.47) | TYMSALDH1A1TSHRTDP1ALOX15 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 256 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12415892-B2 | Polyimide film preparation method and application thereof | INSTITUTE OF CHEMISTRY CHINESE ACADEMY OF SCIENCES (CN) | 2025-09-16 | — | — | US | claimed |
| CN-120041182-A | Particle size-controllable epoxy resin fracturing propping agent and preparation method thereof | 江苏扬农化工集团有限公司 | 2025-05-27 | — | — | CN | claimed |
| CN-119752183-A | Preparation method of epoxy resin fracturing propping agent with high heat resistance and low breakage rate | 江苏扬农化工集团有限公司 | 2025-04-04 | — | — | CN | claimed |
| CN-117430812-A | Photosensitive polyamic acid ester resin, resin composition and application | 明士(北京)新材料开发有限公司 | 2024-01-23 | — | — | CN | claimed |
| CN-117219793-A | Preparation method and application of porous carbon nickel catalyst for fuel cell | 北京科技大学 | 2023-12-12 | — | — | CN | claimed |
| CN-114230792-B | Positive photosensitive polyimide resin, resin composition, and preparation method and application thereof | 明士(北京)新材料开发有限公司 | 2023-10-03 | — | — | CN | claimed |
| CN-116826021-A | Porous hard carbon composite material and preparation method and application thereof | 江苏钠博恩新材料有限公司 | 2023-09-29 | — | — | CN | claimed |
| CN-115437218-A | Photosensitive resin with symmetrical and asymmetrical structures and preparation method and application thereof | 明士(北京)新材料开发有限公司 | 2022-12-06 | — | — | CN | claimed |
| CN-114995060-B | Negative photosensitive resin composition capable of being cured at low temperature and preparation method and application thereof | 明士(北京)新材料开发有限公司 | 2022-11-01 | — | — | CN | claimed |
| CN-114995060-A | Negative photosensitive resin composition capable of being cured at low temperature and preparation method and application thereof | 明士(北京)新材料开发有限公司 | 2022-09-02 | — | — | CN | claimed |
| US-6066743-A | Solventless preparation of phthalimides | GENERAL ELECTRIC COMPANY (US) | 2000-05-23 | — | — | US | claimed |
| WO-2000005194-A1 | PROCESS FOR THE PREPARATION OF 1,4-BIS[[2- (DIMETHYLAMINO) ETHYL] AMINO] -5,8- DIHYDROXYANTHRACENE- 9,10-DIONE | BTG INTERNATIONAL LIMITED (GB) | 2000-02-03 | — | — | WO | claimed |
| US-5683553-A | PURIFICATION FROM MIXTURE WITH 4,5-DICHLOROPHTHALIC ANHYDRIDE | BASF AKTIENGESELLSCHAFT (DE) | 1997-11-04 | — | — | US | claimed |
| EP-0510492-B1 | Photochlorination of phthalic anhydride | OCCIDENTAL CHEM CO (US) | 1995-07-05 | — | — | EP | claimed |
| EP-0401589-B1 | Method of producing imide bond-containing resins | DAI ICHI KOGYO SEIYAKU CO LTD (JP) | 1994-10-26 | — | — | EP | claimed |
| US-5300201-A | Mixing with chlorine, irradiating; selective formation of 4-chloro phthalic anhydride | OCCIDENTAL CHEMICAL CORPORATION (US) | 1994-04-05 | — | — | US | claimed |
| EP-0510492-A1 | Photochlorination of phthalic anhydride | OCCIDENTAL CHEMICAL CORPORATION (US) | 1992-10-28 | — | — | EP | claimed |
| US-5086114-A | Reacting anhydride-containing copolymer with diisocyanate and halogenated phthalic anhydride in the prense of quaternary phosphonium compound | DAI-ICHI KOGYO SEIYAKU CO., LTD. (JP) | 1992-02-04 | — | — | US | claimed |
| US-4981999-A | Selective removal of chlorine from chlorophthalic compounds | OCCIDENTAL CHEMICAL CORPORATION (US) | 1991-01-01 | — | — | US | claimed |
| EP-0401589-A2 | Method of producing imide bond-containing resins | DAI-ICHI KOGYO SEIYAKU CO., LTD. (JP) | 1990-12-12 | — | — | EP | claimed |