Predicted protein targets (top 19)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | DNM1 | Q05193 | 2/20 | 0.58 |
| ▸ | MEN1 | O00255 | 2/20 | 0.56 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.56 |
| ▸ | TP53 | P04637 | 2/20 | 0.56 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.56 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.56 |
| ▸ | HTT | P42858 | 2/20 | 0.55 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.49 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.46 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.46 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.46 |
| ▸ | SLC22A1 | O15245 | 1/20 | 0.46 |
| ▸ | CNR2 | P34972 | 2/20 | 0.42 |
| ▸ | BCHE | P06276 | 1/20 | 0.41 |
| ▸ | ACHE | P22303 | 1/20 | 0.41 |
| ▸ | SIGMAR1 | Q99720 | 1/20 | 0.41 |
| ▸ | CHRNB4 | P30926 | 1/20 | 0.41 |
| ▸ | CHRNA3 | P32297 | 1/20 | 0.41 |
| ▸ | CHRNA7 | P36544 | 1/20 | 0.41 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Hydrochloric Acid SCHEMBL1243916 | 0.98 | MEN1 (0.59) | DNM1MEN1KMT2ATP53SMN1; SMN2 | |
| Iodide SCHEMBL5091862 | 0.98 | DNM1 (0.56) | DNM1MEN1KMT2ATP53SMN1; SMN2 | |
| Bromide SCHEMBL5088529 | 0.98 | DNM1 (0.59) | DNM1MEN1KMT2ATP53SMN1; SMN2 | |
| Water SCHEMBL11128576 | 0.98 | DNM1 (0.56) | DNM1MEN1KMT2ATP53SMN1; SMN2 | |
| Hydrogen Sulfide SCHEMBL5998244 | 0.96 | DNM1 (0.58) | DNM1MEN1KMT2ATP53SMN1; SMN2 | |
| SCHEMBL5293784 | 0.96 | DNM1 (0.58) | DNM1MEN1KMT2ATP53SMN1; SMN2 | |
| SCHEMBL81000 | 0.96 | DNM1 (0.58) | DNM1MEN1KMT2ATP53SMN1; SMN2 | |
| Hydrochloric Acid SCHEMBL635378 | 0.94 | MEN1 (0.59) | DNM1MEN1KMT2ATP53SMN1; SMN2 | |
| Iodide SCHEMBL239944 | 0.94 | DNM1 (0.56) | DNM1MEN1KMT2ATP53SMN1; SMN2 | |
| Bromide SCHEMBL240143 | 0.94 | DNM1 (0.59) | DNM1MEN1KMT2ATP53SMN1; SMN2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 37 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12421396-B2 | Silica particles and method for producing the same | FUJIFILM BUSINESS INNOVATION CORP. (JP) | 2025-09-23 | — | — | US | disclosed |
| EP-4250014-B1 | ELECTROSTATIC CHARGE IMAGE DEVELOPING TONER, ELECTROSTATIC CHARGE IMAGE DEVELOPER, TONER CARTRIDGE, PROCESS CARTRIDGE, IMAGE FORMING APPARATUS, AND IMAGE FORMING METHOD | FUJIFILM BUSINESS INNOVATION CORP (JP) | 2025-09-03 | — | — | EP | disclosed |
| EP-4343438-B1 | ELECTROSTATIC CHARGE IMAGE DEVELOPING TONER, ELECTROSTATIC CHARGE IMAGE DEVELOPER, TONER CARTRIDGE, PROCESS CARTRIDGE, IMAGE FORMING APPARATUS, AND IMAGE FORMING METHOD | FUJIFILM BUSINESS INNOVATION CORP (JP) | 2025-06-04 | — | — | EP | disclosed |
| US-12215033-B2 | Silica particles comprising nitrogen element-containing compound containing molybdenum element | FUJIFILM BUSINESS INNOVATION CORP. (JP) | 2025-02-04 | — | — | US | disclosed |
| US-12162769-B2 | Silica particles and manufacturing method thereof | FUJIFILM BUSINESS INNOVATION CORP. (JP) | 2024-12-10 | — | — | US | disclosed |
