SCHEMBL8608095

SCHEMBL8608095

[CH2]C/C(=C/CC)CC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8608098 1.00
SCHEMBL73306 0.81
SCHEMBL2639775 0.80
SCHEMBL16289464 0.78
SCHEMBL16288218 0.78
SCHEMBL16289462 0.78
SCHEMBL16288219 0.78
Ammonia Solution, Strong SCHEMBL1126328 0.78 ALDH1A1 (0.35)
Bromide SCHEMBL28411345 0.78
Ammonia Solution, Strong SCHEMBL10944103 0.78

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230250218-A1 URETHANE COMPOSITION NITTO KASEI CO., LTD. (JP) 2023-08-10 US disclosed
EP-4198068-A1 URETHANE COMPOSITION Nitto Kasei Co., Ltd. (JP) 2023-06-21 EP disclosed
CN-116018365-A Carbamate composition 日东化成株式会社 2023-04-25 CN disclosed
US-5723239-A PHOTOCONDUCTOR LAYER TREATED WITH DESENSITIZER SOLUTIONS FOR ELECTROGRAPHY FUJI PHOTO FILM CO. LTD. (JP) 1998-03-03 US disclosed
EP-0526191-B1 Desensitizing solution for offset printing FUJI PHOTO FILM CO LTD (JP) 1997-10-01 EP disclosed
US-5565290-A CYANOGEN-FREE DESENSITIZING SOLUTION COMPRISING PHYTIC ACID OR A METAL OR AMMONIUM SALT AND AN AMINE OR IMIDE COMPOUND; LITHOGRAPHIC PRINTING PLATES; STORAGE STABILITY; REDUCED ETCHING TIME FUJI PHOTO FILM CO., LTD. (JP) 1996-10-15 US disclosed
EP-0526191-A1 Desensitizing solution for offset printing FUJI PHOTO FILM CO., LTD. (JP) 1993-02-03 EP disclosed