Predicted protein targets (top 9)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 2/20 | 0.40 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.40 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.32 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.32 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.32 |
| ▸ | PRSS1 | P07477 | 1/20 | 0.31 |
| ▸ | CTSG | P08311 | 1/20 | 0.31 |
| ▸ | CTRB1 | P17538 | 1/20 | 0.31 |
| ▸ | CMA1 | P23946 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL85493 | 0.80 | TSHR (0.57) | TSHRALDH1A1CYP2D6CYP2C19HIF1A | |
| SCHEMBL1425286 | 0.80 | DGAT1 (0.42) | TSHRALDH1A1CYP2D6CYP2C19HIF1A | |
| SCHEMBL13904644 | 0.78 | DGAT1 (0.46) | TSHRALDH1A1 | |
| Ammonia Solution, Strong SCHEMBL28635066 | 0.77 | TSHR (0.53) | TSHRALDH1A1CYP2D6CYP2C19HIF1A | |
| Ammonia Solution, Strong SCHEMBL28635068 | 0.77 | TSHR (0.53) | TSHRALDH1A1CYP2D6CYP2C19HIF1A | |
| SCHEMBL787076 | 0.75 | ALDH1A1 (0.32) | TSHRALDH1A1 | |
| SCHEMBL29142764 | 0.74 | ALDH1A1 (0.33) | TSHRALDH1A1 | |
| SCHEMBL11077055 | 0.74 | CYP4F2 (0.42) | TSHRALDH1A1 | |
| SCHEMBL2175957 | 0.73 | TSHR (0.42) | TSHRALDH1A1CYP2D6CYP2C19HIF1A | |
| SCHEMBL9067049 | 0.73 | TSHR (0.42) | TSHRALDH1A1CYP2D6CYP2C19HIF1A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20160379805-A1 | PLASMA PROCESSING APPARATUS AND METHOD | TOKYO ELECTRON LIMITED (JP) | 2016-12-29 | — | — | US | disclosed |
| US-20160358753-A1 | PLASMA PROCESSING APPARATUS AND METHOD | TOKYO ELECTRON LIMITED (JP) | 2016-12-08 | — | — | US | disclosed |
| US-9490105-B2 | Plasma processing apparatus and method | TOKYO ELECTRON LIMITED (JP) | 2016-11-08 | — | — | US | disclosed |
| US-20140326409-A1 | PLASMA PROCESSING APPARATUS AND METHOD | TOKYO ELECTRON LIMITED (JP) | 2014-11-06 | — | — | US | disclosed |
| US-8790490-B2 | Plasma processing apparatus and method | TOKYO ELECTRON LIMITED (JP) | 2014-07-29 | — | — | US | disclosed |
| US-20140124139-A1 | PLASMA PROCESSING APPARATUS AND METHOD | TOKYO ELECTRON LIMITED (JP) | 2014-05-08 | — | — | US | disclosed |
| US-20120145324-A1 | PLASMA PROCESSING APPARATUS AND METHOD | KOSHIISHI AKIRA (JP) | 2012-06-14 | — | — | US | disclosed |
| US-8137471-B2 | Plasma processing apparatus and method | TOKYO ELECTRON LIMITED (JP) | 2012-03-20 | — | — | US | disclosed |
| US-8128831-B2 | Plasma etching method and computer-readable storage medium | TOKYO ELECTRON LIMITED (JP) | 2012-03-06 | — | — | US | disclosed |
| US-20110272097-A1 | PLASMA PROCESSING APPARATUS AND METHOD | KOSHIISHI AKIRA | 2011-11-10 | — | — | US | disclosed |
| US-7988816-B2 | Plasma processing apparatus and method | TOKYO ELECTRON LIMITED (JP) | 2011-08-02 | — | — | US | disclosed |
| US-7740737-B2 | Plasma processing apparatus and method | TOKYO ELECTRON LIMITED (JP) | 2010-06-22 | — | — | US | disclosed |
| US-20100126668-A1 | PLASMA PROCESSING APPARATUS AND METHOD | TOKYO ELECTRON LIMITED (JP) | 2010-05-27 | — | — | US | disclosed |
| US-20070165355-A1 | PLASMA ETCHING METHOD AND COMPUTER-READABLE STORAGE MEDIUM | TOKYO ELECTON LIMITED (JP) | 2007-07-19 | — | — | US | disclosed |