SCHEMBL8570261

SCHEMBL8570261

CCO[Si](CCCNCC(O)O)(OCC)OCC

nearest known ligand 0.31

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 1/20 0.31
SMN1; SMN2 Q16637 1/20 0.31
PKM P14618 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29046211 0.87 ALDH1A1 (0.37) ALDH1A1SMN1; SMN2
SCHEMBL19767366 0.83 HRH4 (0.35) ALDH1A1
SCHEMBL57190 0.82 CYP2C19 (0.38) ALDH1A1
SCHEMBL13217014 0.82 ALDH1A1 (0.30) ALDH1A1
SCHEMBL21463028 0.81 PKM (0.32) PKM
SCHEMBL2851029 0.80
SCHEMBL2843331 0.80
SCHEMBL28614962 0.80
SCHEMBL28355408 0.80 ANPEP (0.30)
SCHEMBL1092293 0.80 CYP2C19 (0.36) ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5796117-A Preparation of waterborne silane/titanium chelates composition HULS AMERICA INC. (US) 1998-08-18 US claimed
US-12248251-B2 Silicon-containing resist underlayer film-forming composition including organic group having ammonium group NISSAN CHEMICAL CORPORATION (JP) 2025-03-11 US disclosed
US-11966164-B2 Semiconductor device production method employing silicon-containing resist underlayer film-forming composition including organic group having ammonium group NISSAN CHEMICAL CORPORATION (JP) 2024-04-23 US disclosed
US-20220373888-A1 SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION INCLUDING ORGANIC GROUP HAVING AMMONIUM GROUP NISSAN CHEMICAL CORPORATION (JP) 2022-11-24 US disclosed
US-20210181635-A1 SEMICONDUCTOR DEVICE PRODUCTION METHOD EMPLOYING SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION INCLUDING ORGANIC GROUP HAVING AMMONIUM GROUP NISSAN CHEMICAL CORPORATION (JP) 2021-06-17 US disclosed
US-5796117-A Preparation of waterborne silane/titanium chelates composition HULS AMERICA INC. (US) 1998-08-18 US disclosed
US-5796117-A Preparation of waterborne silane/titanium chelates composition HULS AMERICA INC. (US) 1998-08-18 US disclosed
EP-0724610-B1 WATER-SOLUBLE ORGANOSILOXANE COMPOUNDS MINNESOTA MINING & MFG (US) 1998-05-27 EP disclosed
US-5565518-A OLIGOMER IS ADDITION PRODUCT OF ATLEAST ONE 3-GLYCIDOXYPROPYLALKOXY SILOXANE AND ATLEAST ONE SECONDARY HYDROXYALKYLAMINE MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1996-10-15 US disclosed
EP-0724610-A1 WATER-SOLUBLE ORGANOSILOXANE COMPOUNDS MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1996-08-07 EP disclosed
US-5464900-A Oligomers formed by dissolving in water alkoxysilane addition product of 3-glycidoxypropylalkoxysilane and secondary hydroxyalkylamine MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1995-11-07 US disclosed
WO-1995011280-A1 WATER-SOLUBLE ORGANOSILOXANE COMPOUNDS MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1995-04-27 WO disclosed