SCHEMBL857301

SCHEMBL857301

Cc1ccc(C(=O)O)c(O)c1O

nearest known ligand 0.65

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 2/20 0.65
KDM4E B2RXH2 1/20 0.65
HPGD P15428 1/20 0.65
HSD17B10 Q99714 1/20 0.65
SELL P14151 1/20 0.60
SELP P16109 1/20 0.60
GRM1 Q13255 1/20 0.52
CYP3A4 P08684 1/20 0.50
CYP2C9 P11712 1/20 0.50
KMT2A Q03164 1/20 0.50
MAPT P10636 1/20 0.47
TDP1 Q9NUW8 1/20 0.47
CYP1A2 P05177 1/20 0.46
MCL1 Q07820 1/20 0.46
LDHA P00338 1/20 0.45
HAAO P46952 1/20 0.45
HMGB1 P09429 1/20 0.44
CXCL12 P48061 1/20 0.44
ALB P02768 1/20 0.43
MMP2 P08253 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL30083685 1.00 ALDH1A1 (0.65) ALDH1A1KDM4EHPGDHSD17B10SELL
SCHEMBL28630097 0.85 ALDH1A1 (0.53) ALDH1A1KDM4EHPGDHSD17B10SELL
SCHEMBL11777515 0.85 SELL (0.54) ALDH1A1KDM4EHPGDHSD17B10SELL
SCHEMBL29860525 0.84 SELL (0.79) ALDH1A1KDM4EHPGDHSD17B10SELL
SCHEMBL176255 0.84 SELL (0.79) ALDH1A1KDM4EHPGDHSD17B10SELL
SCHEMBL317576 0.84 ALDH1A1 (0.57) ALDH1A1KDM4EHPGDHSD17B10SELL
SCHEMBL2500795 0.84 ALDH1A1 (0.57) ALDH1A1KDM4EHPGDHSD17B10SELL
SCHEMBL30988009 0.84 ALDH1A1 (0.57) ALDH1A1KDM4EHPGDHSD17B10SELL
SCHEMBL30149140 0.84 ALDH1A1 (0.57) ALDH1A1KDM4EHPGDHSD17B10SELL
Bicarbonate SCHEMBL4612195 0.82 KDM4E (0.55) ALDH1A1KDM4EHPGDHSD17B10SELL

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 72 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-113903935-B Method for producing porous nitrogen-containing carbon materials with metal dopants, in particular for use as oxygen reduction (ORR) catalysts 原子能与替代能源委员会 2024-10-15 CN claimed
CN-113903935-A Method for producing porous nitrogen-containing carbon materials with metal dopants, in particular for use as oxygen reduction (ORR) catalysts 原子能与替代能源委员会 2022-01-07 CN claimed
EP-1041448-B1 Method for decoloring TOSHIBA KK (JP) 2006-06-07 EP claimed
US-5585105-A Utilization of derivatives of 2,5-dihydroxyphenylcarboxylic acids, their homologs, and their salts in preparation of a cosmetic or dermatological composition with a depigmenting action L'OREAL (FR) 1996-12-17 US claimed
US-5449518-A Bleaching, decoloring skin L'OREAL (FR) 1995-09-12 US claimed
CN-113903935-B Method for producing porous nitrogen-containing carbon materials with metal dopants, in particular for use as oxygen reduction (ORR) catalysts 原子能与替代能源委员会 2024-10-15 CN disclosed
US-11693313-B2 Resist composition and method of forming resist pattern TOKYO OHKA KOGYO CO., LTD. (JP) 2023-07-04 US disclosed
US-11693313-B2 Resist composition and method of forming resist pattern TOKYO OHKA KOGYO CO., LTD. (JP) 2023-07-04 US disclosed
US-20220179313-A1 RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN TOKYO OHKA KOGYO CO., LTD. (JP) 2022-06-09 US disclosed
US-20220121118-A1 RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN TOKYO OHKA KOGYO CO., LTD. (JP) 2022-04-21 US disclosed
CN-113903935-A Method for producing porous nitrogen-containing carbon materials with metal dopants, in particular for use as oxygen reduction (ORR) catalysts 原子能与替代能源委员会 2022-01-07 CN disclosed
US-20210149303-A1 RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN TOKYO OHKA KOGYO CO., LTD. (JP) 2021-05-20 US disclosed
EP-0310126-A2 Derivatives of pyrocatechol-carboxylic acid, their preparation and use as active ingredients in medicines F. HOFFMANN-LA ROCHE AG (CH) 1989-04-05 EP disclosed
EP-0269087-A2 Cephalosporin derivatives, processes for the preparation of the same, intermediates for use in the synthesis of the same, pharmaceutical compositions comprisingthe same, and the use of the same for the manufacture of a medicament having valuable therapeutic and preventative properties MOCHIDA PHARMACEUTICAL CO., LTD. (JP) 1988-06-01 EP disclosed
US-4323503-A PSYCHOFUNCTION PROPERTIES SUCH AS ANXIOLYTIC OR PSYCHOSTIMULANT SOCIETE D'ETUDES SCIENTIFIQUES ET INDUSTRIELLES DE L'ILE-DE-FRANCE (FR) 1982-04-06 US disclosed
US-4306072-A ANXIOLYTIC AND PSYCHOSTIMULANT ACTIVITY FOR TREATMENT OF PSYCHOLOGICAL DISORDERS SOCIETE D'ETUDES SCIENTIFIQUES ET INDUSTRIELLES DE L'ILE (FR) 1981-12-15 US disclosed
US-4268512-A ANXIOLYTIC AGENTS, PSYCHOSTIMULANTS SOCIETE D'ETUDES SCIENTIFIQUES ET INDUSTRIELLES DE L'ILE-DE-FRANCE (FR) 1981-05-19 US disclosed
US-4255580-A TREATMENT OF PSYCHOLOGICAL DISORDERS SIOCIETE D'ETUDES SCIENTIFIQUES ET INDUSTRIELLES DE L'ILE-DE-FRANCE (FR) 1981-03-10 US disclosed
US-4248885-A FOR GASTROINTESTINAL, UROGENITAL, RHEUMATIC, AND CARDIOVASCULAR DISEASE SOCIETE D'ETUDES SCIENTIFIQUES ET INDUSTRIELLES DE L'ILE-DE-FRANCE (FR) 1981-02-03 US disclosed
US-4186135-A TREATMENT OF PSYCHOLOGICAL DISORDERS SOCIETE D'ETUDES SCIENTIFIQUES ET INDUSTRIELLES DE L'ILE-DE-FRANCE (FR) 1980-01-29 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11693313-B2 Resist composition and method of forming resist pattern C1R, C1S, C9 ALDH1A1 1921/4885KDM4E 4803/4885HPGD 3017/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.