Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LMNA | P02545 | 1/20 | 0.43 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.43 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.43 |
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.41 |
| ▸ | TP53 | P04637 | 2/20 | 0.41 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.41 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.41 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.41 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.41 |
| ▸ | TSHR | P16473 | 3/20 | 0.32 |
| ▸ | TGFBR1 | P36897 | 1/20 | 0.31 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Methacrylic Acid SCHEMBL11503488 | 1.00 | LMNA (0.43) | LMNAALOX15HSD17B10ALDH1A1TP53 | |
| Methacrylic Acid SCHEMBL28431279 | 1.00 | LMNA (0.43) | LMNAALOX15HSD17B10ALDH1A1TP53 | |
| Methacrylic Acid SCHEMBL5708438 | 1.00 | LMNA (0.43) | LMNAALOX15HSD17B10ALDH1A1TP53 | |
| Methacrylic Acid SCHEMBL11907308 | 1.00 | LMNA (0.43) | LMNAALOX15HSD17B10ALDH1A1TP53 | |
| Methacrylic Acid SCHEMBL10430175 | 1.00 | LMNA (0.43) | LMNAALOX15HSD17B10ALDH1A1TP53 | |
| Methacrylic Acid SCHEMBL28305067 | 0.96 | ALOX15 (0.41) | LMNAALOX15HSD17B10ALDH1A1TP53 | |
| Methacrylic Acid SCHEMBL28073525 | 0.92 | ALOX15 (0.38) | LMNAALOX15HSD17B10ALDH1A1TP53 | |
| Methacrylic Acid SCHEMBL15789445 | 0.92 | ALOX15 (0.38) | LMNAALOX15HSD17B10ALDH1A1TP53 | |
| Methacrylic Acid SCHEMBL28310085 | 0.92 | ALOX15 (0.38) | LMNAALOX15HSD17B10ALDH1A1TP53 | |
| Methacrylic Acid SCHEMBL28076328 | 0.92 | ALOX15 (0.38) | LMNAALOX15HSD17B10ALDH1A1TP53 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0351534-A2 | Polyfunctional monomers and process for production thereof | MITSUI TOATSU CHEMICALS, Inc. (JP) | 1990-01-24 | — | — | EP | claimed |
| US-5756260-A | POLYAMIC ACID ESTER, PROPYLENE GLYCOL MONOMETHYL ETHER ACETATE | SUMITOMO BAKELITE COMPANY LIMITED (JP) | 1998-05-26 | — | — | US | disclosed |
| EP-0637776-B1 | PHOTOSENSITIVE RESIN COMPOSITION AND PROCESS FOR FORMING RELIEF PATTERN THEREFROM | SUMITOMO BAKELITE CO (JP) | 1997-11-26 | — | — | EP | disclosed |
| US-5648451-A | Process for producing photosensitive resin | SUMITOMO BAKELITE COMPANY LIMITED (JP) | 1997-07-15 | — | — | US | disclosed |
| EP-0430220-B1 | Photosensitive resin composition and semiconductor apparatus using it | SUMITOMO BAKELITE CO (JP) | 1997-05-07 | — | — | EP | disclosed |
| EP-0430221-B1 | Photosensitive resin composition | SUMITOMO BAKELITE CO (JP) | 1997-04-16 | — | — | EP | disclosed |
| EP-0637776-A1 | PHOTOSENSITIVE RESIN COMPOSITION AND PROCESS FOR FORMING RELIEF PATTERN THEREFROM | SUMITOMO BAKELITE COMPANY LIMITED (JP) | 1995-02-08 | — | — | EP | disclosed |
| US-5385808-A | Photosensitive resin composition and semiconductor apparatus using it | SUMITOMO BAKELITE COMPANY LIMITED (JP) | 1995-01-31 | — | — | US | disclosed |
| US-5238784-A | PHOTOSENSITIVE RESIN COMPOSITION WITH POLYAMIC ACID POLYMER | SUMITOMO BAKELITE COMPANY LIMITED (JP) | 1993-08-24 | — | — | US | disclosed |
| EP-0430220-A2 | Photosensitive resin composition and semiconductor apparatus using it | SUMITOMO BAKELITE COMPANY LIMITED (JP) | 1991-06-05 | — | — | EP | disclosed |
| EP-0430221-A2 | Photosensitive resin composition | SUMITOMO BAKELITE COMPANY LIMITED (JP) | 1991-06-05 | — | — | EP | disclosed |
| US-4980497-A | GIVE RESINS HAVING HIGH TRANSPARENCY, SURFACE HARDNESS, AND HEAT RESISTANCE; GLAZING MATERIALS, OPTICAL LENSES AND DISC SUBSTRATES | MITSUI TOATSU CHEMICALS, INC. (JP) | 1990-12-25 | — | — | US | disclosed |
| EP-0351534-A2 | Polyfunctional monomers and process for production thereof | MITSUI TOATSU CHEMICALS, Inc. (JP) | 1990-01-24 | — | — | EP | disclosed |