SCHEMBL85920

SCHEMBL85920

C=C(C)C(=O)OCC(C)C(F)(F)C(O)C(F)(F)F

nearest known ligand 0.53

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
TSHR P16473 3/20 0.53
THRB P10828 1/20 0.35
ALDH1A1 P00352 2/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15836481 0.87 TSHR (0.56) TSHRTHRBALDH1A1
SCHEMBL21123180 0.84 TSHR (0.62) TSHRTHRBALDH1A1
SCHEMBL9551843 0.79 TSHR (0.59) TSHRTHRBALDH1A1
SCHEMBL28810373 0.76 THRB (0.47) TSHRTHRBALDH1A1
SCHEMBL23493794 0.75 TSHR (0.64) TSHRTHRBALDH1A1
SCHEMBL17222398 0.75 TSHR (0.64) TSHRTHRBALDH1A1
SCHEMBL9680241 0.75 TSHR (0.59) TSHRTHRBALDH1A1
SCHEMBL85911 0.75 TSHR (0.40) TSHRALDH1A1
SCHEMBL85647 0.75 TSHR (0.36) TSHRALDH1A1
SCHEMBL5345658 0.75 TSHR (0.44) TSHRTHRBALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9201300-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-12-01 US disclosed
US-20140178818-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-06-26 US disclosed
US-8129099-B2 Double patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-03-06 US disclosed
US-20090208886-A1 DOUBLE PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2009-08-20 US disclosed