SCHEMBL8599201

SCHEMBL8599201

Oc1ccc(OCc2ccccc2)cc1O

nearest known ligand 0.68

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LMNA P02545 1/20 0.68
CYP1A2 P05177 1/20 0.68
PTGS1 P23219 1/20 0.68
SLC6A2 P23975 1/20 0.68
CYP2C19 P33261 1/20 0.68
PTGS2 P35354 1/20 0.68
SLC6A3 Q01959 1/20 0.68
HIF1A Q16665 1/20 0.68
HDAC6 Q9UBN7 1/20 0.68
ALOX5 P09917 1/20 0.63
MAOB P27338 9/20 0.63
MCL1 Q07820 1/20 0.58
CYP4F2 P78329 1/20 0.56
CYP4A11 Q02928 1/20 0.56
MAOA P21397 2/20 0.55
GAA P10253 1/20 0.55
MAPT P10636 1/20 0.55
RAB9A P51151 1/20 0.55
SMN1; SMN2 Q16637 1/20 0.55
L3MBTL1 Q9Y468 1/20 0.55

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2096058 0.87 LMNA (0.61) LMNACYP1A2PTGS1SLC6A2CYP2C19
SCHEMBL2128691 0.85 LMNA (0.59) LMNACYP1A2PTGS1SLC6A2CYP2C19
SCHEMBL2900304 0.85 LMNA (0.59) LMNACYP1A2PTGS1SLC6A2CYP2C19
SCHEMBL2390178 0.85 LMNA (0.59) LMNACYP1A2PTGS1SLC6A2CYP2C19
SCHEMBL1734928 0.85 LMNA (0.59) LMNACYP1A2PTGS1SLC6A2CYP2C19
SCHEMBL7779413 0.85 LMNA (0.59) LMNACYP1A2PTGS1SLC6A2CYP2C19
SCHEMBL1437457 0.85 MAOB (0.60) LMNACYP1A2PTGS1SLC6A2CYP2C19
SCHEMBL1532839 0.85 LMNA (0.59) LMNACYP1A2PTGS1SLC6A2CYP2C19
SCHEMBL3110168 0.85 LMNA (0.63) LMNACYP1A2PTGS1SLC6A2CYP2C19
SCHEMBL4360094 0.85 LMNA (0.63) LMNACYP1A2PTGS1SLC6A2CYP2C19

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-4283478-A COMPRISING A SILVER HALIDE LAYER AND A LAYER OF POSITIVE WORKING LIGHT SENSITIVE RESIN FUJI PHOTO FILM CO., LTD. (JP) 1981-08-11 US claimed
CN-118605082-A Small molecule composition, photoresist composition and method for forming pattern on substrate 连云港邃铸科技有限公司 2024-09-06 CN disclosed
CN-113253569-B Small molecule composition, photoresist composition and method for forming pattern on substrate 上海邃铸科技有限公司 2023-10-10 CN disclosed
CN-113253569-A Small molecule composition, photoresist composition and method for forming pattern on substrate 上海邃铸科技有限公司 2021-08-13 CN disclosed
EP-0598241-B1 Lithographic printing material FUJI PHOTO FILM CO LTD (JP) 1998-02-04 EP disclosed
US-5387483-A Developer containing silver halide solvent and hydroquinone; has pH up to 11.8 FUJI PHOTO FILM CO., LTD. (JP) 1995-02-07 US disclosed
EP-0610936-A2 Lithographic printing material FUJI PHOTO FILM CO., LTD. (JP) 1994-08-17 EP disclosed
EP-0608777-A1 Processing of lithographic printing material FUJI PHOTO FILM CO., LTD. (JP) 1994-08-03 EP disclosed
EP-0601600-A2 Processing of lithographic printing material and developer used therein FUJI PHOTO FILM CO., LTD. (JP) 1994-06-15 EP disclosed
EP-0598241-A1 Lithographic printing material FUJI PHOTO FILM CO., LTD. (JP) 1994-05-25 EP disclosed
US-5198571-A MONOFUNCTIONALIZATION OF PHENOLIC HYDROXY ONTO A POLYPHENOL ROUSSEL UCLAF (FR) 1993-03-30 US disclosed
EP-0491600-A1 Process for the regiospecific monofunctionalisation of a phenolic hydroxy group of a polyphenol ROUSSEL UCLAF (FR) 1992-06-24 EP disclosed
US-4283478-A COMPRISING A SILVER HALIDE LAYER AND A LAYER OF POSITIVE WORKING LIGHT SENSITIVE RESIN FUJI PHOTO FILM CO., LTD. (JP) 1981-08-11 US disclosed