SCHEMBL8611735

SCHEMBL8611735

Cc1ccc(O[C]=O)cc1C

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TDP1 Q9NUW8 3/20 0.46
SMN1; SMN2 Q16637 2/20 0.42
L3MBTL1 Q9Y468 3/20 0.40
NPC1 O15118 2/20 0.40
ESR1 P03372 1/20 0.38
TP53 P04637 1/20 0.38
POLB P06746 1/20 0.38
APEX1 P27695 1/20 0.38
MAPK1 P28482 1/20 0.38
ESR2 Q92731 1/20 0.38
HAO1 Q9UJM8 1/20 0.38
ATM Q13315 1/20 0.38
KMT2A Q03164 2/20 0.37
LMNA P02545 1/20 0.37
GFER P55789 1/20 0.37
MAPT P10636 3/20 0.37
HPGD P15428 3/20 0.37
RAB9A P51151 2/20 0.37
MEN1 O00255 1/20 0.36
ALDH1A1 P00352 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10528819 0.83 CYP11B1 (0.36) TDP1NPC1ESR1ESR2ATM
SCHEMBL2090043 0.81 HTR2A (0.38) SMN1; SMN2KMT2ARAB9A
SCHEMBL11308570 0.81 MCL1 (0.50) TDP1SMN1; SMN2L3MBTL1NPC1TP53
SCHEMBL29489131 0.77 TDP1 (0.41) TDP1SMN1; SMN2L3MBTL1NPC1ESR1
SCHEMBL9719145 0.77 TDP1 (0.41) TDP1SMN1; SMN2L3MBTL1NPC1ESR1
SCHEMBL2094066 0.76 TUBB1 (0.32) TDP1L3MBTL1ESR1TP53POLB
SCHEMBL11309814 0.75 MAPT (0.54) SMN1; SMN2L3MBTL1NPC1POLBKMT2A
SCHEMBL8142070 0.74 CA2 (0.32)
SCHEMBL2496298 0.74 CYP2A6 (0.54) TDP1ESR1KMT2ALMNAHPGD
SCHEMBL11860407 0.73 TDP1 (0.50) TDP1SMN1; SMN2L3MBTL1NPC1HAO1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 19 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11886119-B2 Material for forming underlayer film, resist underlayer film, method of producing resist underlayer film, and laminate MITSUI CHEMICALS, INC. (JP) 2024-01-30 US disclosed
CN-110709774-B Underlayer film forming material, resist underlayer film, method for producing resist underlayer film, and laminate 三井化学株式会社 2023-12-08 CN disclosed
US-20230185195-A1 MATERIAL FOR FORMING UNDERLAYER FILM, RESIST UNDERLAYER FILM, METHOD OF PRODUCING RESIST UNDERLAYER FILM, AND LAMINATE MITSUI CHEMICALS, INC. (JP) 2023-06-15 US disclosed
US-11599025-B2 Resin material for forming underlayer film, resist underlayer film, method of producing resist underlayer film, and laminate MITSUI CHEMICALS, INC. (JP) 2023-03-07 US disclosed
US-20220050379-A1 MATERIAL FOR FORMING UNDERLAYER FILM, RESIST UNDERLAYER FILM, AND LAMINATE MITSUI CHEMICALS, INC. (JP) 2022-02-17 US disclosed
EP-3922456-A1 MATERIAL FOR UNDERLAYER FILM FORMATION USE, RESIST UNDERLAYER FILM, AND LAMINATE Mitsui Chemicals, Inc. (JP) 2021-12-15 EP disclosed
CN-113365820-A Material for forming underlayer film, resist underlayer film, and laminate 三井化学株式会社 2021-09-07 CN disclosed
US-20200264511-A1 MATERIAL FOR FORMING UNDERLAYER FILM, RESIST UNDERLAYER FILM, METHOD OF PRODUCING RESIST UNDERLAYER FILM, AND LAMINATE MITSUI CHEMICALS, INC. (JP) 2020-08-20 US disclosed
WO-2020162183-A1 MATERIAL FOR UNDERLAYER FILM FORMATION USE, RESIST UNDERLAYER FILM, AND LAMINATE 三井化学株式会社 2020-08-13 WO disclosed
EP-3693793-A1 RESIN MATERIAL FOR FORMING UNDERLAYER FILM, RESIST UNDERLAYER FILM, METHOD FOR PRODUCING RESIST UNDERLAYER FILM, AND LAYERED PRODUCT Mitsui Chemicals, Inc. (JP) 2020-08-12 EP disclosed
US-20200241419-A1 RESIN MATERIAL FOR FORMING UNDERLAYER FILM, RESIST UNDERLAYER FILM, METHOD OF PRODUCING RESIST UNDERLAYER FILM, AND LAMINATE MITSUI CHEMICALS, INC. (JP) 2020-07-30 US disclosed
CN-111183395-A Resin material for forming underlayer film, resist underlayer film, method for producing resist underlayer film, and laminate 三井化学株式会社 2020-05-19 CN disclosed
CN-110709774-A Material for forming underlayer film, resist underlayer film, method for producing resist underlayer film, and laminate 三井化学株式会社 2020-01-17 CN disclosed
US-9608287-B2 Non-aqueous electrolytic solution, electrical storage device utilizing same, and cyclic sulfonic acid ester compound UBE INDUSTRIES, LTD. (JP) 2017-03-28 US disclosed
EP-2704246-A1 NON-AQUEOUS ELECTROLYTIC SOLUTION, ELECTRICAL STORAGE DEVICE UTILIZING SAME, AND CYCLIC SULFONIC ACID ESTER COMPOUND Ube Industries, Ltd. (JP) 2014-03-05 EP disclosed
EP-0605149-B1 Recording sheet JUJO PAPER CO LTD (JP) 1998-04-22 EP disclosed
US-5482913-A CARBONATE TYPE BLOCKED COLOR DEVELOPER, LASER RECORDING NIPPON PAPER INDUSTRIES, CO., LTD. (JP) 1996-01-09 US disclosed
EP-0605149-A2 Recording sheet NIPPON PAPER INDUSTRIES CO., LTD. (JP) 1994-07-06 EP disclosed
US-4259350-A PROTECTING DEGRADABLE ORGANIC MATERIAL FROM FUNGAL OR INSECT ATTACK SANKYO COMPANY LIMITED (JP) 1981-03-31 US disclosed