Predicted protein targets (top 2)
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL17963725 | 0.94 | TSHR (0.31) | NR1H2NR1H3 | |
| SCHEMBL6435684 | 0.82 | THRB (0.31) | — | |
| SCHEMBL24901416 | 0.78 | CA1 (0.34) | NR1H2NR1H3 | |
| SCHEMBL4586416 | 0.73 | — | — | |
| SCHEMBL9294772 | 0.71 | — | — | |
| SCHEMBL11522506 | 0.69 | — | — | |
| SCHEMBL12724435 | 0.69 | KDM4E (0.39) | NR1H2NR1H3 | |
| SCHEMBL11546158 | 0.67 | — | — | |
| SCHEMBL951560 | 0.67 | — | — | |
| SCHEMBL13703431 | 0.67 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230023593-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-01-26 | — | — | US | disclosed |
| US-20230019681-A1 | POSITIVE RESIST MATERIAL AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-01-19 | — | — | US | disclosed |
| US-11311907-B2 | Superomniphobic coatings and methods of preparation | UT-BATTELLE, LLC (US) | 2022-04-26 | — | — | US | disclosed |
| US-20190193115-A1 | SUPEROMNIPHOBIC COATINGS AND METHODS OF PREPARATION | UT-BATTELLE, LLC | 2019-06-27 | — | — | US | disclosed |
| US-5827611-A | Multilayered thermoplastic article with special properties | HOECHST CELANESE CORP (US) | 1998-10-27 | — | — | US | disclosed |
| EP-0824096-A2 | Process for the preparation of halogenated (meth)acrylic esters and poly (meth) arcylates obtained with said (meth)acrylic esters | Akzo Nobel N.V. (NL) | 1998-02-18 | — | — | EP | disclosed |
| US-5387727-A | Method of producing pentafluorophenyl alkali metal salt using pentafluorobenzene in a chain ether type solvent | TOSOH AKZO CORPORATION (JP) | 1995-02-07 | — | — | US | disclosed |
| EP-0467935-B1 | TRANSPARENT THERMOPLASTIC MOULDING MATERIAL CONSISTING OF ESTERS OF 2,3-DIFLUORACRYLIC ACID | HOECHST AG (DE) | 1994-12-14 | — | — | EP | disclosed |
| EP-0606598-A2 | Shaped articles of graduated refractive index exhibiting low dispersion | HOECHST CELANESE CORPORATION (US) | 1994-07-20 | — | — | EP | disclosed |
| WO-1994015005-A1 | SHAPED ARTICLES OF GRADUATED REFRACTIVE INDEX | HOECHST CELANESE CORPORATION (US) | 1994-07-07 | — | — | WO | disclosed |
| EP-0604960-A2 | Method of producing pentafluorophenyl alkali metal salt using pentafluorobenzene in an open chain ether type solvent | TOSOH AKZO CORPORATION (JP) | 1994-07-06 | — | — | EP | disclosed |
| US-5283303-A | Optionally deuterated; high glass transition temperature; used in manufacture of waveguides | HOECHST AKTIENGESELLSCHAFT (DE) | 1994-02-01 | — | — | US | disclosed |
| US-5175790-A | Waveguides for long distance transmission, high temperature continuous use | HOECHST AKTIENGESELLSCHAFT (DE) | 1992-12-29 | — | — | US | disclosed |
| US-4983495-A | Positive resist patterns | TOSOH CORPORATION (JP) | 1991-01-08 | — | — | US | disclosed |
| WO-1990012040-A1 | TRANSPARENT THERMOPLASTIC MOULDING MATERIAL CONSISTING OF ESTERS OF 2,3-DIFLUORACRYLIC ACID | HOECHST AKTIENGESELLSCHAFT (DE) | 1990-10-18 | — | — | WO | disclosed |
| EP-0304082-A2 | Positive resist patterns | Tosoh Corporation (JP) | 1989-02-22 | — | — | EP | disclosed |
| US-4633023-A | Fluoroacrylate ester, polymer thereof, and process of making the same | GEO-CENTERS, INC. (US) | 1986-12-30 | — | — | US | disclosed |
| US-4578508-A | Fluoroacrylate ester, polymer thereof, and process of making the same | GEO-CENTERS, INC. (US) | 1986-03-25 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-11311907-B2 | Superomniphobic coatings and methods of preparation | AFF2, AFF1, FLNA | NR1H2 962/4885NR1H3 648/4885 |
| US-20190193115-A1 | SUPEROMNIPHOBIC COATINGS AND METHODS OF PREPARATION | AFF2, AFF1, FLNA | NR1H2 962/4885NR1H3 648/4885 |
| US-20230023593-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS | HNRNPU, EWSR1, HNRNPR | NR1H2 3896/4885NR1H3 3340/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.