SCHEMBL8566465

SCHEMBL8566465

CCc1ccccc1-c1c(CC)c(C(=O)O)c(C(=O)O)c(C(=O)O)c1C(=O)O

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
FOLH1 Q04609 2/20 0.40
PPARA Q07869 3/20 0.39
PPARG P37231 2/20 0.39
BID P55957 4/20 0.39
MCL1 Q07820 4/20 0.39
BCL2L1 Q07817 3/20 0.39
BAK1 Q16611 3/20 0.39
KAT8 Q9H7Z6 2/20 0.39
EP300 Q09472 1/20 0.39
KAT2A Q92830 1/20 0.39
KAT2B Q92831 1/20 0.39
KAT5 Q92993 1/20 0.39
SAE1 Q9UBE0 1/20 0.39
KMT2A Q03164 2/20 0.38
CLCN2 P51788 1/20 0.36
APAF1 O14727 1/20 0.36
ALDH1A1 P00352 1/20 0.36
MAPT P10636 1/20 0.36
HTT P42858 1/20 0.36
RAB9A P51151 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL31039779 0.95 FOLH1 (0.39) FOLH1PPARAPPARGBIDMCL1
SCHEMBL29087118 0.80 BID (0.50) PPARAPPARGBIDMCL1BCL2L1
SCHEMBL31402496 0.79 MAPT (0.51) MCL1KMT2AAPAF1ALDH1A1MAPT
SCHEMBL29077084 0.75 GABRA1 (0.42) FOLH1BIDMCL1BCL2L1BAK1
SCHEMBL28250715 0.74 GABRA1 (0.44) FOLH1PPARAPPARGBIDMCL1
SCHEMBL27308293 0.73 TTR (0.58) FOLH1MCL1CLCN2ALDH1A1MAPT
SCHEMBL27403003 0.73 MYC (0.45) FOLH1PPARAPPARGMCL1KMT2A
SCHEMBL8768031 0.72 FOLH1 (0.55) FOLH1MCL1CLCN2ALDH1A1MAPT
SCHEMBL8853214 0.72 KDM4E (0.47) KMT2AALDH1A1HSD17B10
Bicarbonate SCHEMBL1839603 0.72 KMT2A (0.60) FOLH1PPARAPPARGKMT2AMAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-116803970-A 6,6' -disubstituted-3, 3', 4' -biphenyl tetracarboxylic acid and dianhydride thereof and preparation method thereof 中国石油化工股份有限公司 2023-09-26 CN disclosed
US-5776990-A Foamed polymer for use as dielectric material INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 1998-07-07 US disclosed
US-5206117-A PHOTOSENSITIVE POLYAMIC ALKYL ESTER COMPOSITION AND PROCESS FOR ITS USE INTERNATIONAL BUSINESS MACHINES CORPORATION, A NY CORP. 1993-04-27 US disclosed
EP-0532183-A2 Photosensitive polyamic alkyl ester composition and process for its use International Business Machines Corporation (US) 1993-03-17 EP disclosed