SCHEMBL8587264

SCHEMBL8587264

CC1=C(C)C(C)(C)C([Er](C2=C(C)C(C)=C(C)C2(C)C)C2=C(C)C(C)=C(C)C2(C)C)=C1C

nearest known ligand 0.33

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
CTSD P07339 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2230540 0.73 CTSD (0.43) CTSD
SCHEMBL4086701 0.67 CTSD (0.35) CTSD
SCHEMBL28961651 0.65 CTSD (0.38) CTSD
SCHEMBL9860509 0.65 CTSD (0.33) CTSD
SCHEMBL9647772 0.63 CTSD (0.32) CTSD
SCHEMBL25223152 0.61 CTSD (0.35) CTSD
SCHEMBL9860117 0.61 CTSD (0.35) CTSD
SCHEMBL2851519 0.61 CTSD (0.35) CTSD
SCHEMBL5616521 0.61 CTSD (0.35) CTSD
SCHEMBL9860925 0.61 CTSD (0.35) CTSD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-1117389-C Semiconductor layer mixed with chemical vapor deposited rare-earth IBM (US) 2003-08-06 CN claimed
CN-1255735-A Semiconductor layer mixed with chemical vapor deposited rare-earth IBM (US) 2000-06-07 CN claimed
EP-0586321-B1 Formation of supersaturated rare earth doped semiconductor layers by CVD IBM (US) 1998-05-20 EP claimed
US-5322813-A Method of making supersaturated rare earth doped semiconductor layers by chemical vapor deposition INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 1994-06-21 US claimed
EP-0586321-A2 Supersaturated rare earth doped semiconductor layers by CVD INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 1994-03-09 EP claimed
CN-1117389-C Semiconductor layer mixed with chemical vapor deposited rare-earth IBM (US) 2003-08-06 CN disclosed
CN-1054234-C Chemical Vapor Deposition of Supersaturated Rare Earth Doped Semiconductor Layers IBM (US) 2000-07-05 CN disclosed
CN-1255735-A Semiconductor layer mixed with chemical vapor deposited rare-earth IBM (US) 2000-06-07 CN disclosed
EP-0586321-B1 Formation of supersaturated rare earth doped semiconductor layers by CVD IBM (US) 1998-05-20 EP disclosed
US-5646425-A Supersaturated rare earth doped semiconductor layers by chemical vapor deposition INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 1997-07-08 US disclosed
US-5534079-A Supersaturated rare earth doped semiconductor layers formed by chemical vapor deposition INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 1996-07-09 US disclosed
US-5322813-A Method of making supersaturated rare earth doped semiconductor layers by chemical vapor deposition INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 1994-06-21 US disclosed
EP-0586321-A2 Supersaturated rare earth doped semiconductor layers by CVD INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 1994-03-09 EP disclosed