SCHEMBL85962

SCHEMBL85962

C=CCOCOC(=O)C=C

nearest known ligand 0.52

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
TSHR P16473 9/20 0.52
ALDH1A1 P00352 6/20 0.52
TP53 P04637 3/20 0.52
HIF1A Q16665 3/20 0.52
HSD17B10 Q99714 2/20 0.52
CYP3A4 P08684 3/20 0.46
MAPK1 P28482 1/20 0.42
SMN1; SMN2 Q16637 1/20 0.42
HPGD P15428 1/20 0.42
THRB P10828 2/20 0.39
MAPT P10636 1/20 0.37
CACNA1B Q00975 1/20 0.37
APBA1 Q02410 1/20 0.37
TDP1 Q9NUW8 1/20 0.34
CA1 P00915 2/20 0.33
CA2 P00918 2/20 0.33
CA7 P43166 1/20 0.33
APP P05067 1/20 0.31
CA9 Q16790 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28903557 0.90 TSHR (0.57) TSHRALDH1A1TP53HIF1AHSD17B10
Di(Hydroxyethyl)Ether SCHEMBL15136542 0.89 TSHR (0.57) TSHRALDH1A1TP53HIF1AHSD17B10
SCHEMBL15136191 0.86 ALDH1A1 (0.44) TSHRALDH1A1TP53HIF1AHSD17B10
SCHEMBL27905123 0.86 ALDH1A1 (0.44) TSHRALDH1A1TP53HIF1AHSD17B10
SCHEMBL10715122 0.85 TSHR (0.61) TSHRALDH1A1TP53HIF1AHSD17B10
SCHEMBL15493541 0.83 TSHR (0.58) TSHRALDH1A1TP53HIF1AHSD17B10
SCHEMBL15135782 0.83 ALDH1A1 (0.50) TSHRALDH1A1TP53HIF1AHSD17B10
SCHEMBL30558869 0.82 TSHR (0.62) TSHRALDH1A1TP53HIF1AHSD17B10
SCHEMBL6453542 0.81
SCHEMBL5167665 0.80 TSHR (0.54) TSHRALDH1A1TP53HIF1AHSD17B10

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 88 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-119013317-A Active energy ray-curable resin composition, cured product, and laminate 东洋钢钣株式会社 2024-11-22 CN claimed
WO-2023204257-A1 ACTIVE-ENERGY-RAY-CURABLE RESIN COMPOSITION, CURED PRODUCT, AND LAMINATE 東洋鋼鈑株式会社 2023-10-26 WO claimed
WO-2018017570-A1 A HAIR STRAIGHTENING AND STYLING COMPOSITION, PROCESS FOR PREPARING THE SAME AND METHOD OF USE THEREOF ISP INVESTMENTS LLC (US) 2018-01-25 WO claimed
CN-122095029-A Molded article and curable composition 2026-05-26 CN disclosed
CN-119717390-A Melamine-free alkali-developable resin composition, dry film, cured product, and electronic component having the cured product 太阳油墨(苏州)有限公司 2025-03-28 CN disclosed
US-12221505-B2 Curable resin composition and cured object thereof CANON KABUSHIKI KAISHA (JP) 2025-02-11 US disclosed
CN-119403843-A Polymer and method for producing same, photosensitive resin composition, cured product, and monomer compound and method for producing same 株式会社日本触媒 2025-02-07 CN disclosed
US-20250032398-A1 HIGH MOLECULAR WEIGHT BLOCK COPOLYMERS COMPRISING REPEATING UNITS DERIVED FROM MONOMERS COMPRISING LACTAM AND ACRYLOYL MOIETIES AND HYDROPHILIC MONOMERS, COMPOSITIONS, AND APPLICATIONS THEREOF ISP INVESTMENTS LLC (US) 2025-01-30 US disclosed
CN-119343385-A Free radical polymerizable composition and polymer thereof 株式会社日本触媒 2025-01-21 CN disclosed
JP-2025007342-A Curable composition, cured product, and article 株式会社日本触媒 2025-01-17 JP disclosed
WO-2025005182-A1 CURABLE COMPOSITION, CURED PRODUCT THEREOF, AND ARTICLE 株式会社日本触媒 2025-01-02 WO disclosed
US-20120016095-A1 a-(UNSATURATED ALKOXYALKYL) ACRYLATE COMPOSITION AND PROCESS FOR PRODUCTION THEREOF NIPPON SHOKUBAI CO., LTD. (JP) 2012-01-19 US disclosed
CN-101389664-B Copper removal from ATRP products by means of addition of sulfur compounds EVONIK ROEHM GMBH 2011-09-07 CN disclosed
EP-2169020-A1 Ink composition, ink jet recording method, method for producing planographic printing plate, and planographic printing plate FUJIFILM Corporation (JP) 2010-03-31 EP disclosed
CN-101389664-A Copper removal from ATRP products by means of addition of sulfur compounds EVONIK ROEHM GMBH (DE) 2009-03-18 CN disclosed
US-20080286020-A1 CLEANING DEVICE, PROCESS CARTRIDGE, AND IMAGE FORMING APPARATUS WATANABE KAZUHIKO 2008-11-20 US disclosed
US-20080108747-A1 Ink composition, ink jet recording method, method for producing planographic printing plate, and planographic printing plate FUJIFILM CORPORATION (JP) 2008-05-08 US disclosed
US-20080108747-A1 Ink composition, ink jet recording method, method for producing planographic printing plate, and planographic printing plate FUJIFILM CORPORATION (JP) 2008-05-08 US disclosed
US-4167502-A COPOLYMER OF UNSATURATED ACID AND AN ALLYL (METH)ACRYLATE ROHM AND HAAS COMPANY (US) 1979-09-11 US disclosed
US-4085167-A POLYMERS OF AN ACRYLIC ACID AND AN OLIGOMER OF AN ALLYL-CONTAINING ACRYLIC ESTER ROHM AND HAAS COMPANY (US) 1978-04-18 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20250032398-A1 HIGH MOLECULAR WEIGHT BLOCK COPOLYMERS COMPRISING REPEATING UNITS DERIVED FROM MONOMERS COMPRISING LACTAM AND ACRYLOYL MOIETIES AND HYDROPHILIC MONOMERS, COMPOSITIONS, AND APPLICATIONS THEREOF PCNA, ADSL, APH1B TSHR 3587/4885ALDH1A1 2371/4885TP53 3330/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.