SCHEMBL8561798

SCHEMBL8561798

CCC[Si](CCC)(OC)OCc1ccccc1

nearest known ligand 0.43

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
TSHR P16473 2/20 0.40
IDO1 P14902 1/20 0.38
TP53 P04637 1/20 0.37
AGXT P21549 1/20 0.36
ALDH1A1 P00352 2/20 0.36
MAOB P27338 1/20 0.36
L3MBTL1 Q9Y468 4/20 0.35
TDP1 Q9NUW8 3/20 0.35
MAPT P10636 2/20 0.35
MAPK1 P28482 2/20 0.35
CA12 O43570 1/20 0.35
CA1 P00915 1/20 0.35
CA2 P00918 1/20 0.35
CA9 Q16790 1/20 0.35
CETP P11597 3/20 0.35
LMNA P02545 1/20 0.34
CYP3A4 P08684 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8978876 0.90 TSHR (0.44) TSHRIDO1TP53AGXTALDH1A1
SCHEMBL27716226 0.81 TSHR (0.40) TSHRIDO1TP53AGXTALDH1A1
SCHEMBL8561019 0.81 TSHR (0.40) TSHRIDO1TP53AGXTALDH1A1
SCHEMBL15302477 0.81 TP53 (0.39) TSHRIDO1TP53ALDH1A1L3MBTL1
SCHEMBL28826482 0.80 TSHR (0.39) TSHRIDO1TP53AGXTALDH1A1
SCHEMBL19809163 0.79 TP53 (0.34) TP53
SCHEMBL28033171 0.79 IDO1 (0.39) TSHRIDO1TP53AGXTALDH1A1
SCHEMBL30764855 0.79 TSHR (0.44) TSHRIDO1TP53AGXTALDH1A1
SCHEMBL16537804 0.78 ALDH1A1 (0.34) TP53ALDH1A1MAPTCA1CA2
SCHEMBL18297912 0.78 TSHR (0.48) TSHRIDO1TP53AGXTALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2022210869-A1 METHOD FOR PRODUCING SEMI-CURED PRODUCT COMPOSITE, METHOD FOR PRODUCING CURED PRODUCT COMPOSITE, AND SEMI-CURED PRODUCT COMPOSITE デンカ株式会社 2022-10-06 WO disclosed
US-5821314-A COMPOUND OR MIXTURE OF COMPOUNDS HAVING EPOXY GROUP, REACTIVE SILICON GROUP, HYDROXYL AND/OR CARBOXYL GROUP, ORGANIC CHELATE CATALYST CONTAINING TETRAVALENT TIN ATOM AND KETO-ENOL TAUTOMER KANSAI PAINT COMPANY, LIMITED (JP) 1998-10-13 US disclosed
EP-0768326-A1 THERMOSETTING COMPOSITION AND METHOD OF FORMING TOPCOATING FILM KANSAI PAINT CO., LTD. (JP) 1997-04-16 EP disclosed