SCHEMBL8564352

SCHEMBL8564352

[c]1ccc(Sc2cccc3ccccc23)cc1

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
IFNAR1 P17181 1/20 0.47
SIRT2 Q8IXJ6 1/20 0.43
SIRT1 Q96EB6 1/20 0.43
SIRT3 Q9NTG7 1/20 0.43
ALDH1A1 P00352 6/20 0.42
LMNA P02545 3/20 0.42
MAPK1 P28482 2/20 0.42
NPY1R P25929 1/20 0.42
NPY2R P49146 1/20 0.42
SMN1; SMN2 Q16637 3/20 0.38
RECQL P46063 1/20 0.38
MAPT P10636 1/20 0.38
RAD52 P43351 1/20 0.38
NPSR1 Q6W5P4 1/20 0.38
MEN1 O00255 1/20 0.36
KMT2A Q03164 1/20 0.36
CYP2A6 P11509 3/20 0.36
TSHR P16473 2/20 0.36
HSD17B10 Q99714 2/20 0.36
TDP1 Q9NUW8 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2890325 0.84 IFNAR1 (0.49) IFNAR1SIRT2SIRT1SIRT3ALDH1A1
SCHEMBL31490493 0.84 IFNAR1 (0.49) IFNAR1SIRT2SIRT1SIRT3ALDH1A1
SCHEMBL29180165 0.82 ALDH1A1 (0.34) IFNAR1SIRT2SIRT1SIRT3ALDH1A1
SCHEMBL384220 0.80 MAPT (0.38) IFNAR1SIRT2SIRT1SIRT3ALDH1A1
SCHEMBL577858 0.79 IFNAR1 (0.60) IFNAR1SIRT2SIRT1SIRT3ALDH1A1
SCHEMBL31167972 0.79 IFNAR1 (0.60) IFNAR1SIRT2SIRT1SIRT3ALDH1A1
SCHEMBL13730600 0.77 SMN1; SMN2 (0.47) IFNAR1SIRT2SIRT1SIRT3ALDH1A1
SCHEMBL9742383 0.77 SIRT2 (0.50) IFNAR1SIRT2SIRT1SIRT3ALDH1A1
SCHEMBL9923541 0.77 IFNAR1 (0.47) IFNAR1SIRT2SIRT1SIRT3ALDH1A1
SCHEMBL7201257 0.77 NR1H2 (0.48) IFNAR1SIRT2SIRT1SIRT3ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-117420731-A Negative photosensitive composition and pattern forming method 东京应化工业株式会社 2024-01-19 CN disclosed
CN-116018558-A Negative photosensitive resin composition, pattern forming method and laminated film 三亚普罗股份有限公司 2023-04-25 CN disclosed
CN-114746809-A Photosensitive resin composition, photosensitive resin coating film, photosensitive dry film, pattern forming method, and light-emitting element 信越化学工业株式会社 2022-07-12 CN disclosed
CN-114127635-A Photosensitive resin composition, photosensitive dry film, laminate, and pattern formation method 信越化学工业株式会社 2022-03-01 CN disclosed
US-5814646-A TREATING THE PROGRESSION OF ALZHEIMER'S DISEASE, BRAIN DISORDERS ELI LILLY AND COMPANY (US) 1998-09-29 US disclosed