| US-12077443-B2 | Silica particles and method for producing the same | FUJIFILM BUSINESS INNOVATION CORP. (JP) | 2024-09-03 | — | — | US | disclosed |
| US-20240118641-A1 | ELECTROSTATIC CHARGE IMAGE DEVELOPING TONER, ELECTROSTATIC CHARGE IMAGE DEVELOPER, TONER CARTRIDGE, PROCESS CARTRIDGE, IMAGE FORMING APPARATUS, AND IMAGE FORMING METHOD | FUJIFILM BUSINESS INNOVATION CORP. (JP) | 2024-04-11 | — | — | US | disclosed |
| US-20240118640-A1 | ELECTROSTATIC CHARGE IMAGE DEVELOPING TONER, ELECTROSTATIC CHARGE IMAGE DEVELOPER, TONER CARTRIDGE, PROCESS CARTRIDGE, IMAGE FORMING APPARATUS, AND IMAGE FORMING METHOD | FUJIFILM BUSINESS INNOVATION CORP. (JP) | 2024-04-11 | — | — | US | disclosed |
| EP-4345540-A1 | ELECTROSTATIC CHARGE IMAGE DEVELOPER, PROCESS CARTRIDGE, IMAGE FORMING APPARATUS, AND IMAGE FORMING METHOD | FUJIFILM Business Innovation Corp. (JP) | 2024-04-03 | — | — | EP | disclosed |
| EP-4343437-A1 | ELECTROSTATIC CHARGE IMAGE DEVELOPING TONER, ELECTROSTATIC CHARGE IMAGE DEVELOPER, TONER CARTRIDGE, PROCESS CARTRIDGE, IMAGE FORMING APPARATUS, AND IMAGE FORMING METHOD | FUJIFILM Business Innovation Corp. (JP) | 2024-03-27 | — | — | EP | disclosed |
| US-20170059992-A1 | RESIST PATTERN-FORMING METHOD AND CHEMICALLY AMPLIFIED RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2017-03-02 | — | — | US | disclosed |
| US-20160041465-A1 | PATTERN FORMING METHOD, ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE RESIN COMPOSITION, RESIST FILM, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2016-02-11 | — | — | US | disclosed |
| US-20160011517-A1 | PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, METHOD OF MANUFACTURING ELECTRONIC DEVICE USING THE SAME, AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2016-01-14 | — | — | US | disclosed |
| US-20160011517-A1 | PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, METHOD OF MANUFACTURING ELECTRONIC DEVICE USING THE SAME, AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2016-01-14 | — | — | US | disclosed |
| CN-100422193-C | Method for producing thiocarboxylate silane | GEN ELECTRIC (US) | 2008-10-01 | — | — | CN | disclosed |
| US-5705674-A | Process for preparing ortho-nitrobenzonitriles | HOECHST AKTIENGESELLSCHAFT (DE) | 1998-01-06 | — | — | US | disclosed |
| EP-0619300-B1 | Process for the preparation of halogenmethylbenzoyl cyanides and halogenmethyl benzoylcyanides | BASF AG (DE) | 1996-12-27 | — | — | EP | disclosed |
| US-5510528-A | Preparation of halomethylbenzoly cyanides and novel halomethylbenzoyl cyanides | BASF AKTIENGESELLSCHAFT (DE) | 1996-04-23 | — | — | US | disclosed |
| US-5446199-A | Preparation of halomethylbenzoyl cyanides and novel halomethylbenzoyl cyanides | BASF AKTIENGESELLSCHAFT (DE) | 1995-08-29 | — | — | US | disclosed |
| EP-0619300-A2 | Process for the preparation of halogenmethylbenzoyl cyanides and halogenmethyl benzoylcyanides | BASF Aktiengesellschaft (DE) | 1994-10-12 | — | — | EP | disclosed |