Predicted protein targets (top 1)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ESR2 | Q92731 | 1/20 | 0.37 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL23328523 | 0.95 | ESR2 (0.33) | ESR2 | |
| SCHEMBL11304418 | 0.87 | SIGMAR1 (0.33) | — | |
| SCHEMBL8610940 | 0.86 | — | — | |
| SCHEMBL22844243 | 0.86 | — | — | |
| SCHEMBL1099742 | 0.85 | ALOX5 (0.33) | — | |
| SCHEMBL4642573 | 0.83 | ESR2 (0.42) | ESR2 | |
| SCHEMBL2379310 | 0.81 | — | — | |
| SCHEMBL22084582 | 0.81 | — | — | |
| SCHEMBL14534193 | 0.81 | — | — | |
| SCHEMBL2030299 | 0.81 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 19 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-10584823-B2 | Chlorine-resistant polyethylene compound and articles made therefrom | FINA TECHNOLOGY, INC. (US) | 2020-03-10 | — | — | US | claimed |
| US-20170089503-A1 | Chlorine-resistant Polyethylene Compound and Articles Made Therefrom | TOTAL AMERICAN SERVICES, INC. | 2017-03-30 | — | — | US | claimed |
| US-4217237-A | Process for removing carbon dioxide containing acidic gases from gaseous mixtures using a basic salt activated with a hindered amine | EXXON RESEARCH & ENGINEERING CO. (US) | 1980-08-12 | — | — | US | claimed |
| US-4112050-A | Process for removing carbon dioxide containing acidic gases from gaseous mixtures using a basic salt activated with a hindered amine | EXXON RESEARCH & ENGINEERING CO. (US) | 1978-09-05 | — | — | US | claimed |
| EP-3154937-B1 | CHLORINE-RESISTANT POLYETHYLENE COMPOUND AND ARTICLES MADE THEREFROM | FINA TECHNOLOGY (US) | 2024-05-22 | — | — | EP | disclosed |
| US-10584823-B2 | Chlorine-resistant polyethylene compound and articles made therefrom | FINA TECHNOLOGY, INC. (US) | 2020-03-10 | — | — | US | disclosed |
| US-20170089503-A1 | Chlorine-resistant Polyethylene Compound and Articles Made Therefrom | TOTAL AMERICAN SERVICES, INC. | 2017-03-30 | — | — | US | disclosed |
| EP-0518352-B1 | Process for forming super high-contrast negative images and silver halide photographic material and developer being used therefor | DAINIPPON INK & CHEMICALS (JP) | 1998-04-22 | — | — | EP | disclosed |
| US-5460919-A | Process of forming super high-contrast negative images and silver halide photographic material and developer being used therefor | DAINIPPON INK AND CHEMICALS, INC. (JP) | 1995-10-24 | — | — | US | disclosed |
| US-5372911-A | Support having one or more hydrophilic colloidal layers, at least one layer contains pyridinium salt or derivative, quinolinium salt or derivative, or isoquinolinium salt or derivative | DAINIPPON INK AND CHEMICALS, INC. (JP) | 1994-12-13 | — | — | US | disclosed |
| EP-0518352-A1 | Process for forming super high-contrast negative images and silver halide photographic material and developer being used therefor | DAINIPPON INK AND CHEMICALS, INC. (JP) | 1992-12-16 | — | — | EP | disclosed |
| US-4240923-A | STERICALLY HINDERED AMINO ALCOHOLS INCLUDING HETEROCYCLIC PIPERIDINE COMPOUNDS | EXXON RESEARCH & ENGINEERING CO. (US) | 1980-12-23 | — | — | US | disclosed |
| US-4217238-A | BASIC SALT, SCRUBBING | EXXON RESEARCH & ENGINEERING CO. (US) | 1980-08-12 | — | — | US | disclosed |
| US-4217236-A | Process and composition for removing carbon dioxide containing acidic gases from gaseous mixtures | EXXON RESEARCH & ENGINEERING CO. (US) | 1980-08-12 | — | — | US | disclosed |
| US-4112051-A | Process and amine-solvent absorbent for removing acidic gases from gaseous mixtures | EXXON RESEARCH & ENGINEERING CO. (US) | 1978-09-05 | — | — | US | disclosed |
| US-4112052-A | Process for removing carbon dioxide containing acidic gases from gaseous mixtures using aqueous amine scrubbing solutions | EXXON RESEARCH & ENGINEERING CO. (US) | 1978-09-05 | — | — | US | disclosed |
| US-4112050-A | Process for removing carbon dioxide containing acidic gases from gaseous mixtures using a basic salt activated with a hindered amine | EXXON RESEARCH & ENGINEERING CO. (US) | 1978-09-05 | — | — | US | disclosed |
| US-4101633-A | BY MIXING WITH AMINO ALCOHOLS | EXXON RESEARCH & ENGINEERING CO. (US) | 1978-07-18 | — | — | US | disclosed |
| US-4094957-A | CARBON DIOXIDE | EXXON RESEARCH & ENGINEERING CO. (US) | 1978-06-13 | — | — | US | disclosed |