⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1136095 | 0.79 | — | — | |
| SCHEMBL10891054 | 0.79 | LMNA (0.31) | — | |
| SCHEMBL28355410 | 0.78 | — | — | |
| Ammonia Solution, Strong SCHEMBL3679851 | 0.77 | — | — | |
| SCHEMBL2849549 | 0.76 | LMNA (0.31) | — | |
| SCHEMBL11741706 | 0.75 | — | — | |
| SCHEMBL342542 | 0.75 | — | — | |
| SCHEMBL1070657 | 0.73 | TSHR (0.31) | — | |
| SCHEMBL1071959 | 0.73 | — | — | |
| SCHEMBL57189 | 0.73 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-5796117-A | Preparation of waterborne silane/titanium chelates composition | HULS AMERICA INC. (US) | 1998-08-18 | — | — | US | claimed |
| US-12248251-B2 | Silicon-containing resist underlayer film-forming composition including organic group having ammonium group | NISSAN CHEMICAL CORPORATION (JP) | 2025-03-11 | — | — | US | disclosed |
| US-11966164-B2 | Semiconductor device production method employing silicon-containing resist underlayer film-forming composition including organic group having ammonium group | NISSAN CHEMICAL CORPORATION (JP) | 2024-04-23 | — | — | US | disclosed |
| US-20220373888-A1 | SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION INCLUDING ORGANIC GROUP HAVING AMMONIUM GROUP | NISSAN CHEMICAL CORPORATION (JP) | 2022-11-24 | — | — | US | disclosed |
| US-20210181635-A1 | SEMICONDUCTOR DEVICE PRODUCTION METHOD EMPLOYING SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION INCLUDING ORGANIC GROUP HAVING AMMONIUM GROUP | NISSAN CHEMICAL CORPORATION (JP) | 2021-06-17 | — | — | US | disclosed |
| US-5796117-A | Preparation of waterborne silane/titanium chelates composition | HULS AMERICA INC. (US) | 1998-08-18 | — | — | US | disclosed |
| US-5796117-A | Preparation of waterborne silane/titanium chelates composition | HULS AMERICA INC. (US) | 1998-08-18 | — | — | US | disclosed |